MX144572A - Una unidad de pelicula fotografica - Google Patents

Una unidad de pelicula fotografica

Info

Publication number
MX144572A
MX144572A MX15202371A MX15202371A MX144572A MX 144572 A MX144572 A MX 144572A MX 15202371 A MX15202371 A MX 15202371A MX 15202371 A MX15202371 A MX 15202371A MX 144572 A MX144572 A MX 144572A
Authority
MX
Mexico
Prior art keywords
unit
photographic film
photographic
film
Prior art date
Application number
MX15202371A
Other languages
English (en)
Spanish (es)
Inventor
Myron S Simon
David Percival Waller
Original Assignee
Polaroid Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US00103864A external-priority patent/US3833615A/en
Application filed by Polaroid Corp filed Critical Polaroid Corp
Publication of MX144572A publication Critical patent/MX144572A/es

Links

MX15202371A 1970-06-05 1971-06-04 Una unidad de pelicula fotografica MX144572A (es)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US4378270A 1970-06-05 1970-06-05
US10339271A 1971-01-04 1971-01-04
US00103864A US3833615A (en) 1970-06-05 1971-01-04 Naphthalides and phthalides
US00103865A US3833614A (en) 1970-06-05 1971-01-04 Phthalides and naphthalides

Publications (1)

Publication Number Publication Date
MX144572A true MX144572A (es) 1981-10-28

Family

ID=27488878

Family Applications (1)

Application Number Title Priority Date Filing Date
MX15202371A MX144572A (es) 1970-06-05 1971-06-04 Una unidad de pelicula fotografica

Country Status (2)

Country Link
JP (1) JPS5437492B1 (enExample)
MX (1) MX144572A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106133604B (zh) 2014-03-13 2019-09-06 三菱瓦斯化学株式会社 保护剂组合物和保护剂图案形成方法
CN106103396B (zh) 2014-03-13 2021-11-30 三菱瓦斯化学株式会社 化合物、树脂、光刻用下层膜形成材料、光刻用下层膜、图案形成方法、及化合物或树脂的纯化方法
JP6156711B2 (ja) 2015-03-30 2017-07-05 三菱瓦斯化学株式会社 レジスト基材、レジスト組成物及びレジストパターン形成方法
US10747112B2 (en) 2015-03-30 2020-08-18 Mitsubishi Gas Chemical Company, Inc. Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method

Also Published As

Publication number Publication date
JPS5437492B1 (enExample) 1979-11-15

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