NL139108B - Met een o-naftochinondiazidesulfonzuurderivaat voorgesensibiliseerde drukplaten. - Google Patents

Met een o-naftochinondiazidesulfonzuurderivaat voorgesensibiliseerde drukplaten.

Info

Publication number
NL139108B
NL139108B NL6407379A NL6407379A NL139108B NL 139108 B NL139108 B NL 139108B NL 6407379 A NL6407379 A NL 6407379A NL 6407379 A NL6407379 A NL 6407379A NL 139108 B NL139108 B NL 139108B
Authority
NL
Netherlands
Prior art keywords
naftochinondiazide
sensitized
acid derivative
sulphonic acid
pressure plates
Prior art date
Application number
NL6407379A
Other languages
English (en)
Other versions
NL6407379A (nl
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of NL6407379A publication Critical patent/NL6407379A/xx
Publication of NL139108B publication Critical patent/NL139108B/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G03C1/61—Compositions containing diazo compounds as photosensitive substances with non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • ing And Chemical Polishing (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
NL6407379A 1963-07-12 1964-06-29 Met een o-naftochinondiazidesulfonzuurderivaat voorgesensibiliseerde drukplaten. NL139108B (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK0050208 1963-07-12

Publications (2)

Publication Number Publication Date
NL6407379A NL6407379A (nl) 1965-01-13
NL139108B true NL139108B (nl) 1973-06-15

Family

ID=7225526

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6407379A NL139108B (nl) 1963-07-12 1964-06-29 Met een o-naftochinondiazidesulfonzuurderivaat voorgesensibiliseerde drukplaten.

Country Status (7)

Country Link
AT (1) AT248472B (nl)
BE (1) BE650332A (nl)
CH (1) CH433988A (nl)
DE (1) DE1447011A1 (nl)
GB (1) GB1039475A (nl)
NL (1) NL139108B (nl)
SE (1) SE306013B (nl)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023328B1 (nl) * 1971-06-25 1975-08-07
DE2331377C2 (de) * 1973-06-20 1982-10-14 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Kopiermaterial
US4009033A (en) * 1975-09-22 1977-02-22 International Business Machines Corporation High speed positive photoresist composition
GB1604652A (en) * 1977-04-12 1981-12-16 Vickers Ltd Radiation sensitive materials
JPS57163234A (en) * 1981-04-01 1982-10-07 Fuji Photo Film Co Ltd Photosensitive composition
DE3222684A1 (de) * 1981-06-19 1983-05-05 Sericol Group Ltd., London Lichtempfindliche zubereitung und deren verwendung
US4828960A (en) * 1985-01-07 1989-05-09 Honeywell Inc. Reflection limiting photoresist composition with two azo dyes
US5334481A (en) * 1985-05-02 1994-08-02 Ciba-Geigy Corporation Positive diazo quinone photoresist compositions containing antihalation compound
US4672021A (en) * 1985-06-03 1987-06-09 Fairmount Chemical Company Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder
JP2614847B2 (ja) * 1986-06-16 1997-05-28 東京応化工業 株式会社 ポジ型感光性組成物
US4818658A (en) * 1987-04-17 1989-04-04 Shipley Company Inc. Photoactive esterification product of a diazooxide compound and a curcumin dye and photoresist materials with product

Also Published As

Publication number Publication date
CH433988A (de) 1967-04-15
GB1039475A (en) 1966-08-17
BE650332A (nl) 1965-01-11
SE306013B (nl) 1968-11-11
DE1447011A1 (de) 1969-01-02
AT248472B (de) 1966-07-25
NL6407379A (nl) 1965-01-13

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Legal Events

Date Code Title Description
NL80 Abbreviated name of patent owner mentioned of already nullified patent

Owner name: KALLE

V4 Lapsed because of reaching the maxim lifetime of a patent