NL219906A - - Google Patents

Info

Publication number
NL219906A
NL219906A NL219906DA NL219906A NL 219906 A NL219906 A NL 219906A NL 219906D A NL219906D A NL 219906DA NL 219906 A NL219906 A NL 219906A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL219906A publication Critical patent/NL219906A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/42Introducing metal atoms or metal-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/44Preparation of metal salts or ammonium salts
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/46Reaction with unsaturated dicarboxylic acids or anhydrides thereof, e.g. maleinisation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00Chemical modification of a polymer
    • C08F2810/20Chemical modification of a polymer leading to a crosslinking, either explicitly or inherently
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/11Vinyl alcohol polymer or derivative
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/118Initiator containing with inhibitor or stabilizer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
NL219906D 1956-08-14 NL219906A (US20050065096A1-20050324-C00069.png)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US604006A US2902365A (en) 1956-08-14 1956-08-14 Photopolymerizable compositions and elements and process of making reliefs therefrom

Publications (1)

Publication Number Publication Date
NL219906A true NL219906A (US20050065096A1-20050324-C00069.png)

Family

ID=24417796

Family Applications (2)

Application Number Title Priority Date Filing Date
NL219906D NL219906A (US20050065096A1-20050324-C00069.png) 1956-08-14
NL219906A NL102156C (US20050065096A1-20050324-C00069.png) 1956-08-14 1957-08-14

Family Applications After (1)

Application Number Title Priority Date Filing Date
NL219906A NL102156C (US20050065096A1-20050324-C00069.png) 1956-08-14 1957-08-14

Country Status (7)

Country Link
US (1) US2902365A (US20050065096A1-20050324-C00069.png)
BE (1) BE560077A (US20050065096A1-20050324-C00069.png)
CH (1) CH398075A (US20050065096A1-20050324-C00069.png)
DE (1) DE1121928B (US20050065096A1-20050324-C00069.png)
FR (1) FR1192207A (US20050065096A1-20050324-C00069.png)
GB (1) GB825795A (US20050065096A1-20050324-C00069.png)
NL (2) NL102156C (US20050065096A1-20050324-C00069.png)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3014799A (en) * 1955-12-20 1961-12-26 Gerald Oster Cross-linking of hydrocarbons
US3070442A (en) * 1958-07-18 1962-12-25 Du Pont Process for producing colored polymeric relief images and elements therefor
DE1095665B (de) * 1959-01-12 1960-12-22 Hans Hoerner Verfahren zur fotomechanischen Herstellung von Hochdruckformen aus mehreren Kunststoffschichten
NL253125A (US20050065096A1-20050324-C00069.png) * 1959-07-01
NL259795A (US20050065096A1-20050324-C00069.png) * 1960-01-08
BE599102A (US20050065096A1-20050324-C00069.png) * 1960-01-27
BE604100A (US20050065096A1-20050324-C00069.png) * 1960-06-03
US3147116A (en) * 1961-11-28 1964-09-01 Gen Aniline & Film Corp Printing plates comprising hydrophobic resisto formed by crosslinking photopolymerized hydrophilic monomers with an isocyanate
BE631588A (US20050065096A1-20050324-C00069.png) * 1962-04-27
BE635636A (US20050065096A1-20050324-C00069.png) * 1962-08-01
US3380827A (en) * 1962-08-24 1968-04-30 Bowles Eng Corp Optical maching process
DE1572153B2 (de) * 1966-06-27 1971-07-22 E I Du Pont de Nemours and Co , Wilmington, Del (V St A ) Fotopolymerisierbares aufzeichnungsmaterial
BE788560A (fr) * 1972-06-09 1973-03-08 Du Pont Protection contre le halo dans la formation d'images dans des photopolymeres en couches multiples
JPS5236042B2 (US20050065096A1-20050324-C00069.png) * 1973-11-19 1977-09-13
JPS5917414B2 (ja) * 1975-10-07 1984-04-21 村上スクリ−ン (株) スクリ−ン版用感光性組成物及び感光膜
US4334970A (en) * 1976-11-05 1982-06-15 The Richardson Company Radiation curable solvent-free compositions recovery system
US4102683A (en) * 1977-02-10 1978-07-25 Rca Corp. Nonreflecting photoresist process
DE2846647A1 (de) * 1978-10-26 1980-05-08 Basf Ag Photopolymerisierbare mischung fuer die herstellung von druck- und reliefformen
JPS55118030A (en) * 1979-03-06 1980-09-10 Fuji Photo Film Co Ltd Photopolymerizable composition
US4278753A (en) * 1980-02-25 1981-07-14 Horizons Research Incorporated Plasma developable photoresist composition with polyvinyl formal binder
JPS59226346A (ja) * 1983-06-07 1984-12-19 Fuotopori Ouka Kk プリント回路の製造方法
NZ223178A (en) * 1987-01-17 1990-01-29 Nippon Paint Co Ltd Water-developable photosensitive resin composition capable of being hot melt molded, printing plates therefrom and methods of preparation
NZ223177A (en) * 1987-01-17 1990-01-29 Nippon Paint Co Ltd Water-developable photosensitive resin composition capable of hot melt molding and printing plate therefrom
EP0670521A1 (en) * 1994-02-28 1995-09-06 Toray Industries, Inc. Photosensitive resin composition and process for producing the same
US5753414A (en) * 1995-10-02 1998-05-19 Macdermid Imaging Technology, Inc. Photopolymer plate having a peelable substrate
CN1238852C (zh) * 2001-02-27 2006-01-25 Tdk株式会社 用于生产光学信息介质用光刻胶母模和印模的方法
BRPI0909424B1 (pt) * 2008-03-27 2019-02-19 Fujifilm Corporation Processo para produção de uma placa de impressão litográfica
CN115785553B (zh) * 2022-12-23 2023-06-13 湖北力生电缆有限公司 一种交联聚乙烯绝缘电缆

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2367661A (en) * 1941-12-31 1945-01-23 Du Pont Process of photopolymerization
GB566795A (en) * 1943-04-14 1945-01-15 William Elliott Frew Gates Improvements in and relating to the production of relief images
US2413275A (en) * 1943-08-27 1946-12-24 Prophylactic Brush Co Polyvinyl acetal maleates and method of making same
GB618181A (en) * 1946-10-30 1949-02-17 Bakelite Ltd Improvements in or relating to screens or stencils
NL101499C (US20050065096A1-20050324-C00069.png) * 1951-08-20
US2787546A (en) * 1955-02-08 1957-04-02 Eastman Kodak Co Light-sensitive photographic elements for photomechanical processes

Also Published As

Publication number Publication date
US2902365A (en) 1959-09-01
CH398075A (de) 1965-08-31
FR1192207A (fr) 1959-10-23
GB825795A (en) 1959-12-23
BE560077A (US20050065096A1-20050324-C00069.png) 1957-08-31
DE1121928B (de) 1962-01-11
NL102156C (US20050065096A1-20050324-C00069.png) 1962-03-15

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