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NL156092B
(nl)
*
|
1968-03-25 |
1978-03-15 |
Polychrome Corp |
Werkwijze voor de vervaardiging van een lithografische drukplaat.
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US3867147A
(en)
*
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1969-05-20 |
1975-02-18 |
Hoechst Co American |
Light-sensitive diazo compounds and reproduction material employing the same
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US3891516A
(en)
*
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1970-08-03 |
1975-06-24 |
Polychrome Corp |
Process of electrolyically anodizing a mechanically grained aluminum base and article made thereby
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US3790382A
(en)
*
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1971-04-16 |
1974-02-05 |
Minnesota Mining & Mfg |
Fluorinated polyamide-diazo resin coating composition
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JPS5539825B2
(nl)
*
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1972-05-12 |
1980-10-14 |
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US3997349A
(en)
*
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1974-06-17 |
1976-12-14 |
Minnesota Mining And Manufacturing Company |
Light-sensitive development-free driographic printing plate
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US4230492A
(en)
*
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1978-01-17 |
1980-10-28 |
The Richardson Company |
Aryl sulfonic acid based stabilizers for presensitized planographic plates
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US4299907A
(en)
*
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1978-08-10 |
1981-11-10 |
Polychrome Corporation |
Storage stable photosensitive diazo lithographic printing plates
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US4414315A
(en)
*
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1979-08-06 |
1983-11-08 |
Howard A. Fromson |
Process for making lithographic printing plate
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US4401743A
(en)
*
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1980-04-30 |
1983-08-30 |
Minnesota Mining And Manufacturing Company |
Aqueous developable photosensitive composition and printing plate
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US4326020A
(en)
*
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1980-09-10 |
1982-04-20 |
Polychrome Corporation |
Method of making positive acting diazo lithographic printing plate
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US4499170A
(en)
*
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1983-06-17 |
1985-02-12 |
Richardson Graphics Company |
Lithographic plates and photoresists having stabilized photosensitive diazo resin with theophylline derivative
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US5066568A
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*
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1985-08-05 |
1991-11-19 |
Hoehst Celanese Corporation |
Method of developing negative working photographic elements
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(en)
*
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1985-08-05 |
1990-12-25 |
Hoechst Celanese Corporation |
Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate
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US5122442A
(en)
*
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1989-07-28 |
1992-06-16 |
Hoechst Celanese Corporation |
Method for forming an image from a high speed screen printing composition on a screen mesh
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(en)
*
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1990-01-31 |
1993-08-03 |
Fuji Photo Film Co., Ltd. |
Ps plate for use in making lithographic printing plate requiring no dampening water utilizing irradiation cured primer layer containing polyurethane resin and diazonium salt polycondensate photopolymerizable light-sensitive layer and silicone rubber layer
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CN1037552C
(zh)
*
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1991-03-21 |
1998-02-25 |
北京大学 |
一种负性感光印刷版及其制法
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US5942368A
(en)
*
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1996-04-23 |
1999-08-24 |
Konica Corporation |
Pigment dispersion composition
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JP3567402B2
(ja)
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1996-06-12 |
2004-09-22 |
コニカミノルタホールディングス株式会社 |
平版印刷版用支持体の製造方法、その製造方法で得られる平版印刷版用支持体及びその支持体を用いた感光性平版印刷版
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EP2589636A4
(en)
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2010-07-02 |
2015-03-18 |
Dainippon Ink & Chemicals |
FLUOROSA TENSID AND COATING COMPOSITION AND PAINT COMPOSITION THEREWITH
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2013-01-31 |
2016-06-07 |
Halliburton Energy Services, Inc. |
Wellbore servicing compositions and methods of making and using same
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WO2021131726A1
(ja)
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2019-12-25 |
2021-07-01 |
Dic株式会社 |
重合体及び当該重合体を含むコーティング組成物
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US20230323002A1
(en)
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2020-09-03 |
2023-10-12 |
Dic Corporation |
Polymer, coating composition, resist composition, and article
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JP7288234B2
(ja)
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2020-12-17 |
2023-06-07 |
Dic株式会社 |
化合物、レベリング剤、コーティング組成物、レジスト組成物及び物品
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TW202311331A
(zh)
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2021-05-18 |
2023-03-16 |
日商Ｄｉｃ股份有限公司 |
含矽酮鏈的聚合物、塗敷組成物、抗蝕劑組成物及物品
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TW202336058A
(zh)
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2022-03-08 |
2023-09-16 |
日商Ｄｉｃ股份有限公司 |
化合物、該化合物的製造方法、調平劑、塗敷組成物、抗蝕劑組成物、硬化物及物品
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