NL1035210C2 - Belichtingsinrichting van een microlithografische projectie belichtingsinstallatie. - Google Patents

Belichtingsinrichting van een microlithografische projectie belichtingsinstallatie. Download PDF

Info

Publication number
NL1035210C2
NL1035210C2 NL1035210A NL1035210A NL1035210C2 NL 1035210 C2 NL1035210 C2 NL 1035210C2 NL 1035210 A NL1035210 A NL 1035210A NL 1035210 A NL1035210 A NL 1035210A NL 1035210 C2 NL1035210 C2 NL 1035210C2
Authority
NL
Netherlands
Prior art keywords
wedge plate
wedge
arrangement
optical axis
light
Prior art date
Application number
NL1035210A
Other languages
English (en)
Dutch (nl)
Other versions
NL1035210A1 (nl
Inventor
Damian Fiolka
Original Assignee
Zeiss Carl Smt Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag filed Critical Zeiss Carl Smt Ag
Publication of NL1035210A1 publication Critical patent/NL1035210A1/nl
Application granted granted Critical
Publication of NL1035210C2 publication Critical patent/NL1035210C2/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polarising Elements (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
NL1035210A 2007-04-25 2008-03-26 Belichtingsinrichting van een microlithografische projectie belichtingsinstallatie. NL1035210C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007019831 2007-04-25
DE102007019831A DE102007019831B4 (de) 2007-04-25 2007-04-25 Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage

Publications (2)

Publication Number Publication Date
NL1035210A1 NL1035210A1 (nl) 2008-10-28
NL1035210C2 true NL1035210C2 (nl) 2009-01-20

Family

ID=39766932

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1035210A NL1035210C2 (nl) 2007-04-25 2008-03-26 Belichtingsinrichting van een microlithografische projectie belichtingsinstallatie.

Country Status (5)

Country Link
US (1) US8031327B2 (enExample)
JP (1) JP5561508B2 (enExample)
DE (1) DE102007019831B4 (enExample)
NL (1) NL1035210C2 (enExample)
TW (1) TWI437372B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011080614A1 (de) 2010-09-27 2012-04-26 Carl Zeiss Smt Gmbh Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
DE102012200368A1 (de) * 2012-01-12 2013-07-18 Carl Zeiss Smt Gmbh Polarisationsbeeinflussende optische Anordnung, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
CN109188677A (zh) * 2017-06-29 2019-01-11 上海微电子装备（集团）股份有限公司 一种光程补偿装置
JP2023142214A (ja) * 2022-03-24 2023-10-05 株式会社Ｓｃｒｅｅｎホールディングス 光学装置、露光装置および露光方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010052968A1 (en) * 2000-03-31 2001-12-20 Takahisa Shiozawa Exposure apparatus and device manufacturing method
EP1662553A1 (en) * 2003-07-24 2006-05-31 Nikon Corporation Illuminating optical system, exposure system and exposure method
EP1681710A1 (en) * 2003-10-28 2006-07-19 Nikon Corporation Lighting optical device and projection aligner
WO2006131517A2 (de) * 2005-06-07 2006-12-14 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen projektionsbelichtungsanlage
US20070014504A1 (en) * 2005-07-12 2007-01-18 Damian Fiolka Illumination system of a microlithographic projection exposure apparatus, and depolarizer
WO2007031544A1 (en) * 2005-09-14 2007-03-22 Carl Zeiss Smt Ag Optical system of a microlithographic exposure system

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19829612A1 (de) 1998-07-02 2000-01-05 Zeiss Carl Fa Beleuchtungssystem der Mikrolithographie mit Depolarisator
JP2003090978A (ja) * 2001-09-17 2003-03-28 Canon Inc 照明装置、露光装置及びデバイス製造方法
TW200412617A (en) * 2002-12-03 2004-07-16 Nikon Corp Optical illumination device, method for adjusting optical illumination device, exposure device and exposure method
JP4470095B2 (ja) * 2003-11-20 2010-06-02 株式会社ニコン 照明光学装置、露光装置および露光方法
TWI385414B (zh) * 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
JP2005333001A (ja) 2004-05-20 2005-12-02 Nikon Corp 照明光学装置、露光装置、および露光方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010052968A1 (en) * 2000-03-31 2001-12-20 Takahisa Shiozawa Exposure apparatus and device manufacturing method
EP1662553A1 (en) * 2003-07-24 2006-05-31 Nikon Corporation Illuminating optical system, exposure system and exposure method
EP1681710A1 (en) * 2003-10-28 2006-07-19 Nikon Corporation Lighting optical device and projection aligner
WO2006131517A2 (de) * 2005-06-07 2006-12-14 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen projektionsbelichtungsanlage
US20070014504A1 (en) * 2005-07-12 2007-01-18 Damian Fiolka Illumination system of a microlithographic projection exposure apparatus, and depolarizer
WO2007031544A1 (en) * 2005-09-14 2007-03-22 Carl Zeiss Smt Ag Optical system of a microlithographic exposure system

Also Published As

Publication number Publication date
NL1035210A1 (nl) 2008-10-28
JP5561508B2 (ja) 2014-07-30
US8031327B2 (en) 2011-10-04
JP2008277815A (ja) 2008-11-13
DE102007019831A1 (de) 2008-11-06
DE102007019831B4 (de) 2012-03-01
TWI437372B (zh) 2014-05-11
TW200912550A (en) 2009-03-16
US20080266540A1 (en) 2008-10-30

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AD1A A request for search or an international type search has been filed
RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 20081117

PD2B A search report has been drawn up
MM Lapsed because of non-payment of the annual fee

Effective date: 20200401