NL124906C - - Google Patents

Info

Publication number
NL124906C
NL124906C NL124906DA NL124906C NL 124906 C NL124906 C NL 124906C NL 124906D A NL124906D A NL 124906DA NL 124906 C NL124906 C NL 124906C
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL124906C publication Critical patent/NL124906C/xx
Priority claimed from DES60887A external-priority patent/DE1139812B/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
NL124906D 1958-12-09 NL124906C (xx)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DES60887A DE1139812B (de) 1958-12-09 1958-12-09 Vorrichtung zur Gewinnung stabfoermiger Halbleiterkoerper und Verfahren zum Betrieb dieser Vorrichtung
DES81031A DE1220391B (de) 1958-12-09 1962-08-22 Vorrichtung zur Gewinnung stabfoermiger Halbleiterkoerper

Publications (1)

Publication Number Publication Date
NL124906C true NL124906C (xx)

Family

ID=25995608

Family Applications (3)

Application Number Title Priority Date Filing Date
NL295321D NL295321A (xx) 1958-12-09
NL124906D NL124906C (xx) 1958-12-09
NL246189D NL246189A (xx) 1958-12-09

Family Applications Before (1)

Application Number Title Priority Date Filing Date
NL295321D NL295321A (xx) 1958-12-09

Family Applications After (1)

Application Number Title Priority Date Filing Date
NL246189D NL246189A (xx) 1958-12-09

Country Status (6)

Country Link
US (2) US3134695A (xx)
CH (1) CH411804A (xx)
DE (1) DE1220391B (xx)
GB (1) GB997336A (xx)
NL (3) NL246189A (xx)
SE (1) SE309575B (xx)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3169892A (en) * 1959-04-08 1965-02-16 Jerome H Lemelson Method of making a multi-layer electrical circuit
NL295321A (xx) * 1958-12-09
DE1223804B (de) * 1961-01-26 1966-09-01 Siemens Ag Vorrichtung zur Gewinnung reinen Halbleitermaterials, wie Silicium
DE2050076C3 (de) * 1970-10-12 1980-06-26 Siemens Ag, 1000 Berlin Und 8000 Muenchen Vorrichtung zum Herstellen von Rohren aus Halbleitermaterial
US3756193A (en) * 1972-05-01 1973-09-04 Battelle Memorial Institute Coating apparatus
JPS5656649U (xx) * 1980-06-13 1981-05-16
US4805556A (en) * 1988-01-15 1989-02-21 Union Carbide Corporation Reactor system and method for forming uniformly large-diameter polycrystalline rods by the pyrolysis of silane
US5382419A (en) * 1992-09-28 1995-01-17 Advanced Silicon Materials, Inc. Production of high-purity polycrystalline silicon rod for semiconductor applications
US5478396A (en) * 1992-09-28 1995-12-26 Advanced Silicon Materials, Inc. Production of high-purity polycrystalline silicon rod for semiconductor applications
JP5477145B2 (ja) * 2009-04-28 2014-04-23 三菱マテリアル株式会社 多結晶シリコン反応炉

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1066564B (de) * 1959-10-08 Siemens iS. Halske Aktiengesellschaft, Berlin1 und1 München Verfahren zur Herstellung von reinstem Silicium für Halbleiteranordnungen
US1439410A (en) * 1921-06-14 1922-12-19 James H Gray Refractory material and furnace wall built thereof
US1912017A (en) * 1931-09-23 1933-05-30 Owens Illinois Glass Co Heat insulator
US2119259A (en) * 1932-06-15 1938-05-31 Owens Illinois Glass Co Method of making articles of vitreous material
US2801607A (en) * 1952-08-06 1957-08-06 Centre Nat Rech Scient Apparatus for applying material by thermal vaporization in the manufacture of electrical resistors
US2845894A (en) * 1953-03-04 1958-08-05 Oran T Mcilvaine Metallurgy
US2828225A (en) * 1954-03-01 1958-03-25 Sintercast Corp America Methods of infiltrating high melting skeleton bodies
NL130620C (xx) * 1954-05-18 1900-01-01
US2927004A (en) * 1955-05-31 1960-03-01 Bjorksten Res Lab Inc Preparation of pure silicon or germanium from their alkyls
US2883269A (en) * 1955-09-22 1959-04-21 Du Pont Production of elemental silicon
US2955466A (en) * 1955-12-01 1960-10-11 Robertshaw Fulton Controls Co Test probe
US3011877A (en) * 1956-06-25 1961-12-05 Siemens Ag Production of high-purity semiconductor materials for electrical purposes
US2890139A (en) * 1956-12-10 1959-06-09 Shockley William Semi-conductive material purification method and apparatus
US3081201A (en) * 1957-05-15 1963-03-12 Gen Electric Method of forming an electric capacitor
NL295321A (xx) * 1958-12-09
US2948635A (en) * 1959-01-12 1960-08-09 Gen Electric Phosphor evaporation method and apparatus
DE1082239B (de) * 1959-05-21 1960-05-25 Licentia Gmbh Verfahren zum Herstellen von Siliciumstaeben
NL256255A (xx) * 1959-11-02
US3098763A (en) * 1961-05-29 1963-07-23 Raytheon Co Chemical reactor

Also Published As

Publication number Publication date
US3134695A (en) 1964-05-26
SE309575B (xx) 1969-03-31
NL295321A (xx)
DE1220391B (de) 1966-07-07
GB997336A (en) 1965-07-07
NL246189A (xx)
CH411804A (de) 1966-04-30
US3358638A (en) 1967-12-19

Similar Documents

Publication Publication Date Title
JPS366718B1 (xx)
AT214638B (xx)
AT217439B (xx)
AT221043B (xx)
AT215747B (xx)
JPS3633566Y1 (xx)
AT213446B (xx)
AT215751B (xx)
AT213316B (xx)
AT213908B (xx)
AT216227B (xx)
JPS37009162B1 (xx)
AT219868B (xx)
AT213313B (xx)
AT215738B (xx)
AT219815B (xx)
AT214348B (xx)
AT214270B (xx)
AT216612B (xx)
AT216749B (xx)
AT216771B (xx)
AT213557B (xx)
FR1193823A (xx)
AT217982B (xx)
AT213337B (xx)