MX144572A - Una unidad de pelicula fotografica - Google Patents

Una unidad de pelicula fotografica

Info

Publication number
MX144572A
MX144572A MX15202371A MX15202371A MX144572A MX 144572 A MX144572 A MX 144572A MX 15202371 A MX15202371 A MX 15202371A MX 15202371 A MX15202371 A MX 15202371A MX 144572 A MX144572 A MX 144572A
Authority
MX
Mexico
Prior art keywords
unit
photographic film
photographic
film
Prior art date
Application number
MX15202371A
Other languages
English (en)
Spanish (es)
Inventor
Myron S Simon
David Percival Waller
Original Assignee
Polaroid Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US00103865A external-priority patent/US3833614A/en
Application filed by Polaroid Corp filed Critical Polaroid Corp
Publication of MX144572A publication Critical patent/MX144572A/es

Links

MX15202371A 1970-06-05 1971-06-04 Una unidad de pelicula fotografica MX144572A (es)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US4378270A 1970-06-05 1970-06-05
US10339271A 1971-01-04 1971-01-04
US00103865A US3833614A (en) 1970-06-05 1971-01-04 Phthalides and naphthalides
US00103864A US3833615A (en) 1970-06-05 1971-01-04 Naphthalides and phthalides

Publications (1)

Publication Number Publication Date
MX144572A true MX144572A (es) 1981-10-28

Family

ID=27488878

Family Applications (1)

Application Number Title Priority Date Filing Date
MX15202371A MX144572A (es) 1970-06-05 1971-06-04 Una unidad de pelicula fotografica

Country Status (2)

Country Link
JP (1) JPS5437492B1 (member.php)
MX (1) MX144572A (member.php)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106133604B (zh) 2014-03-13 2019-09-06 三菱瓦斯化学株式会社 保护剂组合物和保护剂图案形成方法
KR102318654B1 (ko) 2014-03-13 2021-10-28 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 화합물, 수지, 리소그래피용 하층막 형성재료, 리소그래피용 하층막, 패턴 형성방법, 및 화합물 또는 수지의 정제방법
KR102643950B1 (ko) 2015-03-30 2024-03-07 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 화합물, 수지, 및 이들의 정제방법, 리소그래피용 하층막 형성재료, 하층막 형성용 조성물, 및 하층막, 그리고, 레지스트패턴 형성방법, 및 회로패턴 형성방법
CN107533290B (zh) 2015-03-30 2021-04-09 三菱瓦斯化学株式会社 抗蚀基材、抗蚀剂组合物及抗蚀图案形成方法

Also Published As

Publication number Publication date
JPS5437492B1 (member.php) 1979-11-15

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