NL2022747A - Apparatus for and method of monitoring and controlling droplet generator performance - Google Patents
Apparatus for and method of monitoring and controlling droplet generator performance Download PDFInfo
- Publication number
- NL2022747A NL2022747A NL2022747A NL2022747A NL2022747A NL 2022747 A NL2022747 A NL 2022747A NL 2022747 A NL2022747 A NL 2022747A NL 2022747 A NL2022747 A NL 2022747A NL 2022747 A NL2022747 A NL 2022747A
- Authority
- NL
- Netherlands
- Prior art keywords
- droplet
- droplets
- stream
- generator
- electro
- Prior art date
Links
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- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
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- LTSUHJWLSNQKIP-UHFFFAOYSA-J tin(iv) bromide Chemical compound Br[Sn](Br)(Br)Br LTSUHJWLSNQKIP-UHFFFAOYSA-J 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
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- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
- H05G2/006—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state details of the ejection system, e.g. constructional details of the nozzle
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862648969P | 2018-03-28 | 2018-03-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2022747A true NL2022747A (en) | 2019-10-02 |
Family
ID=65818515
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2022747A NL2022747A (en) | 2018-03-28 | 2019-03-15 | Apparatus for and method of monitoring and controlling droplet generator performance |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP3804474A1 (ko) |
| JP (2) | JP7428654B2 (ko) |
| KR (1) | KR20200135798A (ko) |
| CN (1) | CN111919516A (ko) |
| NL (1) | NL2022747A (ko) |
| WO (1) | WO2019185370A1 (ko) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116159209B (zh) * | 2023-03-06 | 2023-10-24 | 江西省人民医院 | 医用输液器滴速测定算法及液滴检测器结构 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7372056B2 (en) | 2005-06-29 | 2008-05-13 | Cymer, Inc. | LPP EUV plasma source material target delivery system |
| US7405416B2 (en) | 2005-02-25 | 2008-07-29 | Cymer, Inc. | Method and apparatus for EUV plasma source target delivery |
| US7897947B2 (en) | 2007-07-13 | 2011-03-01 | Cymer, Inc. | Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave |
| US8158960B2 (en) * | 2007-07-13 | 2012-04-17 | Cymer, Inc. | Laser produced plasma EUV light source |
| US8829477B2 (en) * | 2010-03-10 | 2014-09-09 | Asml Netherlands B.V. | Droplet generator with actuator induced nozzle cleaning |
| US8513629B2 (en) | 2011-05-13 | 2013-08-20 | Cymer, Llc | Droplet generator with actuator induced nozzle cleaning |
| US7872245B2 (en) | 2008-03-17 | 2011-01-18 | Cymer, Inc. | Systems and methods for target material delivery in a laser produced plasma EUV light source |
| JP5952399B2 (ja) * | 2011-08-05 | 2016-07-13 | エーエスエムエル ネザーランズ ビー．ブイ． | 放射源、リソグラフィ装置のための方法及びデバイス製造方法 |
| JP6263196B2 (ja) | 2012-11-30 | 2018-01-17 | エーエスエムエル ネザーランズ ビー．ブイ． | 液滴ジェネレータ、ｅｕｖ放射源、リソグラフィ装置、液滴を生成する方法及びデバイス製造方法 |
| US9241395B2 (en) | 2013-09-26 | 2016-01-19 | Asml Netherlands B.V. | System and method for controlling droplet timing in an LPP EUV light source |
| US9271381B2 (en) * | 2014-02-10 | 2016-02-23 | Asml Netherlands B.V. | Methods and apparatus for laser produced plasma EUV light source |
| WO2017130323A1 (ja) * | 2016-01-27 | 2017-08-03 | ギガフォトン株式会社 | ターゲット供給装置及び極端紫外光生成装置 |
-
2019
- 2019-03-15 CN CN201980022585.8A patent/CN111919516A/zh active Pending
- 2019-03-15 EP EP19712162.7A patent/EP3804474A1/en active Pending
- 2019-03-15 JP JP2020545090A patent/JP7428654B2/ja active Active
- 2019-03-15 KR KR1020207028044A patent/KR20200135798A/ko not_active Application Discontinuation
- 2019-03-15 NL NL2022747A patent/NL2022747A/en unknown
- 2019-03-15 WO PCT/EP2019/056528 patent/WO2019185370A1/en unknown
-
2024
- 2024-01-25 JP JP2024009368A patent/JP2024045309A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| WO2019185370A1 (en) | 2019-10-03 |
| JP7428654B2 (ja) | 2024-02-06 |
| JP2021516775A (ja) | 2021-07-08 |
| CN111919516A (zh) | 2020-11-10 |
| JP2024045309A (ja) | 2024-04-02 |
| EP3804474A1 (en) | 2021-04-14 |
| KR20200135798A (ko) | 2020-12-03 |
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