DE102007019831B4 - Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage - Google Patents

Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage Download PDF

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Publication number
DE102007019831B4
DE102007019831B4 DE102007019831A DE102007019831A DE102007019831B4 DE 102007019831 B4 DE102007019831 B4 DE 102007019831B4 DE 102007019831 A DE102007019831 A DE 102007019831A DE 102007019831 A DE102007019831 A DE 102007019831A DE 102007019831 B4 DE102007019831 B4 DE 102007019831B4
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DE
Germany
Prior art keywords
wedge plate
wedge
optical axis
arrangement
polarization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE102007019831A
Other languages
German (de)
English (en)
Other versions
DE102007019831A1 (de
Inventor
Damian Fiolka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE102007019831A priority Critical patent/DE102007019831B4/de
Priority to NL1035210A priority patent/NL1035210C2/nl
Priority to US12/058,993 priority patent/US8031327B2/en
Priority to JP2008109919A priority patent/JP5561508B2/ja
Priority to TW097114959A priority patent/TWI437372B/zh
Publication of DE102007019831A1 publication Critical patent/DE102007019831A1/de
Application granted granted Critical
Publication of DE102007019831B4 publication Critical patent/DE102007019831B4/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polarising Elements (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE102007019831A 2007-04-25 2007-04-25 Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage Expired - Fee Related DE102007019831B4 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DE102007019831A DE102007019831B4 (de) 2007-04-25 2007-04-25 Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
NL1035210A NL1035210C2 (nl) 2007-04-25 2008-03-26 Belichtingsinrichting van een microlithografische projectie belichtingsinstallatie.
US12/058,993 US8031327B2 (en) 2007-04-25 2008-03-31 Illumination system of a microlithographic projection exposure apparatus
JP2008109919A JP5561508B2 (ja) 2007-04-25 2008-04-21 マイクロリソグラフィ投影露光装置の照明システム
TW097114959A TWI437372B (zh) 2007-04-25 2008-04-24 微影蝕刻投影曝光設施之照射系統

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102007019831A DE102007019831B4 (de) 2007-04-25 2007-04-25 Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage

Publications (2)

Publication Number Publication Date
DE102007019831A1 DE102007019831A1 (de) 2008-11-06
DE102007019831B4 true DE102007019831B4 (de) 2012-03-01

Family

ID=39766932

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102007019831A Expired - Fee Related DE102007019831B4 (de) 2007-04-25 2007-04-25 Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage

Country Status (5)

Country Link
US (1) US8031327B2 (enExample)
JP (1) JP5561508B2 (enExample)
DE (1) DE102007019831B4 (enExample)
NL (1) NL1035210C2 (enExample)
TW (1) TWI437372B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011080614A1 (de) 2010-09-27 2012-04-26 Carl Zeiss Smt Gmbh Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
DE102012200368A1 (de) * 2012-01-12 2013-07-18 Carl Zeiss Smt Gmbh Polarisationsbeeinflussende optische Anordnung, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
CN109188677A (zh) * 2017-06-29 2019-01-11 上海微电子装备（集团）股份有限公司 一种光程补偿装置
JP2023142214A (ja) * 2022-03-24 2023-10-05 株式会社Ｓｃｒｅｅｎホールディングス 光学装置、露光装置および露光方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010052968A1 (en) * 2000-03-31 2001-12-20 Takahisa Shiozawa Exposure apparatus and device manufacturing method
US20060055834A1 (en) * 2002-12-03 2006-03-16 Nikon Corporation Illumination optical system, exposure apparatus, and exposure method
WO2006131517A2 (de) * 2005-06-07 2006-12-14 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen projektionsbelichtungsanlage
DE102006031807A1 (de) * 2005-07-12 2007-01-18 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage, sowie Depolarisator

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19829612A1 (de) 1998-07-02 2000-01-05 Zeiss Carl Fa Beleuchtungssystem der Mikrolithographie mit Depolarisator
JP2003090978A (ja) * 2001-09-17 2003-03-28 Canon Inc 照明装置、露光装置及びデバイス製造方法
KR20060039925A (ko) * 2003-07-24 2006-05-09 가부시키가이샤 니콘 조명 광학 장치, 노광 장치 및 노광 방법
TWI569308B (zh) * 2003-10-28 2017-02-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
JP4470095B2 (ja) * 2003-11-20 2010-06-02 株式会社ニコン 照明光学装置、露光装置および露光方法
TWI385414B (zh) * 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
JP2005333001A (ja) 2004-05-20 2005-12-02 Nikon Corp 照明光学装置、露光装置、および露光方法
CN101263432B (zh) * 2005-09-14 2011-07-27 卡尔蔡司Smt有限责任公司 微光刻曝光系统的光学系统

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010052968A1 (en) * 2000-03-31 2001-12-20 Takahisa Shiozawa Exposure apparatus and device manufacturing method
US20060055834A1 (en) * 2002-12-03 2006-03-16 Nikon Corporation Illumination optical system, exposure apparatus, and exposure method
WO2006131517A2 (de) * 2005-06-07 2006-12-14 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen projektionsbelichtungsanlage
DE102006031807A1 (de) * 2005-07-12 2007-01-18 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage, sowie Depolarisator

Also Published As

Publication number Publication date
NL1035210A1 (nl) 2008-10-28
JP5561508B2 (ja) 2014-07-30
NL1035210C2 (nl) 2009-01-20
US8031327B2 (en) 2011-10-04
JP2008277815A (ja) 2008-11-13
DE102007019831A1 (de) 2008-11-06
TWI437372B (zh) 2014-05-11
TW200912550A (en) 2009-03-16
US20080266540A1 (en) 2008-10-30

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8127 New person/name/address of the applicant

Owner name: CARL ZEISS SMT GMBH, 73447 OBERKOCHEN, DE

R018 Grant decision by examination section/examining division
R020 Patent grant now final

Effective date: 20120602

R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee