NL165303B - METHOD FOR PREPARING A PHOTOGRAPHICALLY RESISTANT MIXTURE AND RESISTANT ELEMENT CONTAINING A LAYER OF SUCH MIXTURE - Google Patents

METHOD FOR PREPARING A PHOTOGRAPHICALLY RESISTANT MIXTURE AND RESISTANT ELEMENT CONTAINING A LAYER OF SUCH MIXTURE

Info

Publication number
NL165303B
NL165303B NL7117776A NL7117776A NL165303B NL 165303 B NL165303 B NL 165303B NL 7117776 A NL7117776 A NL 7117776A NL 7117776 A NL7117776 A NL 7117776A NL 165303 B NL165303 B NL 165303B
Authority
NL
Netherlands
Prior art keywords
mixture
resistant
photographically
preparing
layer
Prior art date
Application number
NL7117776A
Other languages
Dutch (nl)
Other versions
NL165303C (en
NL7117776A (en
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of NL7117776A publication Critical patent/NL7117776A/xx
Publication of NL165303B publication Critical patent/NL165303B/en
Application granted granted Critical
Publication of NL165303C publication Critical patent/NL165303C/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025—Crosslinking or vulcanising agents; including accelerators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12—Using specific substances
    • H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax, thiol
    • H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/064—Photoresists
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
NL7117776A 1970-12-23 1971-12-23 METHOD FOR PREPARING A PHOTOGRAPHICALLY RESISTANT MIXTURE AND RESISTANT ELEMENT CONTAINING A LAYER OF SUCH MIXTURE NL165303C (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10116870A 1970-12-23 1970-12-23

Publications (3)

Publication Number Publication Date
NL7117776A NL7117776A (en) 1972-06-27
NL165303B true NL165303B (en) 1980-10-15
NL165303C NL165303C (en) 1981-03-16

Family

ID=22283348

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7117776A NL165303C (en) 1970-12-23 1971-12-23 METHOD FOR PREPARING A PHOTOGRAPHICALLY RESISTANT MIXTURE AND RESISTANT ELEMENT CONTAINING A LAYER OF SUCH MIXTURE

Country Status (7)

Country Link
JP (1) JPS515934B1 (en)
BE (1) BE777193A (en)
CA (1) CA980163A (en)
DE (1) DE2162207C3 (en)
FR (1) FR2119620A5 (en)
GB (1) GB1378867A (en)
NL (1) NL165303C (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2448821C2 (en) * 1974-10-14 1986-01-30 Hoechst Ag, 6230 Frankfurt Method of transferring a thermoplastic photopolymerizable layer and layer transfer material

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR65803E (en) * 1950-03-09 1956-03-21
US2732301A (en) * 1952-10-15 1956-01-24 Chxcxch
GB1152368A (en) * 1965-05-25 1969-05-14 Konishiroku Photo Ind Reprographic Process
US3376139A (en) * 1966-02-01 1968-04-02 Gilano Michael Nicholas Photosensitive prepolymer composition and method
GB1141544A (en) * 1966-07-13 1969-01-29 Gordon Owen Shipton Polymer compositions

Also Published As

Publication number Publication date
GB1378867A (en) 1974-12-27
BE777193A (en) 1972-06-23
JPS515934B1 (en) 1976-02-24
NL165303C (en) 1981-03-16
DE2162207C3 (en) 1984-07-19
NL7117776A (en) 1972-06-27
CA980163A (en) 1975-12-23
FR2119620A5 (en) 1972-08-04
DE2162207B2 (en) 1976-09-16
DE2162207A1 (en) 1972-06-29

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee