NL2021608A - Control system for a lithographic apparatus - Google Patents
Control system for a lithographic apparatus Download PDFInfo
- Publication number
- NL2021608A NL2021608A NL2021608A NL2021608A NL2021608A NL 2021608 A NL2021608 A NL 2021608A NL 2021608 A NL2021608 A NL 2021608A NL 2021608 A NL2021608 A NL 2021608A NL 2021608 A NL2021608 A NL 2021608A
- Authority
- NL
- Netherlands
- Prior art keywords
- mirror
- radiation
- radiation beam
- wavefront
- mirrors
- Prior art date
Links
- 230000005855 radiation Effects 0.000 claims abstract description 238
- 239000000758 substrate Substances 0.000 claims description 22
- 238000000059 patterning Methods 0.000 claims description 9
- 238000001459 lithography Methods 0.000 claims 1
- 230000008859 change Effects 0.000 abstract description 77
- 230000004075 alteration Effects 0.000 description 34
- 239000000446 fuel Substances 0.000 description 30
- 230000003287 optical effect Effects 0.000 description 23
- 230000036278 prepulse Effects 0.000 description 15
- 230000015572 biosynthetic process Effects 0.000 description 14
- 201000009310 astigmatism Diseases 0.000 description 11
- 238000005286 illumination Methods 0.000 description 10
- 238000012876 topography Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000009826 distribution Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 206010010071 Coma Diseases 0.000 description 3
- 230000005670 electromagnetic radiation Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 235000004035 Cryptotaenia japonica Nutrition 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 102000007641 Trefoil Factors Human genes 0.000 description 2
- 235000015724 Trifolium pratense Nutrition 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
- Lasers (AREA)
- Microscoopes, Condenser (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP17192125 | 2017-09-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2021608A true NL2021608A (en) | 2019-03-26 |
Family
ID=59923324
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2021608A NL2021608A (en) | 2017-09-20 | 2018-09-12 | Control system for a lithographic apparatus |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP2020534674A (zh) |
| KR (1) | KR20200057003A (zh) |
| CN (1) | CN111095041B (zh) |
| NL (1) | NL2021608A (zh) |
| WO (1) | WO2019057583A1 (zh) |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3820783A1 (de) * | 1988-06-20 | 1990-01-04 | Fraunhofer Ges Forschung | Optische anordnung zur korrektur einer astigmatischen abbildung |
| JP3341269B2 (ja) * | 1993-12-22 | 2002-11-05 | 株式会社ニコン | 投影露光装置、露光方法、半導体の製造方法及び投影光学系の調整方法 |
| US7372633B2 (en) * | 2006-07-18 | 2008-05-13 | Asml Netherlands B.V. | Lithographic apparatus, aberration correction device and device manufacturing method |
| JP5775530B2 (ja) * | 2009-12-23 | 2015-09-09 | エーエスエムエル ネザーランズ ビー．ブイ． | 照明システム、リソグラフィ方法、コンピュータプログラム、デバイス製造方法、およびリソグラフィ装置 |
| NL2009844A (en) * | 2011-12-22 | 2013-06-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
| DE102012202057B4 (de) * | 2012-02-10 | 2021-07-08 | Carl Zeiss Smt Gmbh | Projektionsobjektiv für EUV-Mikrolithographie, Folienelement und Verfahren zur Herstellung eines Projektionsobjektivs mit Folienelement |
| DE102014012456A1 (de) * | 2014-08-21 | 2016-02-25 | Steinmeyer Mechatronik GmbH | Optische Strahlführungseinheit und Materialbearbeitungsvorrichtung mit einer optischen Strahlführungseinheit |
| CN105511231B (zh) * | 2014-10-16 | 2019-03-29 | 中芯国际集成电路制造(上海)有限公司 | Euv光源和曝光装置 |
-
2018
- 2018-09-12 KR KR1020207008045A patent/KR20200057003A/ko not_active Application Discontinuation
- 2018-09-12 NL NL2021608A patent/NL2021608A/en unknown
- 2018-09-12 JP JP2020512442A patent/JP2020534674A/ja active Pending
- 2018-09-12 CN CN201880060643.1A patent/CN111095041B/zh active Active
- 2018-09-12 WO PCT/EP2018/074604 patent/WO2019057583A1/en active Application Filing
Also Published As
| Publication number | Publication date |
|---|---|
| CN111095041B (zh) | 2022-06-28 |
| KR20200057003A (ko) | 2020-05-25 |
| WO2019057583A1 (en) | 2019-03-28 |
| CN111095041A (zh) | 2020-05-01 |
| JP2020534674A (ja) | 2020-11-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI616724B (zh) | 微影裝置及元件製造方法 | |
| CN102736444B (zh) | 用于调节辐射束的光学设备、光刻设备和器件制造方法 | |
| JP5156056B2 (ja) | リソグラフィ装置並びに照明均一性補正及び均一性ドリフト補償の方法 | |
| CN105940349B (zh) | 辐射源 | |
| KR102072064B1 (ko) | 방사선 소스 | |
| US20120262690A1 (en) | Illumination system, lithographic apparatus and illumination method | |
| JP6126798B2 (ja) | 放射源およびリソグラフィ装置 | |
| TW202105069A (zh) | 雷射聚焦模組 | |
| CN107430348A (zh) | 辐射系统 | |
| JP2011146703A (ja) | リソグラフィ装置、デバイス製造方法およびコンピュータ読取可能媒体 | |
| JP2016509363A (ja) | Ｅｕｖリソグラフィ装置用ビーム搬送装置 | |
| US8730454B2 (en) | EUV radiation source and method of generating EUV radiation | |
| TWI706235B (zh) | 用於密集的線路圖案化的極短紫外光微影系統 | |
| NL2021608A (en) | Control system for a lithographic apparatus | |
| JP4764900B2 (ja) | アセンブリ及びリソグラフィ投影装置 | |
| KR20240141718A (ko) | 방사선 소스를 위한 광학 시스템 및 방법 | |
| TW202308459A (zh) | 雷射光束度量衡系統、雷射光束系統、euv輻射源、及微影設備 | |
| WO2023111364A1 (en) | Optical system and method for a radiation source | |
| KR20230132487A (ko) | 투영 광학기 가열을 위한 멀티-채널 광 소스 | |
| NL2011514A (en) | Beam delivery system for an euv radiation source, euv radiation source and method of generating euv radiation. | |
| JP2015510269A (ja) | リソグラフィ装置及びシステム、リソグラフィ装置を較正する方法、及びデバイス製造方法 | |
| NL2005694A (en) | Euv radiation source and method of generating euv radiation. |