NL2022007A - Regeneration of a debris flux measurement system in a vacuum vessel - Google Patents
Regeneration of a debris flux measurement system in a vacuum vessel Download PDFInfo
- Publication number
- NL2022007A NL2022007A NL2022007A NL2022007A NL2022007A NL 2022007 A NL2022007 A NL 2022007A NL 2022007 A NL2022007 A NL 2022007A NL 2022007 A NL2022007 A NL 2022007A NL 2022007 A NL2022007 A NL 2022007A
- Authority
- NL
- Netherlands
- Prior art keywords
- measurement surface
- target
- measurement
- vessel
- target matter
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/02—Analysing fluids
- G01N29/022—Fluid sensors based on microsensors, e.g. quartz crystal-microbalance [QCM], surface acoustic wave [SAW] devices, tuning forks, cantilevers, flexural plate wave [FPW] devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/02—Analysing fluids
- G01N29/036—Analysing fluids by measuring frequency or resonance of acoustic waves
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2291/00—Indexing codes associated with group G01N29/00
- G01N2291/02—Indexing codes associated with the analysed material
- G01N2291/025—Change of phase or condition
- G01N2291/0256—Adsorption, desorption, surface mass change, e.g. on biosensors
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- X-Ray Techniques (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201762599139P | 2017-12-15 | 2017-12-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL2022007A true NL2022007A (en) | 2019-06-21 |
Family
ID=64500345
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL2022007A NL2022007A (en) | 2017-12-15 | 2018-11-16 | Regeneration of a debris flux measurement system in a vacuum vessel |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP7320505B2 (ja) |
KR (1) | KR102697196B1 (ja) |
CN (1) | CN111480071A (ja) |
NL (1) | NL2022007A (ja) |
WO (1) | WO2019115144A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114747298A (zh) * | 2019-11-27 | 2022-07-12 | Asml荷兰有限公司 | 用于光学系统的抑制剂物质 |
US20230375506A1 (en) * | 2022-05-18 | 2023-11-23 | Applied Materials, Inc. | Sensor for measurement of radicals |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10061248B4 (de) * | 2000-12-09 | 2004-02-26 | Carl Zeiss | Verfahren und Vorrichtung zur In-situ-Dekontamination eines EUV-Lithographiegerätes |
JP2006202671A (ja) * | 2005-01-24 | 2006-08-03 | Ushio Inc | 極端紫外光光源装置及び極端紫外光光源装置で発生するデブリの除去方法 |
US7541603B2 (en) * | 2006-09-27 | 2009-06-02 | Asml Netherlands B.V. | Radiation system and lithographic apparatus comprising the same |
US7629594B2 (en) * | 2006-10-10 | 2009-12-08 | Asml Netherlands B.V. | Lithographic apparatus, and device manufacturing method |
JP2009016640A (ja) * | 2007-07-06 | 2009-01-22 | Ushio Inc | 極端紫外光光源装置及び極端紫外光集光鏡のクリーニング方法 |
DE102007033701A1 (de) * | 2007-07-14 | 2009-01-22 | Xtreme Technologies Gmbh | Verfahren und Anordnung zur Reinigung von optischen Oberflächen in plasmabasierten Strahlungsquellen |
US20090025750A1 (en) * | 2007-07-24 | 2009-01-29 | Asml Netherlands B.V. | Method for removal of a deposition from an optical element, lithographic apparatus, and method for manufacturing a device |
NL1036832A1 (nl) * | 2008-04-15 | 2009-10-19 | Asml Netherlands Bv | Lithographic apparatus comprising an internal sensor and a mini-reactor, and method for treating a sensing surface of an internal sensor of a lithographic apparatus. |
US8054446B2 (en) * | 2008-08-21 | 2011-11-08 | Carl Zeiss Smt Gmbh | EUV lithography apparatus and method for determining the contamination status of an EUV-reflective optical surface |
JP5687488B2 (ja) * | 2010-02-22 | 2015-03-18 | ギガフォトン株式会社 | 極端紫外光生成装置 |
US8368039B2 (en) * | 2010-04-05 | 2013-02-05 | Cymer, Inc. | EUV light source glint reduction system |
JP6034598B2 (ja) * | 2012-05-31 | 2016-11-30 | ギガフォトン株式会社 | Euv光生成装置の洗浄方法 |
JP5302450B2 (ja) * | 2012-09-20 | 2013-10-02 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 光学面から汚染層を除去するための方法、洗浄ガスを生成するための方法、ならびに対応する洗浄および洗浄ガス生成の構造 |
JP2014086516A (ja) * | 2012-10-22 | 2014-05-12 | Canon Inc | ラジカルを供給する供給装置、リソグラフィ装置、及び物品の製造方法 |
WO2015055387A1 (en) * | 2013-10-17 | 2015-04-23 | Asml Netherlands B.V. | Photon source, metrology apparatus, lithographic system and device manufacturing method |
-
2018
- 2018-11-16 NL NL2022007A patent/NL2022007A/en unknown
- 2018-11-16 CN CN201880080455.5A patent/CN111480071A/zh active Pending
- 2018-11-16 WO PCT/EP2018/081498 patent/WO2019115144A1/en active Application Filing
- 2018-11-16 JP JP2020527876A patent/JP7320505B2/ja active Active
- 2018-11-16 KR KR1020207017005A patent/KR102697196B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
CN111480071A (zh) | 2020-07-31 |
KR20200096777A (ko) | 2020-08-13 |
JP2021507204A (ja) | 2021-02-22 |
JP7320505B2 (ja) | 2023-08-03 |
KR102697196B1 (ko) | 2024-08-20 |
WO2019115144A1 (en) | 2019-06-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI573495B (zh) | 極紫外線光源光學元件清潔系統與方法 | |
JP6250554B2 (ja) | ソースコレクタデバイス、リソグラフィ装置、及び放射コレクタ | |
US20240090109A1 (en) | Target delivery system | |
US11347154B2 (en) | Cleaning a structure surface in an EUV chamber | |
KR102709891B1 (ko) | 패싯형 euv 광학 요소 | |
JP2023083302A (ja) | 極端紫外線光源のチャンバ内の光学系の表面の洗浄 | |
NL2022769A (en) | Spatial modulation of a light beam | |
KR102697196B1 (ko) | 진공 용기 내의 파편 플럭스 측정 시스템의 재생 방법 | |
NL2017835A (en) | Droplet generator for lithographic apparatus, euv source and lithographic apparatus | |
WO2020225347A1 (en) | Protection system for an extreme ultraviolet light source | |
JP2021026052A (ja) | 極端紫外光生成装置、及び電子デバイスの製造方法 | |
TWI853024B (zh) | 用於極紫外線光(euv)源之目標遞送系統及用於保護目標材料遞送系統之孔口之方法 | |
US11988967B2 (en) | Target material supply apparatus and method | |
WO2023041306A1 (en) | Apparatus and method for actively heating a substrate in an euv light source |