NL146222B - METHOD FOR COVERING AN UNDERLAY WITH A LAYER OF ALUMINUM. - Google Patents

METHOD FOR COVERING AN UNDERLAY WITH A LAYER OF ALUMINUM.

Info

Publication number
NL146222B
NL146222B NL676708057A NL6708057A NL146222B NL 146222 B NL146222 B NL 146222B NL 676708057 A NL676708057 A NL 676708057A NL 6708057 A NL6708057 A NL 6708057A NL 146222 B NL146222 B NL 146222B
Authority
NL
Netherlands
Prior art keywords
underlay
covering
aluminum
layer
Prior art date
Application number
NL676708057A
Other languages
Dutch (nl)
Other versions
NL6708057A (en
Original Assignee
Dow Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Chemical Co filed Critical Dow Chemical Co
Publication of NL6708057A publication Critical patent/NL6708057A/xx
Publication of NL146222B publication Critical patent/NL146222B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
NL676708057A 1966-06-20 1967-06-09 METHOD FOR COVERING AN UNDERLAY WITH A LAYER OF ALUMINUM. NL146222B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US55858366A 1966-06-20 1966-06-20

Publications (2)

Publication Number Publication Date
NL6708057A NL6708057A (en) 1967-12-21
NL146222B true NL146222B (en) 1975-06-16

Family

ID=24230124

Family Applications (1)

Application Number Title Priority Date Filing Date
NL676708057A NL146222B (en) 1966-06-20 1967-06-09 METHOD FOR COVERING AN UNDERLAY WITH A LAYER OF ALUMINUM.

Country Status (7)

Country Link
US (1) US3462288A (en)
BE (1) BE700145A (en)
CH (1) CH496104A (en)
DE (1) DE1621227B2 (en)
GB (1) GB1122359A (en)
LU (1) LU53900A1 (en)
NL (1) NL146222B (en)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4828774B1 (en) * 1968-05-18 1973-09-04
US3639139A (en) * 1968-10-07 1972-02-01 Dow Chemical Co Aluminum plating process
US3655433A (en) * 1970-07-06 1972-04-11 Standard Oil Co Platable polymers
US3787225A (en) * 1971-05-10 1974-01-22 Dow Chemical Co Aluminum plating process
US3751288A (en) * 1971-06-23 1973-08-07 Dow Chemical Co Solidifying a thin layer of metal on plastic film
US3836385A (en) * 1972-02-02 1974-09-17 Dow Chemical Co Cyclic sulfonium zwitterion-titanium catalysts for aluminum plating process
US3969555A (en) * 1972-03-30 1976-07-13 The Dow Chemical Company Aluminum plating corrosion resistance
US3895131A (en) * 1974-02-21 1975-07-15 Xerox Corp Electroless coating method
US4132816A (en) * 1976-02-25 1979-01-02 United Technologies Corporation Gas phase deposition of aluminum using a complex aluminum halide of an alkali metal or an alkaline earth metal as an activator
DE2635798C3 (en) * 1976-08-09 1980-10-16 Siemens Ag, 1000 Berlin Und 8000 Muenchen Process for the electroless catalytic deposition of aluminum, catalytic bath and aluminizing bath
US4489102A (en) * 1983-04-04 1984-12-18 At&T Technologies, Inc. Radiation-stimulated deposition of aluminum
US4923717A (en) * 1989-03-17 1990-05-08 Regents Of The University Of Minnesota Process for the chemical vapor deposition of aluminum
US5273775A (en) * 1990-09-12 1993-12-28 Air Products And Chemicals, Inc. Process for selectively depositing copper aluminum alloy onto a substrate
US5191099A (en) * 1991-09-05 1993-03-02 Regents Of The University Of Minnesota Chemical vapor deposition of aluminum films using dimethylethylamine alane
US5885321A (en) * 1996-07-22 1999-03-23 The United States Of America As Represented By The Secretary Of The Navy Preparation of fine aluminum powders by solution methods
JP3920802B2 (en) * 2003-03-28 2007-05-30 Ｊｓｒ株式会社 Wiring, electrode and method for forming them
WO2010011974A1 (en) * 2008-07-24 2010-01-28 Kovio, Inc. Aluminum inks and methods of making the same, methods for depositing aluminum inks, and films formed by printing and/or depositing an aluminum ink
US9803283B1 (en) * 2013-10-18 2017-10-31 Hrl Laboratories, Llc Method of electroless deposition of aluminum or aluminum alloy, an electroless plating composition, and an article including the same
CN104003444B (en) * 2014-06-16 2015-11-18 攀钢集团攀枝花钢铁研究院有限公司 A kind of method preparing dichloro vanadyl

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL225795A (en) * 1957-03-14
US3206326A (en) * 1961-11-27 1965-09-14 Ethyl Corp Aluminum intermittent plating process

Also Published As

Publication number Publication date
NL6708057A (en) 1967-12-21
BE700145A (en) 1967-12-19
CH496104A (en) 1970-09-15
US3462288A (en) 1969-08-19
DE1621227B2 (en) 1972-08-17
DE1621227A1 (en) 1971-04-29
GB1122359A (en) 1968-08-07
LU53900A1 (en) 1967-10-04

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