MX144572A - A UNIT OF PHOTOGRAPHIC FILM - Google Patents
A UNIT OF PHOTOGRAPHIC FILMInfo
- Publication number
- MX144572A MX144572A MX15202371A MX15202371A MX144572A MX 144572 A MX144572 A MX 144572A MX 15202371 A MX15202371 A MX 15202371A MX 15202371 A MX15202371 A MX 15202371A MX 144572 A MX144572 A MX 144572A
- Authority
- MX
- Mexico
- Prior art keywords
- unit
- photographic film
- photographic
- film
- Prior art date
Links
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US4378270A | 1970-06-05 | 1970-06-05 | |
US10339271A | 1971-01-04 | 1971-01-04 | |
US00103864A US3833615A (en) | 1970-06-05 | 1971-01-04 | Naphthalides and phthalides |
US00103865A US3833614A (en) | 1970-06-05 | 1971-01-04 | Phthalides and naphthalides |
Publications (1)
Publication Number | Publication Date |
---|---|
MX144572A true MX144572A (en) | 1981-10-28 |
Family
ID=27488878
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX15202371A MX144572A (en) | 1970-06-05 | 1971-06-04 | A UNIT OF PHOTOGRAPHIC FILM |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS5437492B1 (en) |
MX (1) | MX144572A (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102326848B1 (en) | 2014-03-13 | 2021-11-17 | 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 | Resist composition and method for forming resist pattern |
JP6573217B2 (en) * | 2014-03-13 | 2019-09-11 | 三菱瓦斯化学株式会社 | Compound, resin, lower layer film forming material for lithography, lower layer film for lithography, pattern forming method, and method for purifying compound or resin |
WO2016158458A1 (en) | 2015-03-30 | 2016-10-06 | 三菱瓦斯化学株式会社 | Resist base material, resist composition, and method for forming resist pattern |
US10747112B2 (en) | 2015-03-30 | 2020-08-18 | Mitsubishi Gas Chemical Company, Inc. | Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method |
-
1971
- 1971-06-04 MX MX15202371A patent/MX144572A/en unknown
- 1971-06-04 JP JP3925571A patent/JPS5437492B1/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JPS5437492B1 (en) | 1979-11-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CH510895A (en) | Photosensitive film | |
BE803700A (en) | LIGHT-SENSITIVE PHOTOGRAPHIC MATERIAL | |
AT322979B (en) | PHOTOGRAPHIC FILM ASSOCIATION | |
AT332763B (en) | REFLECTIVE FILM | |
BE768355A (en) | TRANSPARENT PHOTOGRAPHIC MASKS | |
AT298235B (en) | Photographic self-developer film association | |
IT987618B (en) | ANTISTATIC PHOTOGRAPHIC FILM | |
BE777352A (en) | LIGHT-SENSITIVE PHOTOGRAPHIC COLOR MATERIAL | |
MX144572A (en) | A UNIT OF PHOTOGRAPHIC FILM | |
SE381520B (en) | PHOTOGRAPHIC FILM UNIT | |
SE393133B (en) | PROCEDURE FOR ANODOXIDATION OF A THIN FILM DEVICE | |
BE761215A (en) | PHOTOGRAPHIC MATERIAL | |
AT315639B (en) | Photographic Film Association | |
CH501247A (en) | Photographic light-sensitive material | |
CH524834A (en) | Photographic light-sensitive material | |
BE762920A (en) | SPECIALLY SENSITIZED LIGHT-SENSITIVE MATERIAL | |
CH522899A (en) | Photographic film | |
BE775218A (en) | SUPER SENSITIZED PHOTOGRAPHIC MATERIAL | |
BE793644A (en) | PHOTOGRAPHIC FILM CASSETTE | |
NL170054C (en) | PHOTOGRAPHIC CINE FILM. | |
AT319047B (en) | Film camera | |
BE761709A (en) | PHOTOGRAPHIC FILM SETS | |
IT976958B (en) | CINEMATOGRAPHIC PROJECTOR | |
BE798854A (en) | CINEMATOGRAPHIC FILM PROJECTOR | |
BE769397A (en) | LIGHT-SENSITIVE PHOTOGRAPHIC COLOR MATERIAL |