MD627F2 - The method of making epitaxy layers of phosphide indium from gaz phase - Google Patents
The method of making epitaxy layers of phosphide indium from gaz phaseInfo
- Publication number
- MD627F2 MD627F2 MD940257A MD940257A MD627F2 MD 627 F2 MD627 F2 MD 627F2 MD 940257 A MD940257 A MD 940257A MD 940257 A MD940257 A MD 940257A MD 627 F2 MD627 F2 MD 627F2
- Authority
- MD
- Moldova
- Prior art keywords
- gaz
- phase
- epitaxy layers
- phosphide indium
- making
- Prior art date
Links
- 238000000407 epitaxy Methods 0.000 title 1
- 229910052738 indium Inorganic materials 0.000 title 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
Landscapes
- Recrystallisation Techniques (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Inventia se refera la tehnologia semiconductorilor si poate fi utilizata la obtinerea straturilor epitaxiale de fosfura de indiu cu parametrii electrofizici dirijabili. Pentru excluderea pierderilor de material al sursei in procesul de saturatie a ei cu fosfor si asigurarea dirijabilitatii compozitiei fazei gazoase prin intermediul procedeului solicitat, c
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MD94-0257A MD627G2 (en) | 1994-07-25 | 1994-07-25 | The method of making epitaxy layers of phosphide indium from gaz phase |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MD94-0257A MD627G2 (en) | 1994-07-25 | 1994-07-25 | The method of making epitaxy layers of phosphide indium from gaz phase |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| MD627F2 true MD627F2 (en) | 1996-11-29 |
| MD627G2 MD627G2 (en) | 1997-06-30 |
Family
ID=19738568
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MD94-0257A MD627G2 (en) | 1994-07-25 | 1994-07-25 | The method of making epitaxy layers of phosphide indium from gaz phase |
Country Status (1)
| Country | Link |
|---|---|
| MD (1) | MD627G2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| MD249Z (en) * | 2009-04-29 | 2011-02-28 | Институт Электронной Инженерии И Промышленных Технологий Академии Наук Молдовы | Process for manufacturing a thermoelectric cooler for the Chip substrate |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| MD151Z (en) * | 2008-12-30 | 2010-09-30 | Государственный Университет Молд0 | Process for growth of GaAs epitaxial layers into a horizontal reactor |
-
1994
- 1994-07-25 MD MD94-0257A patent/MD627G2/en active IP Right Grant
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| MD249Z (en) * | 2009-04-29 | 2011-02-28 | Институт Электронной Инженерии И Промышленных Технологий Академии Наук Молдовы | Process for manufacturing a thermoelectric cooler for the Chip substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| MD627G2 (en) | 1997-06-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FG3A | Granted patent for invention | ||
| IF99 | Valid patent on 19990615 |
Free format text: EXPIRES: 20140725 |