MX144572A - Una unidad de pelicula fotografica - Google Patents

Una unidad de pelicula fotografica

Info

Publication number
MX144572A
MX144572A MX15202371A MX15202371A MX144572A MX 144572 A MX144572 A MX 144572A MX 15202371 A MX15202371 A MX 15202371A MX 15202371 A MX15202371 A MX 15202371A MX 144572 A MX144572 A MX 144572A
Authority
MX
Mexico
Prior art keywords
unit
photographic film
photographic
film
Prior art date
Application number
MX15202371A
Other languages
English (en)
Spanish (es)
Inventor
Myron S Simon
David Percival Waller
Original Assignee
Polaroid Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US00103865A external-priority patent/US3833614A/en
Application filed by Polaroid Corp filed Critical Polaroid Corp
Publication of MX144572A publication Critical patent/MX144572A/es

Links

MX15202371A 1970-06-05 1971-06-04 Una unidad de pelicula fotografica MX144572A (es)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US4378270A 1970-06-05 1970-06-05
US10339271A 1971-01-04 1971-01-04
US00103865A US3833614A (en) 1970-06-05 1971-01-04 Phthalides and naphthalides
US00103864A US3833615A (en) 1970-06-05 1971-01-04 Naphthalides and phthalides

Publications (1)

Publication Number Publication Date
MX144572A true MX144572A (es) 1981-10-28

Family

ID=27488878

Family Applications (1)

Application Number Title Priority Date Filing Date
MX15202371A MX144572A (es) 1970-06-05 1971-06-04 Una unidad de pelicula fotografica

Country Status (2)

Country Link
JP (1) JPS5437492B1 (cg-RX-API-DMAC7.html)
MX (1) MX144572A (cg-RX-API-DMAC7.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI662018B (zh) 2014-03-13 2019-06-11 日商三菱瓦斯化學股份有限公司 抗蝕組成物及抗蝕圖型形成方法
US10294183B2 (en) 2014-03-13 2019-05-21 Mitsubishi Gas Chemical Company, Inc. Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying the compound or resin
CN107428646B (zh) 2015-03-30 2021-03-02 三菱瓦斯化学株式会社 化合物、树脂、和它们的纯化方法、及其应用
EP3279728B1 (en) 2015-03-30 2021-03-17 Mitsubishi Gas Chemical Company, Inc. Resist base material, resist composition, and method for forming resist pattern

Also Published As

Publication number Publication date
JPS5437492B1 (cg-RX-API-DMAC7.html) 1979-11-15

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