MD4734C1 - Process for producing ZnO ceramics with high resistance and controlled stoichiometric deviation - Google Patents
Process for producing ZnO ceramics with high resistance and controlled stoichiometric deviationInfo
- Publication number
- MD4734C1 MD4734C1 MDA20180065A MD20180065A MD4734C1 MD 4734 C1 MD4734 C1 MD 4734C1 MD A20180065 A MDA20180065 A MD A20180065A MD 20180065 A MD20180065 A MD 20180065A MD 4734 C1 MD4734 C1 MD 4734C1
- Authority
- MD
- Moldova
- Prior art keywords
- high resistance
- hcl
- sintering
- controlled stoichiometric
- producing zno
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 3
- 239000000919 ceramic Substances 0.000 title abstract 2
- 238000005245 sintering Methods 0.000 abstract 3
- 239000004065 semiconductor Substances 0.000 abstract 2
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000000843 powder Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Landscapes
- Compositions Of Oxide Ceramics (AREA)
- Conductive Materials (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention relates to semiconductor material production processes and can be used in semiconductor technology.The process, according to the invention, consists in sintering ZnO powders by the chemical transport reaction method in a closed volume at a sintering temperature of 900…150°C, for 48…72 hours, with a temperature gradient in the sintering region of ≤10°C/cm and a cooling rate of the resulting ceramics of ≤100°C/hour. As transport agents are used HCl with an initial pressure of 1…6 atm, H2 with an initial pressure of 50…200% of the initial HCl pressure, and C in the amount of ≤HCl mol.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MDA20180065A MD4734C1 (en) | 2018-08-22 | 2018-08-22 | Process for producing ZnO ceramics with high resistance and controlled stoichiometric deviation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MDA20180065A MD4734C1 (en) | 2018-08-22 | 2018-08-22 | Process for producing ZnO ceramics with high resistance and controlled stoichiometric deviation |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| MD20180065A2 MD20180065A2 (en) | 2020-02-29 |
| MD4734B1 MD4734B1 (en) | 2020-12-31 |
| MD4734C1 true MD4734C1 (en) | 2021-07-31 |
Family
ID=69723327
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MDA20180065A MD4734C1 (en) | 2018-08-22 | 2018-08-22 | Process for producing ZnO ceramics with high resistance and controlled stoichiometric deviation |
Country Status (1)
| Country | Link |
|---|---|
| MD (1) | MD4734C1 (en) |
-
2018
- 2018-08-22 MD MDA20180065A patent/MD4734C1/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| MD20180065A2 (en) | 2020-02-29 |
| MD4734B1 (en) | 2020-12-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FG4A | Patent for invention issued | ||
| KA4A | Patent for invention lapsed due to non-payment of fees (with right of restoration) |