NL252383A - - Google Patents

Info

Publication number
NL252383A
NL252383A NL252383DA NL252383A NL 252383 A NL252383 A NL 252383A NL 252383D A NL252383D A NL 252383DA NL 252383 A NL252383 A NL 252383A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL252383A publication Critical patent/NL252383A/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/02Etching
    • C25F3/12Etching of semiconducting materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3063Electrolytic etching
    • H01L21/30635Electrolytic etching of AIIIBV compounds
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00Semiconductor device manufacturing: process
    • Y10S438/979Tunnel diodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)
  • Electrodes Of Semiconductors (AREA)
NL252383D 1960-06-07 NL252383A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL252383 1960-06-07

Publications (1)

Publication Number Publication Date
NL252383A true NL252383A (pt)

Family

ID=19752397

Family Applications (1)

Application Number Title Priority Date Filing Date
NL252383D NL252383A (pt) 1960-06-07

Country Status (5)

Country Link
US (1) US3251757A (pt)
CH (1) CH408216A (pt)
DE (1) DE1253825B (pt)
GB (1) GB964178A (pt)
NL (1) NL252383A (pt)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3484657A (en) * 1966-07-11 1969-12-16 Susanna Gukasovna Madoian Semiconductor device having intermetallic compounds providing stable parameter vs. time characteristics
US3959098A (en) * 1973-03-12 1976-05-25 Bell Telephone Laboratories, Incorporated Electrolytic etching of III - V compound semiconductors
GB1552268A (en) * 1977-04-01 1979-09-12 Standard Telephones Cables Ltd Semiconductor etching
US4154663A (en) * 1978-02-17 1979-05-15 Texas Instruments Incorporated Method of providing thinned layer of epitaxial semiconductor material having substantially uniform reverse breakdown voltage characteristic

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE970420C (de) * 1951-03-10 1958-09-18 Siemens Ag Elektrisches Halbleitergeraet
US2802159A (en) * 1953-10-20 1957-08-06 Hughes Aircraft Co Junction-type semiconductor devices
US2912371A (en) * 1953-12-28 1959-11-10 Bell Telephone Labor Inc Method of fabricating semiconductive translating devices
US2940024A (en) * 1954-06-01 1960-06-07 Rca Corp Semi-conductor rectifiers
BE544034A (pt) * 1954-12-31
NL105577C (pt) * 1955-11-04
NL122283C (pt) * 1958-07-25
GB872531A (en) * 1959-03-24 1961-07-12 Ass Elect Ind Improvements relating to the production of transistors
US3088888A (en) * 1959-03-31 1963-05-07 Ibm Methods of etching a semiconductor device
FR1256826A (fr) * 1959-05-13 1961-03-24 Ass Elect Ind Perfectionnements apportés à la fabrication de transistors à jonctions
US3117899A (en) * 1960-07-18 1964-01-14 Westinghouse Electric Corp Process for making semiconductor devices
US3110949A (en) * 1962-09-13 1963-11-19 Tullio Alfred Di Gang mold for casting concrete and the like

Also Published As

Publication number Publication date
GB964178A (en) 1964-07-15
DE1253825B (de) 1967-11-09
CH408216A (de) 1966-02-28
US3251757A (en) 1966-05-17

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