NL2019674A - Lithographic Apparatus and Method - Google Patents

Lithographic Apparatus and Method Download PDF

Info

Publication number
NL2019674A
NL2019674A NL2019674A NL2019674A NL2019674A NL 2019674 A NL2019674 A NL 2019674A NL 2019674 A NL2019674 A NL 2019674A NL 2019674 A NL2019674 A NL 2019674A NL 2019674 A NL2019674 A NL 2019674A
Authority
NL
Netherlands
Prior art keywords
substrate
scanning
image
marker
exposure
Prior art date
Application number
NL2019674A
Other languages
English (en)
Inventor
Jacobus Matheus Baselmans Johannes
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2019674A publication Critical patent/NL2019674A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70641—Focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing

Claims (1)

1. Een lithografieinrichting omvattende: een belichtinginrichting ingericht voor het leveren van een stralingsbundel; een drager geconstrueerd voor het dragen van een patroneerinrichting, welke patroneerinrichting in staat is een patroon aan te brengen in een doorsnede van de stralingsbundel ter vorming van een gepatroneerde stralingsbundel; een substraattafel geconstrueerd om een substraat te dragen; en een projectieinrichting ingerieht voor het projecteren van de gepatroneerde stralingsbundel op een doelgebied van het substraat, met het kenmerk, dat de substraattafel is ingericht voor het positioneren van het doelgebied van het substraat in een brandpuntsvlak van de projectieinrichting.
NL2019674A 2016-10-24 2017-10-05 Lithographic Apparatus and Method NL2019674A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP16195245 2016-10-24

Publications (1)

Publication Number Publication Date
NL2019674A true NL2019674A (en) 2018-04-26

Family

ID=57189915

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2019674A NL2019674A (en) 2016-10-24 2017-10-05 Lithographic Apparatus and Method

Country Status (2)

Country Link
NL (1) NL2019674A (nl)
WO (1) WO2018077587A1 (nl)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021144066A1 (en) * 2020-01-16 2021-07-22 Asml Netherlands B.V. Substrate, patterning device and lithographic apparatuses
US11556062B2 (en) * 2021-03-18 2023-01-17 Kla Corporation Sub-resolution imaging target
CN114406500A (zh) * 2022-03-03 2022-04-29 广东华中科技大学工业技术研究院 一种铁氧体复合材料激光切割方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0906590B1 (en) 1997-03-07 2003-08-27 ASML Netherlands B.V. Lithographic projection apparatus with off-axis alignment unit
US6586160B2 (en) * 2001-03-26 2003-07-01 Motorola, Inc. Method for patterning resist
DE60319462T2 (de) 2002-06-11 2009-03-12 Asml Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
US7253077B2 (en) * 2003-12-01 2007-08-07 Asml Netherlands B.V. Substrate, method of preparing a substrate, method of measurement, lithographic apparatus, device manufacturing method and device manufactured thereby, and machine-readable storage medium
US8715910B2 (en) * 2008-08-14 2014-05-06 Infineon Technologies Ag Method for exposing an area on a substrate to a beam and photolithographic system
DE102008064504B4 (de) * 2008-12-22 2011-04-07 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie
WO2013189724A2 (en) * 2012-06-22 2013-12-27 Asml Netherlands B.V. Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method

Also Published As

Publication number Publication date
WO2018077587A1 (en) 2018-05-03

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