NL2001066A1 - Deeltjesbundelinrichting met verbeterd Wien-filter. - Google Patents

Deeltjesbundelinrichting met verbeterd Wien-filter.

Info

Publication number
NL2001066A1
NL2001066A1 NL2001066A NL2001066A NL2001066A1 NL 2001066 A1 NL2001066 A1 NL 2001066A1 NL 2001066 A NL2001066 A NL 2001066A NL 2001066 A NL2001066 A NL 2001066A NL 2001066 A1 NL2001066 A1 NL 2001066A1
Authority
NL
Netherlands
Prior art keywords
improved
particle beam
beam device
wien filter
wien
Prior art date
Application number
NL2001066A
Other languages
English (en)
Other versions
NL2001066C2 (nl
Inventor
Elmar Platzgummer
Original Assignee
Ims Nanofabrication Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ims Nanofabrication Ag filed Critical Ims Nanofabrication Ag
Publication of NL2001066A1 publication Critical patent/NL2001066A1/nl
Application granted granted Critical
Publication of NL2001066C2 publication Critical patent/NL2001066C2/nl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/043—Beam blanking
    • H01J2237/0435—Multi-aperture
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05—Arrangements for energy or mass analysis
    • H01J2237/057—Energy or mass filtering

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
NL2001066A 2006-12-22 2007-12-07 Deeltjesbundelinrichting met verbeterd Wien-filter. NL2001066C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
AT21412006 2006-12-22
AT21412006 2006-12-22

Publications (2)

Publication Number Publication Date
NL2001066A1 true NL2001066A1 (nl) 2008-06-24
NL2001066C2 NL2001066C2 (nl) 2010-01-28

Family

ID=39541497

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2001066A NL2001066C2 (nl) 2006-12-22 2007-12-07 Deeltjesbundelinrichting met verbeterd Wien-filter.

Country Status (3)

Country Link
US (1) US7763851B2 (nl)
JP (1) JP5318406B2 (nl)
NL (1) NL2001066C2 (nl)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2001369C2 (nl) * 2007-03-29 2010-06-14 Ims Nanofabrication Ag Werkwijze voor maskerloze deeltjesbundelbelichting.
DE102008062450B4 (de) * 2008-12-13 2012-05-03 Vistec Electron Beam Gmbh Anordnung zur Beleuchtung eines Substrats mit mehreren individuell geformten Partikelstrahlen zur hochauflösenden Lithographie von Strukturmustern
US8283629B1 (en) * 2011-04-15 2012-10-09 Fei Company Aberration-corrected wien ExB mass filter with removal of neutrals from the Beam
JP6087154B2 (ja) 2013-01-18 2017-03-01 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置、試料面へのビーム入射角調整方法、および荷電粒子ビーム描画方法
JP2014229481A (ja) * 2013-05-22 2014-12-08 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置
US9627190B2 (en) * 2015-03-27 2017-04-18 Agilent Technologies, Inc. Energy resolved time-of-flight mass spectrometry
US11177108B2 (en) 2018-03-30 2021-11-16 Hitachi High-Tech Corporation Charged particle beam application apparatus
WO2020055894A1 (en) * 2018-09-10 2020-03-19 Exogenesis Corporation Method and apparatus to eliminate contaminants from an accelerated neutral atom beam to protect a beam target
CN115917698A (zh) 2020-06-10 2023-04-04 Asml荷兰有限公司 带电粒子设备的可更换模块

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6062045A (ja) 1983-09-14 1985-04-10 Hitachi Ltd イオンマイクロビ−ム打込み装置
AT391771B (de) 1987-03-05 1990-11-26 Ims Ionen Mikrofab Syst Einrichtung zur verkleinernden oder 1 : 1 ionenprojektionslithographie
US4985634A (en) 1988-06-02 1991-01-15 Oesterreichische Investitionskredit Aktiengesellschaft And Ionen Mikrofabrications Ion beam lithography
JP3358336B2 (ja) * 1994-10-14 2002-12-16 日新電機株式会社 イオン注入装置における注入条件異常検出方法
EP1150327B1 (en) * 2000-04-27 2018-02-14 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Multi beam charged particle device
US6593152B2 (en) * 2000-11-02 2003-07-15 Ebara Corporation Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
US6768125B2 (en) 2002-01-17 2004-07-27 Ims Nanofabrication, Gmbh Maskless particle-beam system for exposing a pattern on a substrate
JP2004342341A (ja) * 2003-05-13 2004-12-02 Hitachi High-Technologies Corp ミラー電子顕微鏡及びそれを用いたパターン欠陥検査装置
JP4560712B2 (ja) 2003-07-18 2010-10-13 イーエムエス ナノファブリカツィオン アーゲー 超高および超低運動イオン・エネルギーによるターゲットのイオン照射
JP4738723B2 (ja) 2003-08-06 2011-08-03 キヤノン株式会社 マルチ荷電粒子線描画装置、荷電粒子線の電流の測定方法及びデバイス製造方法
EP2575144B1 (en) * 2003-09-05 2017-07-12 Carl Zeiss Microscopy GmbH Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
JP4092280B2 (ja) * 2003-10-23 2008-05-28 株式会社東芝 荷電ビーム装置および荷電粒子検出方法
JP2006127879A (ja) * 2004-10-28 2006-05-18 Jeol Ltd 多極子
JP2006228667A (ja) * 2005-02-21 2006-08-31 Nissin Ion Equipment Co Ltd イオン照射装置
JP2006108697A (ja) * 2005-11-04 2006-04-20 Hitachi Ltd イオン注入方法およびその装置

Also Published As

Publication number Publication date
JP2008159584A (ja) 2008-07-10
US7763851B2 (en) 2010-07-27
NL2001066C2 (nl) 2010-01-28
US20080149846A1 (en) 2008-06-26
JP5318406B2 (ja) 2013-10-16

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Legal Events

Date Code Title Description
AD1A A request for search or an international type search has been filed
RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)
PD2B A search report has been drawn up
UD Registration of licences with regard to patents

Name of requester: INTEL CORPORATION

Effective date: 20100525

PD Change of ownership

Owner name: IMS NANOFABRICATION GMBH; AT

Free format text: DETAILS ASSIGNMENT: CHANGE OF OWNER(S), CHANGE OF LEGAL ENTITY; FORMER OWNER NAME: IMS NANOFABRICATION AG

Effective date: 20171214