GB1378867A - Photocrosslinkable compositions and elements containing heterocyclic nitrogen-containing compounds - Google Patents

Photocrosslinkable compositions and elements containing heterocyclic nitrogen-containing compounds

Info

Publication number
GB1378867A
GB1378867A GB5968571A GB5968571A GB1378867A GB 1378867 A GB1378867 A GB 1378867A GB 5968571 A GB5968571 A GB 5968571A GB 5968571 A GB5968571 A GB 5968571A GB 1378867 A GB1378867 A GB 1378867A
Authority
GB
United Kingdom
Prior art keywords
composition
mixture
heterocyclic compound
photocrosslinkable
polyvinyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5968571A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of GB1378867A publication Critical patent/GB1378867A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025—Crosslinking or vulcanising agents; including accelerators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12—Using specific substances
    • H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax, thiol
    • H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/064—Photoresists
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane

Abstract

1378867 Photocrosslinkable polymer compositions E I DU PONT DE NEMOURS & CO 22 Dec 1971 [23 Dec 1970] 59685/71 Headings C3P and C3R [Also in Divisions G2 C7 and H1] A photocrosslinkable composition comprises a photosenstive organic polymer which uniformly cross-links upon exposure to actinic radiation but which is incapable of linear addition polymerization and up to 1% by weight of a heterocyclic nitrogen containing compound of the formula where R is an optionally substituted ortho divalent aromatic hydrocarbon group, X is CH 2 , NH, NCl, S, O or Se and Z is N or CY where Y is H, NH 2 , a C 1 -C 4 alkyl radical or halogen, the amount of the heterocyclic compound being based on the weight of the composition excluding the heterocyclic compound and being determined on a dry weight basis where "dry" indicates the condition of the composition at the time when it is processed to form a resist. The mixture may contain light sensitive initiators, e.g. azides, diazo compounds or metal dichromates. The heterocyclic compound improves the adhesion of the composition to substrates. In the examples one of benzotriazole, 1-chlorobenzotriazole, benzimidazole, 5-methylbenzimidazole, 2-aminobenzimidazole, 2- methylbenzimidazole or 5-nitrobenzimidazole is added to a mixture of one of the following polymers, polyvinyl cinnamate, polyvinyl alcohol, diallylisophthalate prepolymer, a polyamide (prepared from methyl linolenate and ethylene diamine), polyvinyl anisyl acetophenone (prepared by reacting polystyrene with acetyl chloride then with anisaldehyde), or a mixture of the prepolymer with polymethylmethacrylate with one or more of methyl ethyl ketone, triethylene glycol diacetate, xylene, isopropanol, water and ethylene glycol and one of 2-t-butyl-anthraquinone 4,41- bisdimethylamino benzophenone, ammonium dichromate and disodium 4,4<SP>1</SP>-diazidostilbene and the resulting composition is applied to a substrate and exposed imagewise.
GB5968571A 1970-12-23 1971-12-22 Photocrosslinkable compositions and elements containing heterocyclic nitrogen-containing compounds Expired GB1378867A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10116870A 1970-12-23 1970-12-23

Publications (1)

Publication Number Publication Date
GB1378867A true GB1378867A (en) 1974-12-27

Family

ID=22283348

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5968571A Expired GB1378867A (en) 1970-12-23 1971-12-22 Photocrosslinkable compositions and elements containing heterocyclic nitrogen-containing compounds

Country Status (7)

Country Link
JP (1) JPS515934B1 (en)
BE (1) BE777193A (en)
CA (1) CA980163A (en)
DE (1) DE2162207C3 (en)
FR (1) FR2119620A5 (en)
GB (1) GB1378867A (en)
NL (1) NL165303C (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2448821C2 (en) * 1974-10-14 1986-01-30 Hoechst Ag, 6230 Frankfurt Method of transferring a thermoplastic photopolymerizable layer and layer transfer material

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR65803E (en) * 1950-03-09 1956-03-21
US2732301A (en) * 1952-10-15 1956-01-24 Chxcxch
GB1152368A (en) * 1965-05-25 1969-05-14 Konishiroku Photo Ind Reprographic Process
US3376139A (en) * 1966-02-01 1968-04-02 Gilano Michael Nicholas Photosensitive prepolymer composition and method
GB1141544A (en) * 1966-07-13 1969-01-29 Gordon Owen Shipton Polymer compositions

Also Published As

Publication number Publication date
BE777193A (en) 1972-06-23
JPS515934B1 (en) 1976-02-24
NL165303C (en) 1981-03-16
DE2162207C3 (en) 1984-07-19
NL7117776A (en) 1972-06-27
CA980163A (en) 1975-12-23
FR2119620A5 (en) 1972-08-04
DE2162207B2 (en) 1976-09-16
DE2162207A1 (en) 1972-06-29
NL165303B (en) 1980-10-15

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee