NL124459C - - Google Patents

Info

Publication number
NL124459C
NL124459C NL124459DA NL124459C NL 124459 C NL124459 C NL 124459C NL 124459D A NL124459D A NL 124459DA NL 124459 C NL124459 C NL 124459C
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL124459C publication Critical patent/NL124459C/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Electron Sources, Ion Sources (AREA)
NL124459D 1960-07-08 NL124459C (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CS438860 1960-07-08

Publications (1)

Publication Number Publication Date
NL124459C true NL124459C (ja)

Family

ID=5386503

Family Applications (2)

Application Number Title Priority Date Filing Date
NL124459D NL124459C (ja) 1960-07-08
NL266760D NL266760A (ja) 1960-07-08

Family Applications After (1)

Application Number Title Priority Date Filing Date
NL266760D NL266760A (ja) 1960-07-08

Country Status (4)

Country Link
DE (1) DE1142262B (ja)
FR (1) FR1294562A (ja)
GB (1) GB939275A (ja)
NL (2) NL266760A (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3314873A (en) * 1962-11-28 1967-04-18 Western Electric Co Method and apparatus for cathode sputtering using a cylindrical cathode
GB1039691A (en) * 1964-03-17 1966-08-17 Gen Precision Inc Vacuum coating and ion bombardment apparatus
US3318790A (en) * 1964-04-29 1967-05-09 Texas Instruments Inc Production of thin organic polymer by screened glow discharge
US3344055A (en) * 1964-04-29 1967-09-26 Texas Instruments Inc Apparatus for polymerizing and forming thin continuous films using a glow discharge
US3325393A (en) * 1964-05-28 1967-06-13 Gen Electric Electrical discharge cleaning and coating process
US3351543A (en) * 1964-05-28 1967-11-07 Gen Electric Process of coating diamond with an adherent metal coating using cathode sputtering
US3526584A (en) * 1964-09-25 1970-09-01 Western Electric Co Method of providing a field free region above a substrate during sputter-depositing thereon
US3507774A (en) * 1967-06-02 1970-04-21 Nat Res Corp Low energy sputtering apparatus for operation below one micron pressure
US3361659A (en) * 1967-08-14 1968-01-02 Ibm Process of depositing thin films by cathode sputtering using a controlled grid
US3530055A (en) * 1968-08-26 1970-09-22 Ibm Formation of layers of solids on substrates
US4132613A (en) * 1974-12-23 1979-01-02 Telic Corporation Glow discharge method and apparatus
US4288306A (en) * 1978-07-08 1981-09-08 Wolfgang Kieferle Process for forming a metal or alloy layer and device for executing same

Also Published As

Publication number Publication date
FR1294562A (fr) 1962-05-26
NL266760A (ja)
GB939275A (en) 1963-10-09
DE1142262B (de) 1963-01-10

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