NL189626B - METHOD FOR PREPARING NEW PHOTOSENSITICAL MATERIALS AND PHOTOSENSITIVE MANUFACTURED THEREFROM - Google Patents

METHOD FOR PREPARING NEW PHOTOSENSITICAL MATERIALS AND PHOTOSENSITIVE MANUFACTURED THEREFROM

Info

Publication number
NL189626B
NL189626B NLAANVRAGE7214212,A NL7214212A NL189626B NL 189626 B NL189626 B NL 189626B NL 7214212 A NL7214212 A NL 7214212A NL 189626 B NL189626 B NL 189626B
Authority
NL
Netherlands
Prior art keywords
azido
alpha
acetic acid
cyano
acid
Prior art date
Application number
NLAANVRAGE7214212,A
Other languages
Dutch (nl)
Other versions
NL189626C (en
NL7214212A (en
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of NL7214212A publication Critical patent/NL7214212A/xx
Publication of NL189626B publication Critical patent/NL189626B/en
Application granted granted Critical
Publication of NL189626C publication Critical patent/NL189626C/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C247/00—Compounds containing azido groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00—Carboxylic acid nitriles
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1477—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass
    • C08G85/004—Modification of polymers by chemical after-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/40—Chemical modification of a polymer taking place solely at one end or both ends of the polymer backbone, i.e. not in the side or lateral chains

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Polymerisation Methods In General (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Epoxy Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

1377747 Azido substituted carboxylic acids HOWSON-ALGRAPHY Ltd 17 Oct 1972 [22 Oct 1971] 49297/71 Heading C2C [Also in Divisions C3 and G2] The preparation of the following acids and their acid chlorides is disclosed: 4-azido-α- bromo-#-chlorocinnamylidene acetic acid (I); 4 - azido - 8 - chlorocinnamylidene acetic acid; 4 - azido - α - cyano - 8 - chlorocinnamylidene acetic acid; 4-azido-α-cyano-cinnamylidene acetic acid; 3-azido-benzylidene-α-cyanoacetic acid; 4 - azido - 2 - chlorobenzylidene - α- cyanoacetic acid; 4-azido-3,5-dibromobenzylidene - α - cyanoacetic acid; 3 - azido - 4- methyl - benzylidene - α - cyano acetic acid; 3 - azido - 4 - methoxy - benzylidene - α - cyano acetic acid; and 4 - azido - benzylidene - α- bromo-cyano acetic acid. In an example I is prepared by reacting 4-azido-#-chlorocinnamaldehyde (cf. U.S. Specification 3,598,844) dissolved in glacial acetic acid with cyano acetic acid. The acid chloride is obtained by further reaction with thionyl chloride.
NLAANVRAGE7214212,A 1971-10-22 1972-10-20 METHOD FOR PREPARING NEW PHOTOSENSITICAL MATERIALS AND PHOTOSENSITIVE MANUFACTURED THEREFROM NL189626C (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB4929771A GB1377747A (en) 1971-10-22 1971-10-22 Light sensitive materials

Publications (3)

Publication Number Publication Date
NL7214212A NL7214212A (en) 1973-04-25
NL189626B true NL189626B (en) 1993-01-04
NL189626C NL189626C (en) 1993-06-01

Family

ID=10451864

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE7214212,A NL189626C (en) 1971-10-22 1972-10-20 METHOD FOR PREPARING NEW PHOTOSENSITICAL MATERIALS AND PHOTOSENSITIVE MANUFACTURED THEREFROM

Country Status (20)

Country Link
JP (1) JPS578126B2 (en)
AT (1) AT322977B (en)
AU (1) AU473438B2 (en)
BE (1) BE790383A (en)
CA (1) CA986638A (en)
CH (1) CH558400A (en)
CS (1) CS171174B2 (en)
DD (1) DD102222A5 (en)
DE (1) DE2251828C2 (en)
ES (1) ES408109A1 (en)
FI (1) FI57183C (en)
FR (1) FR2156906B1 (en)
GB (1) GB1377747A (en)
IN (1) IN137774B (en)
IT (1) IT975318B (en)
NL (1) NL189626C (en)
NO (1) NO137104C (en)
SE (1) SE393621B (en)
SU (1) SU493984A3 (en)
ZA (1) ZA727353B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1466252A (en) * 1973-04-26 1977-03-02 Vickers Ltd Light-sensitive material
JPS5312984A (en) * 1976-07-21 1978-02-06 Konishiroku Photo Ind Photosensitive composition
GB8802314D0 (en) * 1988-02-03 1988-03-02 Vickers Plc Improvements in/relating to radiation-sensitive compounds
JP2944296B2 (en) 1992-04-06 1999-08-30 富士写真フイルム株式会社 Manufacturing method of photosensitive lithographic printing plate
US7629016B2 (en) * 2002-06-10 2009-12-08 Council of Industrial and Scientific Research Process for photochemical activation of polymer surface and immobilization of biomolecules onto the activated surface

Also Published As

Publication number Publication date
DE2251828C2 (en) 1983-01-27
CA986638A (en) 1976-03-30
ZA727353B (en) 1973-06-27
CS171174B2 (en) 1976-10-29
GB1377747A (en) 1974-12-18
SE393621B (en) 1977-05-16
CH558400A (en) 1975-01-31
IN137774B (en) 1975-09-20
NO137104C (en) 1977-12-28
DD102222A5 (en) 1973-12-05
FR2156906B1 (en) 1979-03-16
SU493984A3 (en) 1975-11-28
FI57183C (en) 1980-06-10
JPS4850801A (en) 1973-07-17
NO137104B (en) 1977-09-19
AU473438B2 (en) 1976-06-24
BE790383A (en) 1973-02-15
FR2156906A1 (en) 1973-06-01
JPS578126B2 (en) 1982-02-15
AT322977B (en) 1975-06-25
NL189626C (en) 1993-06-01
DE2251828A1 (en) 1973-04-26
IT975318B (en) 1974-07-20
ES408109A1 (en) 1975-10-01
AU4795272A (en) 1974-04-26
NL7214212A (en) 1973-04-25
FI57183B (en) 1980-02-29

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Legal Events

Date Code Title Description
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
BC A request for examination has been filed
A85 Still pending on 85-01-01
CNR Transfer of rights (patent application after its laying open for public inspection)

Free format text: PONT DE NEMOURS AND COMPANY. E.I. DU -