NL257610A - - Google Patents

Info

Publication number
NL257610A
NL257610A NL257610DA NL257610A NL 257610 A NL257610 A NL 257610A NL 257610D A NL257610D A NL 257610DA NL 257610 A NL257610 A NL 257610A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL257610A publication Critical patent/NL257610A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604Chemical etching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical & Material Sciences (AREA)
  • ing And Chemical Polishing (AREA)
  • Weting (AREA)
NL257610D 1959-11-05 NL257610A (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DET0017433 1959-11-05

Publications (1)

Publication Number Publication Date
NL257610A true NL257610A (es)

Family

ID=7548581

Family Applications (1)

Application Number Title Priority Date Filing Date
NL257610D NL257610A (es) 1959-11-05

Country Status (3)

Country Link
US (1) US3158517A (es)
GB (1) GB962335A (es)
NL (1) NL257610A (es)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE655566A (es) * 1963-11-12
US3356500A (en) * 1964-09-28 1967-12-05 Santa Barbara Res Ct Production of infrared detector patterns
US3296141A (en) * 1965-03-25 1967-01-03 R O Hull & Company Inc Bright dip compositions for the treatment of steel
US3385682A (en) * 1965-04-29 1968-05-28 Sprague Electric Co Method and reagent for surface polishing
US3860423A (en) * 1973-08-24 1975-01-14 Rca Corp Etching solution for silver
US3926699A (en) * 1974-06-17 1975-12-16 Rbp Chemical Corp Method of preparing printed circuit boards with terminal tabs
US3990982A (en) * 1974-12-18 1976-11-09 Rbp Chemical Corporation Composition for stripping lead-tin solder
USRE29181E (en) * 1974-12-18 1977-04-12 Rbp Chemical Corporation Method of preparing printed circuit boards with terminal tabs
FR2374396A1 (fr) * 1976-12-17 1978-07-13 Ibm Composition de decapage du silicium
US4353779A (en) * 1981-08-14 1982-10-12 Westinghouse Electric Corp. Wet chemical etching of III/V semiconductor material without gas evolution
US5229334A (en) * 1990-08-24 1993-07-20 Seiko Epson Corporation Method of forming a gate insulating film involving a step of cleaning using an ammonia-peroxide solution
JP4445716B2 (ja) * 2003-05-30 2010-04-07 日立ソフトウエアエンジニアリング株式会社 ナノ粒子製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1997375A (en) * 1933-03-21 1935-04-09 Naruse Tomisaburo Method to frost the inner surface of a glass bulb for electric lamps
US2411298A (en) * 1945-02-12 1946-11-19 Philips Corp Piezoelectric crystal
US2606960A (en) * 1949-06-01 1952-08-12 Bell Telephone Labor Inc Semiconductor translating device
CA478611A (en) * 1949-12-29 1951-11-13 Western Electric Company, Incorporated Etching processes and solutions
US2705392A (en) * 1952-06-11 1955-04-05 Selectronics Inc Method of manufacture of piezo electric crystals
US2739882A (en) * 1954-02-25 1956-03-27 Raytheon Mfg Co Surface treatment of germanium
US2965521A (en) * 1954-06-10 1960-12-20 Crucible Steel Co America Metal pickling solutions and methods
US2876144A (en) * 1956-02-24 1959-03-03 Crucible Steel Co America Metal pickling solutions and methods
US2921836A (en) * 1956-04-24 1960-01-19 Carborundum Co Process of treating metals
US2990282A (en) * 1958-10-29 1961-06-27 Warner C Wicke Method of etching and composition therefor
US3079254A (en) * 1959-01-26 1963-02-26 George W Crowley Photographic fabrication of semiconductor devices
US3041258A (en) * 1960-06-24 1962-06-26 Thomas V Sikina Method of etching and etching solution for use therewith

Also Published As

Publication number Publication date
GB962335A (en) 1964-07-01
US3158517A (en) 1964-11-24

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