MY139093A - Polishing composition - Google Patents

Polishing composition

Info

Publication number
MY139093A
MY139093A MYPI20041723A MYPI20041723A MY139093A MY 139093 A MY139093 A MY 139093A MY PI20041723 A MYPI20041723 A MY PI20041723A MY PI20041723 A MYPI20041723 A MY PI20041723A MY 139093 A MY139093 A MY 139093A
Authority
MY
Malaysia
Prior art keywords
polishing composition
polishing
group
component selected
oxide
Prior art date
Application number
MYPI20041723A
Inventor
Tomoaki Ishibashi
Toshiki Owaki
Original Assignee
Fujimi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujimi Inc filed Critical Fujimi Inc
Publication of MY139093A publication Critical patent/MY139093A/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/04—Aqueous dispersions
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

THE PRESENT INVENTION RELATES TO A POLISHING COMPOSITION MORE SUITABLE FOR USE IN POLISHING A SUBSTRATE FOR A MAGNETIC DISK. THE POLISHING COMPOSITION CONTAINS AN ABRASIVE WHICH CONTAINS AT LEAST ONE COMPONENT SELECTED FROM THE GROUP CONSISTING OF ALUMINIUM OXIDE,SILICON DIOXIDE, CERIUM OXIDE, ZIRCONIUM OXDE, TITANIUM OXIDE, SILICON CARBIDE, AND SILICON NITRIDE, A POLISHING ACCELERATOR WHICH CONTAINS AT LEAST ONE COMPONENT SELECTED FROM THE GROUP CONSISTING OF CARBOXYETHYL THIOSUCCINIC ACID AND ITS SALTS,AND WATER.
MYPI20041723A 2003-05-09 2004-05-07 Polishing composition MY139093A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003132313A JP4068499B2 (en) 2003-05-09 2003-05-09 Polishing composition

Publications (1)

Publication Number Publication Date
MY139093A true MY139093A (en) 2009-08-28

Family

ID=32501272

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20041723A MY139093A (en) 2003-05-09 2004-05-07 Polishing composition

Country Status (4)

Country Link
JP (1) JP4068499B2 (en)
CN (1) CN100547045C (en)
GB (1) GB2401370B (en)
MY (1) MY139093A (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007214205A (en) * 2006-02-07 2007-08-23 Fujimi Inc Polishing composition
JP5606663B2 (en) * 2006-12-26 2014-10-15 花王株式会社 Polishing silica particle dispersion
JP2010540265A (en) * 2007-10-05 2010-12-24 サン−ゴバン セラミックス アンド プラスティクス，インコーポレイティド Polishing sapphire with composite slurry
EP2215176B1 (en) 2007-10-05 2016-01-06 Saint-Gobain Ceramics & Plastics, Inc. Improved silicon carbide particles, methods of fabrication, and methods using same
JP5306759B2 (en) * 2008-09-29 2013-10-02 Ｈｏｙａ株式会社 Manufacturing method of glass substrate for magnetic disk and manufacturing method of magnetic disk
EP2776523B1 (en) * 2011-11-09 2016-07-20 Rhodia Operations Additive mixture and composition and method for polishing glass substrates
US20150166862A1 (en) * 2012-07-17 2015-06-18 Fujimi Incorporated Composition for polishing alloy material and method for producing alloy material using same
CN102990503B (en) * 2012-11-09 2015-07-29 中国电子科技集团公司第四十六研究所 For the finishing method of CdS wafer
CN103059810B (en) * 2012-12-19 2014-07-16 青岛文创科技有限公司 Grinding fluid
JP2015203080A (en) * 2014-04-15 2015-11-16 株式会社フジミインコーポレーテッド polishing composition
CN104017498A (en) * 2014-05-08 2014-09-03 德米特（苏州）电子环保材料有限公司 Preparation method of automobile polishing solution with alumina substrate
JP2016124915A (en) * 2014-12-26 2016-07-11 株式会社フジミインコーポレーテッド Polishing composition, polishing method and method for producing ceramic parts
CN106019418B (en) * 2016-05-13 2019-10-25 郑海东 A kind of processing method of resin eyeglass
CN106366939A (en) * 2016-08-30 2017-02-01 东兴华鸿光学科技有限公司 Polishing solution for optics lens
WO2022212155A1 (en) * 2021-03-29 2022-10-06 Entegris, Inc. Suspension for chemical mechanical planarization (cmp) and method employing the same
CN114574105B (en) * 2022-04-06 2023-01-20 江西华丽丰光电有限公司 Glass polishing material and preparation method thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2767824B1 (en) * 1997-08-27 1999-10-08 Elf Aquitaine Exploration Prod SYNTHESIS OF CARBOXYALKYLTHIOSUCCINIC ACIDS
GB2384003B (en) * 1998-06-15 2003-09-03 Fujimi Inc Polishing composition
JP3998813B2 (en) * 1998-06-15 2007-10-31 株式会社フジミインコーポレーテッド Polishing composition
JP4003116B2 (en) * 2001-11-28 2007-11-07 株式会社フジミインコーポレーテッド Polishing composition for magnetic disk substrate and polishing method using the same
JP4095833B2 (en) * 2002-05-30 2008-06-04 株式会社フジミインコーポレーテッド Polishing composition

Also Published As

Publication number Publication date
JP2004331887A (en) 2004-11-25
JP4068499B2 (en) 2008-03-26
CN1550531A (en) 2004-12-01
CN100547045C (en) 2009-10-07
GB2401370A (en) 2004-11-10
GB2401370B (en) 2007-12-05
GB0410212D0 (en) 2004-06-09

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