MX2021002413A - Tecnicas de fabricacion de pocillos de muestra y estructuras para dispositivos de sensores integrados. - Google Patents
Tecnicas de fabricacion de pocillos de muestra y estructuras para dispositivos de sensores integrados.Info
- Publication number
- MX2021002413A MX2021002413A MX2021002413A MX2021002413A MX2021002413A MX 2021002413 A MX2021002413 A MX 2021002413A MX 2021002413 A MX2021002413 A MX 2021002413A MX 2021002413 A MX2021002413 A MX 2021002413A MX 2021002413 A MX2021002413 A MX 2021002413A
- Authority
- MX
- Mexico
- Prior art keywords
- sample well
- forming
- structures
- sensor devices
- fabrication techniques
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000005253 cladding Methods 0.000 abstract 3
- 239000002184 metal Substances 0.000 abstract 3
- 239000000463 material Substances 0.000 abstract 2
- 125000006850 spacer group Chemical group 0.000 abstract 2
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/823493—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type with a particular manufacturing method of the wells or tubs, e.g. twin tubs, high energy well implants, buried implanted layers for lateral isolation [BILLI]
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
- B81C1/00047—Cavities
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
- B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
- B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
- B01L3/508—Containers for the purpose of retaining a material to be analysed, e.g. test tubes rigid containers not provided for above
- B01L3/5085—Containers for the purpose of retaining a material to be analysed, e.g. test tubes rigid containers not provided for above for multiple samples, e.g. microtitration plates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00206—Processes for functionalising a surface, e.g. provide the surface with specific mechanical, chemical or biological properties
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00865—Multistep processes for the separation of wafers into individual elements
- B81C1/0088—Separation allowing recovery of the substrate or a part of the substrate, e.g. epitaxial lift-off
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/48—Biological material, e.g. blood, urine; Haemocytometers
- G01N33/483—Physical analysis of biological material
- G01N33/487—Physical analysis of biological material of liquid biological material
- G01N33/48707—Physical analysis of biological material of liquid biological material by electrical means
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/48—Biological material, e.g. blood, urine; Haemocytometers
- G01N33/50—Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing
- G01N33/58—Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing involving labelled substances
- G01N33/582—Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing involving labelled substances with fluorescent label
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02172—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
- H01L21/02274—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition in the presence of a plasma [PECVD]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
- H01L21/0228—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/823468—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type with a particular manufacturing method of the gate sidewall spacers, e.g. double spacers, particular spacer material or shape
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
- B01L2200/12—Specific details about manufacturing devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2300/00—Additional constructional details
- B01L2300/08—Geometry, shape and general structure
- B01L2300/0809—Geometry, shape and general structure rectangular shaped
- B01L2300/0819—Microarrays; Biochips
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2300/00—Additional constructional details
- B01L2300/16—Surface properties and coatings
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0214—Biosensors; Chemical sensors
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/03—Static structures
- B81B2203/0315—Cavities
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2207/00—Microstructural systems or auxiliary parts thereof
- B81B2207/05—Arrays
- B81B2207/056—Arrays of static structures
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/645—Specially adapted constructive features of fluorimeters
- G01N21/6452—Individual samples arranged in a regular 2D-array, e.g. multiwell plates
- G01N21/6454—Individual samples arranged in a regular 2D-array, e.g. multiwell plates using an integrated detector array
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/645—Specially adapted constructive features of fluorimeters
- G01N21/648—Specially adapted constructive features of fluorimeters using evanescent coupling or surface plasmon coupling for the excitation of fluorescence
Landscapes
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- General Health & Medical Sciences (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Hematology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Molecular Biology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Biomedical Technology (AREA)
- Clinical Laboratory Science (AREA)
- Immunology (AREA)
- Urology & Nephrology (AREA)
- Pathology (AREA)
- Biochemistry (AREA)
- Medicinal Chemistry (AREA)
- Food Science & Technology (AREA)
- Plasma & Fusion (AREA)
- Cell Biology (AREA)
- Biotechnology (AREA)
- Microbiology (AREA)
- Biophysics (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Optical Measuring Cells (AREA)
- Apparatus Associated With Microorganisms And Enzymes (AREA)
- Light Receiving Elements (AREA)
Abstract
