NL2019674A - Lithographic Apparatus and Method - Google Patents
Lithographic Apparatus and Method Download PDFInfo
- Publication number
- NL2019674A NL2019674A NL2019674A NL2019674A NL2019674A NL 2019674 A NL2019674 A NL 2019674A NL 2019674 A NL2019674 A NL 2019674A NL 2019674 A NL2019674 A NL 2019674A NL 2019674 A NL2019674 A NL 2019674A
- Authority
- NL
- Netherlands
- Prior art keywords
- substrate
- scanning
- image
- marker
- exposure
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70641—Focus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7026—Focusing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP16195245 | 2016-10-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL2019674A true NL2019674A (en) | 2018-04-26 |
Family
ID=57189915
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL2019674A NL2019674A (en) | 2016-10-24 | 2017-10-05 | Lithographic Apparatus and Method |
Country Status (2)
Country | Link |
---|---|
NL (1) | NL2019674A (fr) |
WO (1) | WO2018077587A1 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021144066A1 (fr) * | 2020-01-16 | 2021-07-22 | Asml Netherlands B.V. | Substrat, dispositif de formation de motifs et appareils lithographiques |
US11556062B2 (en) * | 2021-03-18 | 2023-01-17 | Kla Corporation | Sub-resolution imaging target |
CN114406500A (zh) * | 2022-03-03 | 2022-04-29 | 广东华中科技大学工业技术研究院 | 一种铁氧体复合材料激光切割方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100544439B1 (ko) | 1997-03-07 | 2006-06-07 | 에이에스엠엘 네델란즈 비.브이. | 얼라인먼트유니트를갖는리소그래픽투영장치 |
US6586160B2 (en) * | 2001-03-26 | 2003-07-01 | Motorola, Inc. | Method for patterning resist |
DE60319462T2 (de) | 2002-06-11 | 2009-03-12 | Asml Netherlands B.V. | Lithographischer Apparat und Verfahren zur Herstellung eines Artikels |
US7253077B2 (en) * | 2003-12-01 | 2007-08-07 | Asml Netherlands B.V. | Substrate, method of preparing a substrate, method of measurement, lithographic apparatus, device manufacturing method and device manufactured thereby, and machine-readable storage medium |
US8715910B2 (en) * | 2008-08-14 | 2014-05-06 | Infineon Technologies Ag | Method for exposing an area on a substrate to a beam and photolithographic system |
DE102008064504B4 (de) * | 2008-12-22 | 2011-04-07 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie |
CN104395830B (zh) * | 2012-06-22 | 2017-11-28 | Asml荷兰有限公司 | 确定聚焦的方法、检查设备、图案形成装置、衬底以及器件制造方法 |
-
2017
- 2017-10-05 NL NL2019674A patent/NL2019674A/en unknown
- 2017-10-05 WO PCT/EP2017/075382 patent/WO2018077587A1/fr active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2018077587A1 (fr) | 2018-05-03 |
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