NL6517043A - - Google Patents
Info
- Publication number
- NL6517043A NL6517043A NL6517043A NL6517043A NL6517043A NL 6517043 A NL6517043 A NL 6517043A NL 6517043 A NL6517043 A NL 6517043A NL 6517043 A NL6517043 A NL 6517043A NL 6517043 A NL6517043 A NL 6517043A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/2209—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using wavelength dispersive spectroscopy [WDS]
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/079—Investigating materials by wave or particle radiation secondary emission incident electron beam and measuring excited X-rays
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/61—Specific applications or type of materials thin films, coatings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/638—Specific applications or type of materials gas
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Pathology (AREA)
- Health & Medical Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Immunology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US423764A US3373278A (en) | 1965-01-06 | 1965-01-06 | Determination of vapor coating rate by x-rays emitted from said vapor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL6517043A true NL6517043A (enrdf_load_stackoverflow) | 1966-07-07 |
Family
ID=23680089
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL6517043A NL6517043A (enrdf_load_stackoverflow) | 1965-01-06 | 1965-12-28 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3373278A (enrdf_load_stackoverflow) |
| BE (1) | BE674605A (enrdf_load_stackoverflow) |
| FR (1) | FR1461909A (enrdf_load_stackoverflow) |
| GB (1) | GB1126001A (enrdf_load_stackoverflow) |
| NL (1) | NL6517043A (enrdf_load_stackoverflow) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3612859A (en) * | 1968-01-31 | 1971-10-12 | Westinghouse Electric Corp | Method for measuring and controlling the density of a metallic vapor |
| US3590777A (en) * | 1969-03-13 | 1971-07-06 | United Aircarft Corp | Ingot feed drive |
| US3667421A (en) * | 1970-09-17 | 1972-06-06 | United Aircraft Corp | Mechanism for controlling the thickness of a coating in a vapor deposition apparatus |
| US3984581A (en) * | 1973-02-28 | 1976-10-05 | Carl Zeiss-Stiftung | Method for the production of anti-reflection coatings on optical elements made of transparent organic polymers |
| JPS5435920B2 (enrdf_load_stackoverflow) * | 1974-06-10 | 1979-11-06 | ||
| US4036167A (en) * | 1976-01-30 | 1977-07-19 | Inficon Leybold-Heraeus Inc. | Apparatus for monitoring vacuum deposition processes |
| US4292341A (en) * | 1980-02-26 | 1981-09-29 | Bell Telephone Laboratories, Incorporated | Method of controlling the index profile of optical fiber preforms |
| GB2125541B (en) * | 1982-08-13 | 1986-02-12 | Inst Tzvetna Metalurgia | Method and device for determination of dust content in dust gas flow |
| DE4336682C1 (de) * | 1993-10-27 | 1994-10-27 | Fraunhofer Ges Forschung | Verfahren zum Elektronenstrahlbedampfen mit mehrkomponentigem Verdampfungsmaterial |
| EP0665577A1 (en) * | 1994-01-28 | 1995-08-02 | Applied Materials, Inc. | Method and apparatus for monitoring the deposition rate of films during physical vapour deposition |
| FR3089299B1 (fr) * | 2018-11-29 | 2021-06-04 | Commissariat Energie Atomique | Methode d’analyse de fumees d’evaporation, produit programme d’ordinateur, systeme d’analyse et installation de fabrication additive associes |
| WO2020104744A1 (fr) * | 2018-11-20 | 2020-05-28 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Methode d'analyse de fumees d'evaporation, produit programme d'ordinateur, systeme d'analyse et installation de fabrication additive associes |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3230110A (en) * | 1962-01-22 | 1966-01-18 | Temescal Metallurgical Corp | Method of forming carbon vapor barrier |
| US3246146A (en) * | 1963-07-11 | 1966-04-12 | Ass Elect Ind | Apparatus for the X-ray analysis of a liquid suspension of specimen material |
-
1965
- 1965-01-06 US US423764A patent/US3373278A/en not_active Expired - Lifetime
- 1965-12-27 FR FR43769A patent/FR1461909A/fr not_active Expired
- 1965-12-28 NL NL6517043A patent/NL6517043A/xx unknown
- 1965-12-31 BE BE674605A patent/BE674605A/xx unknown
- 1965-12-31 GB GB55497/65A patent/GB1126001A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR1461909A (fr) | 1966-12-09 |
| GB1126001A (en) | 1968-09-05 |
| BE674605A (enrdf_load_stackoverflow) | 1966-06-30 |
| US3373278A (en) | 1968-03-12 |