NL245513A - - Google Patents

Info

Publication number
NL245513A
NL245513A NL245513DA NL245513A NL 245513 A NL245513 A NL 245513A NL 245513D A NL245513D A NL 245513DA NL 245513 A NL245513 A NL 245513A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL245513A publication Critical patent/NL245513A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F1/00—Springs
    • F16F1/02—Springs made of steel or other material having low internal friction; Wound, torsion, leaf, cup, ring or the like springs, the material of the spring not being relevant
    • F16F1/04—Wound springs
    • F16F1/06—Wound springs with turns lying in cylindrical surfaces
NL245513D 1959-01-23 NL245513A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US788501A US3157505A (en) 1959-01-23 1959-01-23 Photopolymerizable elements

Publications (1)

Publication Number Publication Date
NL245513A true NL245513A (de)

Family

ID=25144686

Family Applications (1)

Application Number Title Priority Date Filing Date
NL245513D NL245513A (de) 1959-01-23

Country Status (6)

Country Link
US (1) US3157505A (de)
CH (1) CH391466A (de)
DE (1) DE1122373B (de)
FR (1) FR1253861A (de)
GB (1) GB867959A (de)
NL (1) NL245513A (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3271180A (en) * 1962-06-19 1966-09-06 Ibm Photolytic processes for fabricating thin film patterns
US3615435A (en) * 1968-02-14 1971-10-26 Du Pont Photohardenable image reproduction element with integral pigmented layer and process for use
US3663222A (en) * 1968-06-06 1972-05-16 Asahi Chemical Ind Process for preparing steric block with liquid photopolymerizable composition
US3883351A (en) * 1972-02-09 1975-05-13 Horizons Inc Method of making a photoresist
US4002478A (en) * 1973-03-15 1977-01-11 Kansai Paint Company, Ltd. Method for forming relief pattern
JPS6032173B2 (ja) * 1974-12-28 1985-07-26 富士写真フイルム株式会社 画像形成法
US4055424A (en) * 1976-05-07 1977-10-25 Xerox Corporation Novel microfilm and process for preparation
US4115123A (en) * 1976-06-14 1978-09-19 Napp Systems (Usa), Inc. Shallow relief photopolymer printing plate and methods
DE2658422C2 (de) * 1976-12-23 1986-05-22 Hoechst Ag, 6230 Frankfurt Verfahren zur Herstellung eines Negativ-Trockenresistfilms
US4123272A (en) * 1977-05-17 1978-10-31 E. I. Du Pont De Nemours And Company Double-negative positive-working photohardenable elements
JPS6032175B2 (ja) * 1977-05-18 1985-07-26 バスフ アクチェン ゲゼルシャフト 版木及びレリ−フ版木を製造するために改良された光重合可能な物質
US4266007A (en) * 1978-06-22 1981-05-05 Hercules Incorporated Multilayer printing plates and process for making same
CA1123649A (en) * 1978-06-22 1982-05-18 Norman E. Hughes Printing plates produced using a base layer with polymerization rate greater than that of the printing layer
US4224361A (en) * 1978-09-05 1980-09-23 International Business Machines Corporation High temperature lift-off technique
US4332873A (en) * 1979-08-22 1982-06-01 Hercules Incorporated Multilayer printing plates and process for making same
US5213949A (en) * 1986-11-12 1993-05-25 Asahi Kasei Kogyo Kabushiki Kaisha Method for selectively curing a liquid photosensitive resin by masking exposure
JP3362797B2 (ja) 1993-04-30 2003-01-07 東洋紡績株式会社 印刷原版用感光性樹脂積層体
JP3423077B2 (ja) * 1993-08-25 2003-07-07 ダブリュ・アール・グレイス・アンド・カンパニー・コネテイカット 版面の製造方法
JP2004020643A (ja) * 2002-06-12 2004-01-22 Fuji Photo Film Co Ltd ドライフィルムレジスト及びプリント基板の製造方法
JP5264589B2 (ja) * 2008-03-28 2013-08-14 富士フイルム株式会社 同時２光子吸収３次元光記録媒体および同時２光子３次元光記録方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2101061A (en) * 1935-11-22 1937-12-07 Du Pont Casting
US2892712A (en) * 1954-04-23 1959-06-30 Du Pont Process for preparing relief images
US2964401A (en) * 1957-02-18 1960-12-13 Du Pont Photopolymerizable elements and processes
GB841454A (en) * 1957-09-16 1960-07-13 Du Pont Improvements in or relating to photopolymerisable elements

Also Published As

Publication number Publication date
US3157505A (en) 1964-11-17
DE1122373B (de) 1962-01-18
FR1253861A (fr) 1961-02-17
GB867959A (en) 1961-05-10
CH391466A (de) 1965-04-30

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