NL2002159C - Apparatus and method for accurate positioning. - Google Patents
Apparatus and method for accurate positioning. Download PDFInfo
- Publication number
- NL2002159C NL2002159C NL2002159A NL2002159A NL2002159C NL 2002159 C NL2002159 C NL 2002159C NL 2002159 A NL2002159 A NL 2002159A NL 2002159 A NL2002159 A NL 2002159A NL 2002159 C NL2002159 C NL 2002159C
- Authority
- NL
- Netherlands
- Prior art keywords
- frame
- subframe
- main frame
- sub
- main
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 9
- 230000005284 excitation Effects 0.000 claims description 4
- 239000000919 ceramic Substances 0.000 claims description 2
- 230000008602 contraction Effects 0.000 description 3
- 238000010276 construction Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Description
Apparatus and method for accurate positioning
The invention relates to an apparatus comprising a first main-frame and a second sub-frame, wherein the first mainframe and the second sub-frame are moveable with respect to each other and wherein the second sub-frame is positionable so as to 5 have it assume a predetermined end-position with respect to the first main-frame.
The invention further relates to a method for such accurate positioning.
An apparatus and method according to the preamble are 10 known from the prior art. For instance in an apparatus to be used in lithography it is an object to accurately position a first part of such apparatus with respect to a second part of such apparatus. High levels of accuracy and/or stability need to be accomplished in such an apparatus, for instance the accuracy 15 of the positioning may have to be better than 5 nanometer.
Also in other technological areas high accuracy positioning and/or stability may present a problem and the severity of this problem may be stressed when the apparatus has to operate in vacuum or near vacuum conditions.
20 Particularly in vacuum or near to vacuum conditions the surfaces of the first main-frame and the second sub-frame are very clean and consequently the coefficient of friction between these frame parts will be very high, thus making it hard to perform an accurate positioning of the first main-frame and the 25 second sub-frame with respect to each other. It is known to apply under these circumstances high positioning forces to operate on either the first main-frame or the second sub-frame in order to secure that the desired end-position will be assumed. This however may deform the frame parts which in turn deteriorates 30 the level of accuracy that may be attained with the positioning.
It is an object of the invention to provide an apparatus and a method in which high accuracy positioning is possible and wherein the pit-falls of the prior art are avoided as much as possible.
35 To this end the apparatus and method of the invention are characterized by one of more of the appended claims.
In a first aspect of the invention the apparatus is characterized in that the first main-frame and/or the second 2 sub-frame are provided with excitation means to induce a predetermined vibration to the first main-frame and/or the second sub-frame.
This allows that during positioning the first main-5 frame and/or the second sub-frame are subjected to a vibration with a predetermined frequency and amplitude. This vibration periodically alleviates the contact force between the first mainframe and the second sub-frame to a level of virtually zero, allowing that the first main-frame and the second sub-frame can be 10 positioned with respect to each other, without the need to apply high external forces. Particularly, when the first main-frame and the second sub-frame are given an appropriate orientation it is possible that the accurate positioning is performed under the influence of gravity only as the driving force for movement of 15 the first main-frame and the second sub-frame with respect to each other.
As mentioned above it is desirable that the vibration is selected to have a frequency and amplitude capable to at least temporarily varying a force at which the first main-frame 20 and the second sub-frame contact each other.
Preferably, the vibration is selected to have an amplitude which is less than a predetermined accuracy at the end-position of the second sub-frame with respect to the first mainframe. The selection of the amplitude does have a direct rela-25 tion and influence on the accuracy of the end-position that the second sub-frame eventually arrives at with respect to the first main-frame.
Beneficially the apparatus of the invention is provided with excitation means in the form of a piezo-ceramic vibrator.
30 An advantageous feature of the apparatus and method of the invention is that it can reduce inaccuracies due to thermal variations such as thermal expansion or contraction.
