NL2022007A - Regeneration of a debris flux measurement system in a vacuum vessel - Google Patents

Regeneration of a debris flux measurement system in a vacuum vessel Download PDF

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Publication number
NL2022007A
NL2022007A NL2022007A NL2022007A NL2022007A NL 2022007 A NL2022007 A NL 2022007A NL 2022007 A NL2022007 A NL 2022007A NL 2022007 A NL2022007 A NL 2022007A NL 2022007 A NL2022007 A NL 2022007A
Authority
NL
Netherlands
Prior art keywords
measurement surface
target
measurement
vessel
target matter
Prior art date
Application number
NL2022007A
Other languages
English (en)
Dutch (nl)
Inventor
Ma Yue
Vladimirovna Dziomkina Nina
Tom Stewart John Iv
Li Tianqi
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2022007A publication Critical patent/NL2022007A/en

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N29/00Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
    • G01N29/02Analysing fluids
    • G01N29/022Fluid sensors based on microsensors, e.g. quartz crystal-microbalance [QCM], surface acoustic wave [SAW] devices, tuning forks, cantilevers, flexural plate wave [FPW] devices
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N29/00Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
    • G01N29/02Analysing fluids
    • G01N29/036Analysing fluids by measuring frequency or resonance of acoustic waves
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2291/00Indexing codes associated with group G01N29/00
    • G01N2291/02Indexing codes associated with the analysed material
    • G01N2291/025Change of phase or condition
    • G01N2291/0256Adsorption, desorption, surface mass change, e.g. on biosensors

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • X-Ray Techniques (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
NL2022007A 2017-12-15 2018-11-16 Regeneration of a debris flux measurement system in a vacuum vessel NL2022007A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201762599139P 2017-12-15 2017-12-15

Publications (1)

Publication Number Publication Date
NL2022007A true NL2022007A (en) 2019-06-21

Family

ID=64500345

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2022007A NL2022007A (en) 2017-12-15 2018-11-16 Regeneration of a debris flux measurement system in a vacuum vessel

Country Status (5)

Country Link
JP (1) JP7320505B2 (ja)
KR (1) KR102697196B1 (ja)
CN (1) CN111480071A (ja)
NL (1) NL2022007A (ja)
WO (1) WO2019115144A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114747298A (zh) * 2019-11-27 2022-07-12 Asml荷兰有限公司 用于光学系统的抑制剂物质
US20230375506A1 (en) * 2022-05-18 2023-11-23 Applied Materials, Inc. Sensor for measurement of radicals

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10061248B4 (de) * 2000-12-09 2004-02-26 Carl Zeiss Verfahren und Vorrichtung zur In-situ-Dekontamination eines EUV-Lithographiegerätes
JP2006202671A (ja) * 2005-01-24 2006-08-03 Ushio Inc 極端紫外光光源装置及び極端紫外光光源装置で発生するデブリの除去方法
US7541603B2 (en) * 2006-09-27 2009-06-02 Asml Netherlands B.V. Radiation system and lithographic apparatus comprising the same
US7629594B2 (en) * 2006-10-10 2009-12-08 Asml Netherlands B.V. Lithographic apparatus, and device manufacturing method
JP2009016640A (ja) * 2007-07-06 2009-01-22 Ushio Inc 極端紫外光光源装置及び極端紫外光集光鏡のクリーニング方法
DE102007033701A1 (de) * 2007-07-14 2009-01-22 Xtreme Technologies Gmbh Verfahren und Anordnung zur Reinigung von optischen Oberflächen in plasmabasierten Strahlungsquellen
US20090025750A1 (en) * 2007-07-24 2009-01-29 Asml Netherlands B.V. Method for removal of a deposition from an optical element, lithographic apparatus, and method for manufacturing a device
NL1036832A1 (nl) * 2008-04-15 2009-10-19 Asml Netherlands Bv Lithographic apparatus comprising an internal sensor and a mini-reactor, and method for treating a sensing surface of an internal sensor of a lithographic apparatus.
US8054446B2 (en) * 2008-08-21 2011-11-08 Carl Zeiss Smt Gmbh EUV lithography apparatus and method for determining the contamination status of an EUV-reflective optical surface
JP5687488B2 (ja) * 2010-02-22 2015-03-18 ギガフォトン株式会社 極端紫外光生成装置
US8368039B2 (en) * 2010-04-05 2013-02-05 Cymer, Inc. EUV light source glint reduction system
JP6034598B2 (ja) * 2012-05-31 2016-11-30 ギガフォトン株式会社 Euv光生成装置の洗浄方法
JP5302450B2 (ja) * 2012-09-20 2013-10-02 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学面から汚染層を除去するための方法、洗浄ガスを生成するための方法、ならびに対応する洗浄および洗浄ガス生成の構造
JP2014086516A (ja) * 2012-10-22 2014-05-12 Canon Inc ラジカルを供給する供給装置、リソグラフィ装置、及び物品の製造方法
WO2015055387A1 (en) * 2013-10-17 2015-04-23 Asml Netherlands B.V. Photon source, metrology apparatus, lithographic system and device manufacturing method

Also Published As

Publication number Publication date
CN111480071A (zh) 2020-07-31
KR20200096777A (ko) 2020-08-13
JP2021507204A (ja) 2021-02-22
JP7320505B2 (ja) 2023-08-03
KR102697196B1 (ko) 2024-08-20
WO2019115144A1 (en) 2019-06-20

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