MD4552C1 - Process for producing tantalum or niobium arsenide single crystals - Google Patents

Process for producing tantalum or niobium arsenide single crystals

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Publication number
MD4552C1
MD4552C1 MDA20170049A MD20170049A MD4552C1 MD 4552 C1 MD4552 C1 MD 4552C1 MD A20170049 A MDA20170049 A MD A20170049A MD 20170049 A MD20170049 A MD 20170049A MD 4552 C1 MD4552 C1 MD 4552C1
Authority
MD
Moldova
Prior art keywords
niobium
single crystals
tantalum
temperature
zone
Prior art date
Application number
MDA20170049A
Other languages
Romanian (ro)
Russian (ru)
Other versions
MD4552B1 (en
Inventor
Александр НАТЕПРОВ
Алексей НАТЕПРОВ
Корнелиу ГЕРМАН
Эрнест АРУШАНОВ
Original Assignee
Институт Прикладной Физики Академии Наук Молдовы
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Институт Прикладной Физики Академии Наук Молдовы filed Critical Институт Прикладной Физики Академии Наук Молдовы
Priority to MDA20170049A priority Critical patent/MD4552C1/en
Publication of MD4552B1 publication Critical patent/MD4552B1/en
Publication of MD4552C1 publication Critical patent/MD4552C1/en

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  • Crystals, And After-Treatments Of Crystals (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)

Abstract

The invention relates to the field of material production technology for electronic engineering, namely the field of producing materials in the form of single crystals and can be used in the production of niobium or tantalum arsenide single crystals.The process for producing tantalum or niobium arsenide single crystals by the chemical transport reaction method in a closed volume with a temperature gradient and using iodine as a transport agent, in which pieces of tantalum or niobium, arsenic and iodine films are loaded into ampoules and placed in a furnace with three temperature zones of 610°C, 850°C and 800°C, the 850°C zone is located in the middle of the ampoule, arsenic - in the zone with the temperature of 610°C, tantalum or niobium - in the zone with the temperature of 800°C, and the quantity of the transport agent is selected depending on the pressure limit of the ampoule selected for the synthesis.
MDA20170049A 2017-04-20 2017-04-20 Process for producing tantalum or niobium arsenide single crystals MD4552C1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
MDA20170049A MD4552C1 (en) 2017-04-20 2017-04-20 Process for producing tantalum or niobium arsenide single crystals

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
MDA20170049A MD4552C1 (en) 2017-04-20 2017-04-20 Process for producing tantalum or niobium arsenide single crystals

Publications (2)

Publication Number Publication Date
MD4552B1 MD4552B1 (en) 2018-02-28
MD4552C1 true MD4552C1 (en) 2018-09-30

Family

ID=61282888

Family Applications (1)

Application Number Title Priority Date Filing Date
MDA20170049A MD4552C1 (en) 2017-04-20 2017-04-20 Process for producing tantalum or niobium arsenide single crystals

Country Status (1)

Country Link
MD (1) MD4552C1 (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL219109B1 (en) * 2001-06-06 2015-03-31 Ammono Spółka Z Ograniczoną Odpowiedzialnością Process and apparatus for obtaining bulk monocrystalline gallium-containing nitride

Also Published As

Publication number Publication date
MD4552B1 (en) 2018-02-28

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Legal Events

Date Code Title Description
FG4A Patent for invention issued
KA4A Patent for invention lapsed due to non-payment of fees (with right of restoration)
MM4A Patent for invention definitely lapsed due to non-payment of fees