NL2001066A1 - Deeltjesbundelinrichting met verbeterd Wien-filter. - Google Patents
Deeltjesbundelinrichting met verbeterd Wien-filter.Info
- Publication number
- NL2001066A1 NL2001066A1 NL2001066A NL2001066A NL2001066A1 NL 2001066 A1 NL2001066 A1 NL 2001066A1 NL 2001066 A NL2001066 A NL 2001066A NL 2001066 A NL2001066 A NL 2001066A NL 2001066 A1 NL2001066 A1 NL 2001066A1
- Authority
- NL
- Netherlands
- Prior art keywords
- improved
- particle beam
- beam device
- wien filter
- wien
- Prior art date
Links
- 239000002245 particle Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/043—Beam blanking
- H01J2237/0435—Multi-aperture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/05—Arrangements for energy or mass analysis
- H01J2237/057—Energy or mass filtering
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Electron Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT21412006 | 2006-12-22 | ||
AT21412006 | 2006-12-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
NL2001066A1 true NL2001066A1 (nl) | 2008-06-24 |
NL2001066C2 NL2001066C2 (nl) | 2010-01-28 |
Family
ID=39541497
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL2001066A NL2001066C2 (nl) | 2006-12-22 | 2007-12-07 | Deeltjesbundelinrichting met verbeterd Wien-filter. |
Country Status (3)
Country | Link |
---|---|
US (1) | US7763851B2 (nl) |
JP (1) | JP5318406B2 (nl) |
NL (1) | NL2001066C2 (nl) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL2001369C2 (nl) * | 2007-03-29 | 2010-06-14 | Ims Nanofabrication Ag | Werkwijze voor maskerloze deeltjesbundelbelichting. |
DE102008062450B4 (de) * | 2008-12-13 | 2012-05-03 | Vistec Electron Beam Gmbh | Anordnung zur Beleuchtung eines Substrats mit mehreren individuell geformten Partikelstrahlen zur hochauflösenden Lithographie von Strukturmustern |
US8283629B1 (en) * | 2011-04-15 | 2012-10-09 | Fei Company | Aberration-corrected wien ExB mass filter with removal of neutrals from the Beam |
JP6087154B2 (ja) | 2013-01-18 | 2017-03-01 | 株式会社ニューフレアテクノロジー | 荷電粒子ビーム描画装置、試料面へのビーム入射角調整方法、および荷電粒子ビーム描画方法 |
JP2014229481A (ja) * | 2013-05-22 | 2014-12-08 | 株式会社日立ハイテクノロジーズ | 荷電粒子線応用装置 |
US9627190B2 (en) * | 2015-03-27 | 2017-04-18 | Agilent Technologies, Inc. | Energy resolved time-of-flight mass spectrometry |
DE112018006761B4 (de) | 2018-03-30 | 2023-06-15 | Hitachi High-Tech Corporation | Einen strahl geladener teilchen anwendende vorrichtung |
WO2020055894A1 (en) * | 2018-09-10 | 2020-03-19 | Exogenesis Corporation | Method and apparatus to eliminate contaminants from an accelerated neutral atom beam to protect a beam target |
CN115917698A (zh) | 2020-06-10 | 2023-04-04 | Asml荷兰有限公司 | 带电粒子设备的可更换模块 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6062045A (ja) | 1983-09-14 | 1985-04-10 | Hitachi Ltd | イオンマイクロビ−ム打込み装置 |
AT391771B (de) | 1987-03-05 | 1990-11-26 | Ims Ionen Mikrofab Syst | Einrichtung zur verkleinernden oder 1 : 1 ionenprojektionslithographie |
US4985634A (en) | 1988-06-02 | 1991-01-15 | Oesterreichische Investitionskredit Aktiengesellschaft And Ionen Mikrofabrications | Ion beam lithography |
JP3358336B2 (ja) * | 1994-10-14 | 2002-12-16 | 日新電機株式会社 | イオン注入装置における注入条件異常検出方法 |
EP1150327B1 (en) * | 2000-04-27 | 2018-02-14 | ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Multi beam charged particle device |
EP1271605A4 (en) * | 2000-11-02 | 2009-09-02 | Ebara Corp | ELECTRON BEAM APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE COMPRISING SAID APPARATUS |
US6768125B2 (en) | 2002-01-17 | 2004-07-27 | Ims Nanofabrication, Gmbh | Maskless particle-beam system for exposing a pattern on a substrate |
JP2004342341A (ja) * | 2003-05-13 | 2004-12-02 | Hitachi High-Technologies Corp | ミラー電子顕微鏡及びそれを用いたパターン欠陥検査装置 |
JP4560712B2 (ja) | 2003-07-18 | 2010-10-13 | イーエムエス ナノファブリカツィオン アーゲー | 超高および超低運動イオン・エネルギーによるターゲットのイオン照射 |
JP4738723B2 (ja) | 2003-08-06 | 2011-08-03 | キヤノン株式会社 | マルチ荷電粒子線描画装置、荷電粒子線の電流の測定方法及びデバイス製造方法 |
CN102709143B (zh) * | 2003-09-05 | 2016-03-09 | 卡尔蔡司Smt有限责任公司 | 电子光学排布结构、多电子分束检验系统和方法 |
JP4092280B2 (ja) * | 2003-10-23 | 2008-05-28 | 株式会社東芝 | 荷電ビーム装置および荷電粒子検出方法 |
JP2006127879A (ja) * | 2004-10-28 | 2006-05-18 | Jeol Ltd | 多極子 |
JP2006228667A (ja) * | 2005-02-21 | 2006-08-31 | Nissin Ion Equipment Co Ltd | イオン照射装置 |
JP2006108697A (ja) * | 2005-11-04 | 2006-04-20 | Hitachi Ltd | イオン注入方法およびその装置 |
-
2007
- 2007-12-06 US US11/951,543 patent/US7763851B2/en active Active
- 2007-12-07 NL NL2001066A patent/NL2001066C2/nl active Search and Examination
- 2007-12-12 JP JP2007320692A patent/JP5318406B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
US7763851B2 (en) | 2010-07-27 |
JP2008159584A (ja) | 2008-07-10 |
NL2001066C2 (nl) | 2010-01-28 |
US20080149846A1 (en) | 2008-06-26 |
JP5318406B2 (ja) | 2013-10-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AD1A | A request for search or an international type search has been filed | ||
RD2N | Patents in respect of which a decision has been taken or a report has been made (novelty report) | ||
PD2B | A search report has been drawn up | ||
UD | Registration of licences with regard to patents |
Name of requester: INTEL CORPORATION Effective date: 20100525 |
|
PD | Change of ownership |
Owner name: IMS NANOFABRICATION GMBH; AT Free format text: DETAILS ASSIGNMENT: CHANGE OF OWNER(S), CHANGE OF LEGAL ENTITY; FORMER OWNER NAME: IMS NANOFABRICATION AG Effective date: 20171214 |