When the apparatus with the first main-frame and the second sub-frame heats up or cools down, the said first main-35 frame and second sub-frame may exhibit a different rate of expansion or contraction. Without further measures this may cause tension at the contact areas of the first main-frame and second sub-frame. This may rise up to a level that the existing friction at the contact area or contact areas is surpassed and a 40 sudden movement of either the first main-frame or second sub-frame will occur to release the tension. Evidently this is 3 detrimental to the stability of the apparatus. The invention can now advantageously improve the stability of the apparatus by periodically applying the said vibration so as to relieve the tension between the first main-frame and second sub-frame. Thus 5 also in situations that the temperature varies and different rates of expansion and/or contraction between the first mainframe and second sub-frame may occur, this will not result in deteriorated stability or accuracy of the apparatus.
The invention will hereinafter be further elucidated 10 with reference to a schematic example and with reference to the drawing of a single figure.
In the figure the end-stops 4, 4', 4''of a first mainframe are shown as well as the contours of a second sub-frame 2.
With reference numeral 3, 3', 3'' the contact areas of 15 the second sub-frame 2 with the end-stops 4, 4', 4'' of the first main-frame 1 are indicated. With arrow F a driving force is shown that acts on the second sub-frame 2 so as to cause that its contact areas 3, 3', 3'' will eventually contact the end-stops 4, 4', 4'' of the first main-frame 1.
20 Due to the construction that the first main-frame 1 and second sub-frame 2 may have, a difficulty may reside in accomplishing the purpose to have all contact areas 3, 3', 3'' come to lie against each of the end-stops 4, 4', 4'' of the first main-frame 1. According to the invention the first main-frame 1 25 and/or the second sub-frame 2 may be imparted with a predetermined vibration so as to release frictional forces as indicated with arrows F'and F'' relating to the contact between end-stops 4' and 4'' and contact areas 3'and 3".
With the said reduced frictional forces F' and F'' it is possible that the second sub-frame 2 under the influence of force F moves further until also contact area 3 comes to rest against end-stop 4 of the first main-frame 1. Thus an accurate positioning of the second sub-frame 2 with respect to the first main-frame 1 having the said end-stops 4, 4', 4'' is realised.
Claims (7)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2002159A NL2002159C (en) | 2008-10-31 | 2008-10-31 | Apparatus and method for accurate positioning. |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2002159A NL2002159C (en) | 2008-10-31 | 2008-10-31 | Apparatus and method for accurate positioning. |
| NL2002159 | 2008-10-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2002159C true NL2002159C (en) | 2010-05-04 |
Family
ID=40740127
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2002159A NL2002159C (en) | 2008-10-31 | 2008-10-31 | Apparatus and method for accurate positioning. |
Country Status (1)
| Country | Link |
|---|---|
| NL (1) | NL2002159C (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3438807A1 (en) * | 1983-10-24 | 1985-05-02 | Canon K.K., Tokio/Tokyo | Slide |
| US20020048416A1 (en) * | 2000-10-20 | 2002-04-25 | International Business Machines Corporation | Air bearing between a first and second object |
-
2008
- 2008-10-31 NL NL2002159A patent/NL2002159C/en not_active IP Right Cessation
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3438807A1 (en) * | 1983-10-24 | 1985-05-02 | Canon K.K., Tokio/Tokyo | Slide |
| US20020048416A1 (en) * | 2000-10-20 | 2002-04-25 | International Business Machines Corporation | Air bearing between a first and second object |
Non-Patent Citations (1)
| Title |
|---|
| STORCK H ET AL: "The effect of friction reduction in presence of ultrasonic vibrations and its relevance to travelling wave ultrasonic motors", ULTRASONICS, IPC SCIENCE AND TECHNOLOGY PRESS LTD. GUILDFORD, GB, vol. 40, no. 1-8, 1 May 2002 (2002-05-01), pages 379 - 383, XP004357229, ISSN: 0041-624X * |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| V1 | Lapsed because of non-payment of the annual fee |
Effective date: 20120501 |