NL135006C - - Google Patents

Info

Publication number
NL135006C
NL135006C NL135006DA NL135006C NL 135006 C NL135006 C NL 135006C NL 135006D A NL135006D A NL 135006DA NL 135006 C NL135006 C NL 135006C
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL135006C publication Critical patent/NL135006C/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/02Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion materials in the solid state
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
NL135006D 1958-12-24 NL135006C (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US782874A US2975080A (en) 1958-12-24 1958-12-24 Production of controlled p-n junctions

Publications (1)

Publication Number Publication Date
NL135006C true NL135006C (xx)

Family

ID=25127455

Family Applications (2)

Application Number Title Priority Date Filing Date
NL246742D NL246742A (xx) 1958-12-24
NL135006D NL135006C (xx) 1958-12-24

Family Applications Before (1)

Application Number Title Priority Date Filing Date
NL246742D NL246742A (xx) 1958-12-24

Country Status (5)

Country Link
US (1) US2975080A (xx)
DE (1) DE1246685B (xx)
FR (1) FR1242704A (xx)
GB (1) GB929575A (xx)
NL (2) NL135006C (xx)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3220896A (en) * 1961-07-17 1965-11-30 Raytheon Co Transistor
US3183131A (en) * 1961-08-23 1965-05-11 Motorola Inc Semiconductor diffusion method
NL272046A (xx) * 1961-11-30
US3437533A (en) * 1966-12-13 1969-04-08 Rca Corp Method of fabricating semiconductor devices
US3479234A (en) * 1967-05-01 1969-11-18 Gen Electric Method of producing field effect transistors
US3658606A (en) * 1969-04-01 1972-04-25 Ibm Diffusion source and method of producing same
US3650854A (en) * 1970-08-03 1972-03-21 Ibm Method of fabricating a transistor having improved emitter-base junction breakdown voltage characteristics
US3767485A (en) * 1971-12-29 1973-10-23 A Sahagun Method for producing improved pn junction
JPS5062385A (xx) * 1973-10-02 1975-05-28
US4740477A (en) * 1985-10-04 1988-04-26 General Instrument Corporation Method for fabricating a rectifying P-N junction having improved breakdown voltage characteristics
US5166769A (en) * 1988-07-18 1992-11-24 General Instrument Corporation Passitvated mesa semiconductor and method for making same
US4980315A (en) * 1988-07-18 1990-12-25 General Instrument Corporation Method of making a passivated P-N junction in mesa semiconductor structure
EA012664B1 (ru) * 2005-02-18 2009-12-30 Агк Флэт Гласс Юроп Са Способ селективного травления поверхности стеклянного изделия
CN109309001B (zh) * 2017-07-26 2022-05-03 天津环鑫科技发展有限公司 一种采用印刷工艺制作gpp芯片的方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2629800A (en) * 1950-04-15 1953-02-24 Bell Telephone Labor Inc Semiconductor signal translating device
US2695852A (en) * 1952-02-15 1954-11-30 Bell Telephone Labor Inc Fabrication of semiconductors for signal translating devices
US2796562A (en) * 1952-06-02 1957-06-18 Rca Corp Semiconductive device and method of fabricating same
BE530566A (xx) * 1953-07-22
US2804405A (en) * 1954-12-24 1957-08-27 Bell Telephone Labor Inc Manufacture of silicon devices
US2845374A (en) * 1955-05-23 1958-07-29 Texas Instruments Inc Semiconductor unit and method of making same
NL207910A (xx) * 1955-06-20
US2921362A (en) * 1955-06-27 1960-01-19 Honeywell Regulator Co Process for the production of semiconductor devices
US2898247A (en) * 1955-10-24 1959-08-04 Ibm Fabrication of diffused junction semi-conductor devices
US2828232A (en) * 1956-05-01 1958-03-25 Hughes Aircraft Co Method for producing junctions in semi-conductor device
US2929751A (en) * 1956-11-15 1960-03-22 Gen Electric Co Ltd Manufacture of semiconductor devices

Also Published As

Publication number Publication date
US2975080A (en) 1961-03-14
FR1242704A (fr) 1960-09-30
NL246742A (xx)
DE1246685B (de) 1967-08-10
GB929575A (en) 1963-06-26

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