CH433988A - Vorsensibilisierte Druckplatte - Google Patents

Vorsensibilisierte Druckplatte

Info

Publication number
CH433988A
CH433988A CH901064A CH901064A CH433988A CH 433988 A CH433988 A CH 433988A CH 901064 A CH901064 A CH 901064A CH 901064 A CH901064 A CH 901064A CH 433988 A CH433988 A CH 433988A
Authority
CH
Switzerland
Prior art keywords
printing plate
presensitized printing
presensitized
plate
printing
Prior art date
Application number
CH901064A
Other languages
English (en)
Inventor
Loni Dipl Chem Schell
Fritz Dr Uhlig
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of CH433988A publication Critical patent/CH433988A/de

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • G03C1/61Compositions containing diazo compounds as photosensitive substances with non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • ing And Chemical Polishing (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
CH901064A 1963-07-12 1964-07-09 Vorsensibilisierte Druckplatte CH433988A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK0050208 1963-07-12

Publications (1)

Publication Number Publication Date
CH433988A true CH433988A (de) 1967-04-15

Family

ID=7225526

Family Applications (1)

Application Number Title Priority Date Filing Date
CH901064A CH433988A (de) 1963-07-12 1964-07-09 Vorsensibilisierte Druckplatte

Country Status (7)

Country Link
AT (1) AT248472B (de)
BE (1) BE650332A (de)
CH (1) CH433988A (de)
DE (1) DE1447011A1 (de)
GB (1) GB1039475A (de)
NL (1) NL139108B (de)
SE (1) SE306013B (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023328B1 (de) * 1971-06-25 1975-08-07
DE2331377C2 (de) * 1973-06-20 1982-10-14 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Kopiermaterial
US4009033A (en) * 1975-09-22 1977-02-22 International Business Machines Corporation High speed positive photoresist composition
GB1604652A (en) * 1977-04-12 1981-12-16 Vickers Ltd Radiation sensitive materials
JPS57163234A (en) * 1981-04-01 1982-10-07 Fuji Photo Film Co Ltd Photosensitive composition
DE3222684A1 (de) * 1981-06-19 1983-05-05 Sericol Group Ltd., London Lichtempfindliche zubereitung und deren verwendung
US4828960A (en) * 1985-01-07 1989-05-09 Honeywell Inc. Reflection limiting photoresist composition with two azo dyes
US5334481A (en) * 1985-05-02 1994-08-02 Ciba-Geigy Corporation Positive diazo quinone photoresist compositions containing antihalation compound
US4672021A (en) * 1985-06-03 1987-06-09 Fairmount Chemical Company Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder
JP2614847B2 (ja) * 1986-06-16 1997-05-28 東京応化工業 株式会社 ポジ型感光性組成物
US4818658A (en) * 1987-04-17 1989-04-04 Shipley Company Inc. Photoactive esterification product of a diazooxide compound and a curcumin dye and photoresist materials with product

Also Published As

Publication number Publication date
SE306013B (de) 1968-11-11
DE1447011A1 (de) 1969-01-02
AT248472B (de) 1966-07-25
GB1039475A (en) 1966-08-17
NL139108B (nl) 1973-06-15
BE650332A (de) 1965-01-11
NL6407379A (de) 1965-01-13

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