NL298175A - - Google Patents

Info

Publication number
NL298175A
NL298175A NL298175DA NL298175A NL 298175 A NL298175 A NL 298175A NL 298175D A NL298175D A NL 298175DA NL 298175 A NL298175 A NL 298175A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL298175A publication Critical patent/NL298175A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/10—Duoplasmatrons ; Duopigatrons
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/077—Electron guns using discharge in gases or vapours as electron sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
NL298175D 1962-11-20 NL298175A (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DES82505A DE1208420B (de) 1962-11-20 1962-11-20 Vorrichtung zur Erzeugung eines Strahlenbuendels von Ionen oder Elektronen bei der wenigstens zwei gleichartige Ionen- bzw. Elektronenquellen hintereinander angeordnet sind

Publications (1)

Publication Number Publication Date
NL298175A true NL298175A (enrdf_load_stackoverflow)

Family

ID=7510392

Family Applications (1)

Application Number Title Priority Date Filing Date
NL298175D NL298175A (enrdf_load_stackoverflow) 1962-11-20

Country Status (5)

Country Link
US (1) US3315125A (enrdf_load_stackoverflow)
CH (1) CH412124A (enrdf_load_stackoverflow)
DE (1) DE1208420B (enrdf_load_stackoverflow)
GB (1) GB1060309A (enrdf_load_stackoverflow)
NL (1) NL298175A (enrdf_load_stackoverflow)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3453489A (en) * 1966-04-27 1969-07-01 Xerox Corp Multiple anode electrode assembly
US3449628A (en) * 1966-04-27 1969-06-10 Xerox Corp Plasma arc electrodes with anode heat shield
US3408283A (en) * 1966-09-15 1968-10-29 Kennecott Copper Corp High current duoplasmatron having an apertured anode positioned in the low pressure region
US3458743A (en) * 1966-12-19 1969-07-29 Radiation Dynamics Positive ion source for use with a duoplasmatron
US3409529A (en) * 1967-07-07 1968-11-05 Kennecott Copper Corp High current duoplasmatron having an apertured anode comprising a metal of high magnetic permeability
US3513351A (en) * 1968-06-26 1970-05-19 Atomic Energy Commission Duoplasmatron-type ion source including a gas reservoir
US3845300A (en) * 1973-04-18 1974-10-29 Atomic Energy Commission Apparatus and method for magnetoplasmadynamic isotope separation
DE2923724C2 (de) * 1979-06-12 1983-11-03 W.C. Heraeus Gmbh, 6450 Hanau Kühlbare Deuteriumlampe
CH632176A5 (fr) * 1979-12-06 1982-09-30 Charmilles Sa Ateliers Procede et dispositif pour usiner par etincelage erosif.
JPS57191950A (en) 1981-05-22 1982-11-25 Hitachi Ltd Charged-particle source
GB2169131B (en) * 1984-12-22 1988-11-09 English Electric Valve Co Ltd Gas discharge devices
CA1252581A (en) * 1985-05-28 1989-04-11 Yoshinobu Aoyagi Electron beam-excited ion beam source
US4841197A (en) * 1986-05-28 1989-06-20 Nihon Shinku Gijutsu Kabushiki Kaisha Double-chamber ion source
GB8803837D0 (en) * 1988-02-18 1988-03-16 Vg Instr Group Mass spectrometer
DE10336273A1 (de) * 2003-08-07 2005-03-10 Fraunhofer Ges Forschung Vorrichtung zur Erzeugung von EUV- und weicher Röntgenstrahlung
WO2008035061A1 (en) * 2006-09-19 2008-03-27 University Of Southampton Improved pulsed plasma thruster and method of operation thereof
US20160133426A1 (en) * 2013-06-12 2016-05-12 General Plasma, Inc. Linear duoplasmatron
US10176977B2 (en) * 2014-12-12 2019-01-08 Agilent Technologies, Inc. Ion source for soft electron ionization and related systems and methods
CN115426759B (zh) * 2022-09-07 2025-04-01 中国人民解放军空军工程大学 一种级联式高效放电装置和方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE764127C (de) * 1939-07-09 1954-05-17 Aeg Mittelbar geheizte Gluehkathode zur Erzeugung eines Elektronenstrahles grosser Stromstaerke
US2975277A (en) * 1955-05-10 1961-03-14 Vakutronik Veb Ion source
DE1059581B (de) * 1956-03-28 1959-06-18 Siemens Ag Plasmaquelle fuer geladene Teilchen
US3033984A (en) * 1959-02-17 1962-05-08 United States Steel Corp Apparatus for increasing the energy of x-rays
US3137801A (en) * 1960-09-22 1964-06-16 High Voltage Engineering Corp Duoplasmatron-type ion source including a non-magnetic anode and magnetic extractor electrode

Also Published As

Publication number Publication date
GB1060309A (en) 1967-03-01
US3315125A (en) 1967-04-18
DE1208420B (de) 1966-01-05
CH412124A (de) 1966-04-30

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