NL2016358A - A radiation system and method. - Google Patents
A radiation system and method. Download PDFInfo
- Publication number
- NL2016358A NL2016358A NL2016358A NL2016358A NL2016358A NL 2016358 A NL2016358 A NL 2016358A NL 2016358 A NL2016358 A NL 2016358A NL 2016358 A NL2016358 A NL 2016358A NL 2016358 A NL2016358 A NL 2016358A
- Authority
- NL
- Netherlands
- Prior art keywords
- fuel
- radiation
- plasma
- image
- debris
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- X-Ray Techniques (AREA)
Claims (1)
1. Een lithografieinrichting omvattende: een belichtinginrichting ingericht voor het leveren van een stralingsbundel; een drager geconstrueerd voor het dragen van een patroneerinrichting, welke patroneerinrichting in staat is een patroon aan te brengen in een doorsnede van de stralingsbundel ter vorming van een gepatroneerde stralingsbundel; een substraattafel geconstrueerd om een substraat te dragen; en een projectieinrichting ingericht voor het projecteren van de gepatroneerde stralingsbundel op een doelgebied van het substraat, met het kenmerk, dat de substraattafel is ingericht voor het positioneren van het doelgebied van het substraat in een brandpuntsvlak van de projectieinrichting.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP15159583 | 2015-03-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL2016358A true NL2016358A (en) | 2016-09-30 |
Family
ID=52686223
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL2016358A NL2016358A (en) | 2015-03-18 | 2016-03-03 | A radiation system and method. |
Country Status (2)
Country | Link |
---|---|
NL (1) | NL2016358A (nl) |
WO (1) | WO2016146400A1 (nl) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111133840A (zh) * | 2017-09-20 | 2020-05-08 | Asml荷兰有限公司 | 辐射源 |
JP7225224B2 (ja) * | 2017-10-26 | 2023-02-20 | エーエスエムエル ネザーランズ ビー.ブイ. | プラズマをモニタするためのシステム |
JP7343511B2 (ja) * | 2018-02-28 | 2023-09-12 | エーエスエムエル ネザーランズ ビー.ブイ. | 放射源 |
CN113433805B (zh) * | 2021-07-26 | 2023-04-14 | 广东省智能机器人研究院 | 极紫外光光刻方法和系统 |
CN113433804B (zh) * | 2021-07-26 | 2023-04-14 | 广东省智能机器人研究院 | 极紫外光光刻方法和系统 |
CN114355735A (zh) * | 2022-01-20 | 2022-04-15 | 广东省智能机器人研究院 | 极紫外光产生方法和系统 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7087914B2 (en) * | 2004-03-17 | 2006-08-08 | Cymer, Inc | High repetition rate laser produced plasma EUV light source |
DE102005020521B4 (de) * | 2005-04-29 | 2013-05-02 | Xtreme Technologies Gmbh | Verfahren und Anordnung zur Unterdrückung von Debris bei der Erzeugung kurzwelliger Strahlung auf Basis eines Plasmas |
US8530871B2 (en) * | 2007-07-13 | 2013-09-10 | Cymer, Llc | Laser produced plasma EUV light source |
US8766212B2 (en) * | 2006-07-19 | 2014-07-01 | Asml Netherlands B.V. | Correction of spatial instability of an EUV source by laser beam steering |
JP2010103499A (ja) * | 2008-09-29 | 2010-05-06 | Komatsu Ltd | 極端紫外光源装置および極端紫外光生成方法 |
US8445876B2 (en) * | 2008-10-24 | 2013-05-21 | Gigaphoton Inc. | Extreme ultraviolet light source apparatus |
US20100192973A1 (en) * | 2009-01-19 | 2010-08-05 | Yoshifumi Ueno | Extreme ultraviolet light source apparatus and cleaning method |
JP2011023712A (ja) * | 2009-06-19 | 2011-02-03 | Gigaphoton Inc | 極端紫外光源装置 |
DE102012210035A1 (de) * | 2012-06-14 | 2013-05-23 | Carl Zeiss Smt Gmbh | EUV-Lithographieanlage und Verfahren zum Detektieren von Partikeln in einer EUV-Lithographieanlage |
-
2016
- 2016-03-03 WO PCT/EP2016/054570 patent/WO2016146400A1/en active Application Filing
- 2016-03-03 NL NL2016358A patent/NL2016358A/en unknown
Also Published As
Publication number | Publication date |
---|---|
WO2016146400A1 (en) | 2016-09-22 |
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