Se describen métodos para formar un dispositivo integrado, y en particular para formar uno o más pocillos de muestra en un dispositivo integrado; los métodos pueden involucrar formar una pila de metal sobre una capa de revestimiento, formar una abertura en la pila de metal, formar un primer material espaciador dentro de la abertura, y formar un pocillo de muestra quitando parte de la capa de revestimiento para extender una profundidad de la abertura en la capa de revestimiento; en el pocillo de muestra resultante, al menos una porción del primer material espaciador está en contacto con al menos una capa de la pila de metal.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862724206P | 2018-08-29 | 2018-08-29 | |
PCT/US2019/048836 WO2020047272A1 (en) | 2018-08-29 | 2019-08-29 | Sample well fabrication techniques and structures for integrated sensor devices |
Publications (1)
Publication Number | Publication Date |
---|---|
MX2021002413A true MX2021002413A (es) | 2021-04-28 |
Family
ID=68084935
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2021002413A MX2021002413A (es) | 2018-08-29 | 2019-08-29 | Tecnicas de fabricacion de pocillos de muestra y estructuras para dispositivos de sensores integrados. |
Country Status (11)
Country | Link |
---|---|
US (2) | US11322413B2 (es) |
EP (1) | EP3844098A1 (es) |
JP (1) | JP7428701B2 (es) |
KR (1) | KR20210049145A (es) |
CN (1) | CN112955401A (es) |
AU (1) | AU2019330998A1 (es) |
BR (1) | BR112021003074A2 (es) |
CA (1) | CA3109866A1 (es) |
MX (1) | MX2021002413A (es) |
TW (1) | TW202020164A (es) |
WO (1) | WO2020047272A1 (es) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20200171484A1 (en) * | 2018-12-03 | 2020-06-04 | Quantum-Si Incorporated | Sample well fabrication techniques and structures for integrated sensor devices |
US11476191B2 (en) * | 2019-12-18 | 2022-10-18 | Taiwan Semiconductor Manufacturing Co., Ltd. | Low resistance interconnect structure for semiconductor device |
US20230003647A1 (en) * | 2021-06-30 | 2023-01-05 | Q-State Biosciences, Inc. | Multiplex optical stimulus and readout |
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US5118382A (en) * | 1990-08-10 | 1992-06-02 | Ibm Corporation | Elimination of etch stop undercut |
JPH04340721A (ja) * | 1991-05-17 | 1992-11-27 | Nec Corp | 半導体装置の製造方法 |
US5814565A (en) | 1995-02-23 | 1998-09-29 | University Of Utah Research Foundation | Integrated optic waveguide immunosensor |
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EP1285290A1 (en) | 2000-04-28 | 2003-02-26 | Edgelight Biosciences, Inc. | Micro-array evanescent wave fluorescence detection device |
US6917726B2 (en) | 2001-09-27 | 2005-07-12 | Cornell Research Foundation, Inc. | Zero-mode clad waveguides for performing spectroscopy with confined effective observation volumes |
FR2813121A1 (fr) | 2000-08-21 | 2002-02-22 | Claude Weisbuch | Dispositif perfectionne de support d'elements chromophores |
JP2005345353A (ja) * | 2004-06-04 | 2005-12-15 | Sony Corp | 蛍光励起光の遮光層を備えるバイオアッセイ用基板 |
US7738086B2 (en) | 2005-05-09 | 2010-06-15 | The Trustees Of Columbia University In The City Of New York | Active CMOS biosensor chip for fluorescent-based detection |
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US8975216B2 (en) | 2006-03-30 | 2015-03-10 | Pacific Biosciences Of California | Articles having localized molecules disposed thereon and methods of producing same |
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EP4220138A1 (en) | 2006-09-01 | 2023-08-02 | Pacific Biosciences of California, Inc. | Substrates, systems and methods for analyzing materials |
FR2908888B1 (fr) | 2006-11-21 | 2012-08-03 | Centre Nat Rech Scient | Dispositif pour la detection exaltee de l'emission d'une particule cible |
WO2009082706A1 (en) | 2007-12-21 | 2009-07-02 | The Trustees Of Columbia University In The City Of New York | Active cmos sensor array for electrochemical biomolecular detection |
FI3629011T3 (fi) | 2008-09-16 | 2024-01-29 | Pacific Biosciences California Inc | Integroitu optinen laite |
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CN112903638A (zh) * | 2014-08-08 | 2021-06-04 | 宽腾矽公司 | 用于对分子进行探测、检测和分析的带外部光源的集成装置 |
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TWI735587B (zh) * | 2016-06-01 | 2021-08-11 | 美商寬騰矽公司 | 用於偵測及分析分子之光子結構及積體裝置 |
US20200171484A1 (en) | 2018-12-03 | 2020-06-04 | Quantum-Si Incorporated | Sample well fabrication techniques and structures for integrated sensor devices |
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2019
- 2019-08-29 AU AU2019330998A patent/AU2019330998A1/en active Pending
- 2019-08-29 CA CA3109866A patent/CA3109866A1/en active Pending
- 2019-08-29 EP EP19779633.7A patent/EP3844098A1/en active Pending
- 2019-08-29 JP JP2021510980A patent/JP7428701B2/ja active Active
- 2019-08-29 BR BR112021003074-3A patent/BR112021003074A2/pt not_active Application Discontinuation
- 2019-08-29 TW TW108131143A patent/TW202020164A/zh unknown
- 2019-08-29 US US16/555,902 patent/US11322413B2/en active Active
- 2019-08-29 WO PCT/US2019/048836 patent/WO2020047272A1/en unknown
- 2019-08-29 CN CN201980071658.2A patent/CN112955401A/zh active Pending
- 2019-08-29 MX MX2021002413A patent/MX2021002413A/es unknown
- 2019-08-29 KR KR1020217008847A patent/KR20210049145A/ko not_active Application Discontinuation
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2022
- 2022-04-07 US US17/715,915 patent/US20220238389A1/en active Pending
Also Published As
Publication number | Publication date |
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US11322413B2 (en) | 2022-05-03 |
JP7428701B2 (ja) | 2024-02-06 |
CA3109866A1 (en) | 2020-03-05 |
EP3844098A1 (en) | 2021-07-07 |
TW202020164A (zh) | 2020-06-01 |
WO2020047272A1 (en) | 2020-03-05 |
JP2021534424A (ja) | 2021-12-09 |
US20220238389A1 (en) | 2022-07-28 |
BR112021003074A2 (pt) | 2021-05-11 |
KR20210049145A (ko) | 2021-05-04 |
AU2019330998A1 (en) | 2021-03-11 |
US20200075426A1 (en) | 2020-03-05 |
CN112955401A (zh) | 2021-06-11 |
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