NL1037087A1 - Interferometer calibration system and method. - Google Patents

Interferometer calibration system and method.

Info

Publication number
NL1037087A1
NL1037087A1 NL1037087A NL1037087A NL1037087A1 NL 1037087 A1 NL1037087 A1 NL 1037087A1 NL 1037087 A NL1037087 A NL 1037087A NL 1037087 A NL1037087 A NL 1037087A NL 1037087 A1 NL1037087 A1 NL 1037087A1
Authority
NL
Netherlands
Prior art keywords
calibration system
interferometer calibration
interferometer
calibration
Prior art date
Application number
NL1037087A
Other languages
English (en)
Other versions
NL1037087C2 (nl
Inventor
Geraint Owen
Original Assignee
Agilent Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agilent Technologies Inc filed Critical Agilent Technologies Inc
Publication of NL1037087A1 publication Critical patent/NL1037087A1/nl
Application granted granted Critical
Publication of NL1037087C2 publication Critical patent/NL1037087C2/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Length Measuring Devices By Optical Means (AREA)
NL1037087A 2008-07-25 2009-06-30 Interferometer calibration system and method. NL1037087C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US18017108 2008-07-25
US12/180,171 US8149420B2 (en) 2008-07-25 2008-07-25 Interferometer calibration system and method

Publications (2)

Publication Number Publication Date
NL1037087A1 true NL1037087A1 (nl) 2010-01-26
NL1037087C2 NL1037087C2 (nl) 2010-02-16

Family

ID=41361329

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1037087A NL1037087C2 (nl) 2008-07-25 2009-06-30 Interferometer calibration system and method.

Country Status (2)

Country Link
US (1) US8149420B2 (nl)
NL (1) NL1037087C2 (nl)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014165414A1 (en) * 2013-03-31 2014-10-09 Kla-Tencor Corporation Reducing registration error of front and back wafer surfaces utilizing a see-through calibration wafer
US9989864B2 (en) 2014-07-16 2018-06-05 Asml Netherlands B.V. Lithographic method and apparatus
JP6649636B2 (ja) * 2015-02-23 2020-02-19 株式会社ニコン 計測装置、リソグラフィシステム及び露光装置、並びにデバイス製造方法
DE102015106805A1 (de) * 2015-04-30 2016-11-03 Anton Paar Optotec Gmbh Temperaturkalibration für Messgerät
US10331045B2 (en) 2015-06-30 2019-06-25 Asml Netherlands B.V. Position measurement system and lithographic apparatus
CN105203031A (zh) * 2015-09-14 2015-12-30 中国科学院上海光学精密机械研究所 四倍光学细分的两轴外差光栅干涉仪
NL2017710A (en) 2015-11-30 2017-06-07 Asml Netherlands Bv Lithographic Method and Apparatus
WO2017190905A1 (en) * 2016-05-04 2017-11-09 Asml Netherlands B.V. Lithographic method and apparatus
CN107560553B (zh) * 2017-10-26 2019-11-22 清华大学 多轴激光位移测量系统中干涉仪的安装偏差标定方法
CN113847874B (zh) * 2021-08-20 2022-11-11 天津大学 一种基于视觉的位移台位移方向标定方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7256871B2 (en) 2004-07-27 2007-08-14 Asml Netherlands B.V. Lithographic apparatus and method for calibrating the same
US7283249B2 (en) 2005-04-08 2007-10-16 Asml Netherlands B.V. Lithographic apparatus and a method of calibrating such an apparatus
US7440113B2 (en) 2005-12-23 2008-10-21 Agilent Technologies, Inc. Littrow interferometer
CN103645608B (zh) * 2006-08-31 2016-04-20 株式会社尼康 曝光装置及方法、组件制造方法以及决定方法
US7545507B2 (en) 2007-03-15 2009-06-09 Agilent Technologies, Inc. Displacement measurement system

Also Published As

Publication number Publication date
US20100020330A1 (en) 2010-01-28
US8149420B2 (en) 2012-04-03
NL1037087C2 (nl) 2010-02-16

Similar Documents

Publication Publication Date Title
BRPI0913227A2 (pt) método, e objeto
BRPI0910723A2 (pt) aparelho e método de frenagem.
NL1037087A1 (nl) Interferometer calibration system and method.
BRPI0916450A2 (pt) método, e sistema
BRPI1014147A2 (pt) sistemas e métodos de medição de audiência distribuída.
NL2003118A1 (nl) Alignment system, lithographic system and method.
BRPI0923345A2 (pt) método, sistema, e artigo
BRPI0915433A2 (pt) método, e, dispositivo.
BRPI0917358A2 (pt) formulação farmacêutica de liberação controlada e método.
NL2002665A1 (nl) Time-domain reflectometer.
BRPI1006885A2 (pt) sistema de completação utilizável com um poço, e método utilizável com um poço
BRPI0919116A2 (pt) método
BRPI0912317A2 (pt) método de autenticação
BRPI1016117A2 (pt) derivados de isoxazol-isoxazol e isoxasol-isotiazol.
BRPI0912799A2 (pt) fluxímetro, e, método
BRPI0915705A2 (pt) método, artigo e sistema
BRPI0813569A2 (pt) Método de inspeção.
DK2313489T3 (da) Fremstillingsmetode
BRPI0913112A2 (pt) fluxímetro, e, método.
BRPI0913225A2 (pt) método, artigo, e sistema
BRPI0917784A2 (pt) sistema, e, método
DE112008003988A5 (de) Abstandsmesssystem
BRPI0917446A2 (pt) derivados de acilaminobenzamida.
BRPI0914827A2 (pt) método, e, sistema
BRPI0918084A2 (pt) método, e, sistema

Legal Events

Date Code Title Description
AD1B A search report has been drawn up
PD2B A search report has been drawn up
SD Assignments of patents

Effective date: 20141103

V1 Lapsed because of non-payment of the annual fee

Effective date: 20150101