LU71343A1 - - Google Patents

Info

Publication number
LU71343A1
LU71343A1 LU71343A LU71343A LU71343A1 LU 71343 A1 LU71343 A1 LU 71343A1 LU 71343 A LU71343 A LU 71343A LU 71343 A LU71343 A LU 71343A LU 71343 A1 LU71343 A1 LU 71343A1
Authority
LU
Luxembourg
Application number
LU71343A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to LU71343A priority Critical patent/LU71343A1/xx
Priority to IT52163/75A priority patent/IT1052238B/it
Priority to DK513875A priority patent/DK513875A/da
Priority to IE2501/75A priority patent/IE41938B1/en
Priority to NL7513401A priority patent/NL7513401A/xx
Priority to BE1007015A priority patent/BE835669A/xx
Priority to US05/633,263 priority patent/US4050408A/en
Priority to GB47645/75A priority patent/GB1504548A/en
Priority to CH1506675A priority patent/CH607939A5/xx
Priority to DE19752552380 priority patent/DE2552380A1/de
Priority to JP50140137A priority patent/JPS5176596A/ja
Priority to SE7513124A priority patent/SE7513124L/xx
Priority to CA240,359A priority patent/CA1071936A/en
Priority to FR7535714A priority patent/FR2292051A1/fr
Publication of LU71343A1 publication Critical patent/LU71343A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0084—Producing gradient compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Inorganic Insulating Materials (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
LU71343A 1974-11-22 1974-11-22 LU71343A1 (xx)

Priority Applications (14)

Application Number Priority Date Filing Date Title
LU71343A LU71343A1 (xx) 1974-11-22 1974-11-22
IT52163/75A IT1052238B (it) 1974-11-22 1975-11-11 Procedimento e dispositivo per depositare sottili strati di materiali isolanti o poco conduttori mediante polverizzazione reattiva in plasma induttivo ad alta frequenza
DK513875A DK513875A (da) 1974-11-22 1975-11-14 Fremgangsmade og apparat til frembringelse af tynde lag af isolerende eller svagt ledende materialer ved reaktiv forstovning i et hojfrekvent induktivt plasma
IE2501/75A IE41938B1 (en) 1974-11-22 1975-11-17 A method and apparatus for depositing thin layers of insulating or slightly conductive materials by reactive sputtering in a high-frequency inductive plasma
NL7513401A NL7513401A (nl) 1974-11-22 1975-11-17 Werkwijze en inrichting voor het neerleggen van dunne lagen uit isolerende materialen of van wei- nig geleidende materialen door een reactieve ver- stuiving in een bij hoge frekwentie inductief plas- ma.
BE1007015A BE835669A (fr) 1974-11-22 1975-11-18 Procede et dispositif pour le depot de couches minces de materiaux isolantes ou faiblement conducteurs par pulverisation reactive en plasma inductif a haute frequence
US05/633,263 US4050408A (en) 1974-11-22 1975-11-19 Apparatus for depositing thin layers of materials by reactive spraying in a high-frequency inductive plasma
GB47645/75A GB1504548A (en) 1974-11-22 1975-11-19 Method and apparatus for depositing thin layers of insulating or slightly conductive materials by reactive sputtering in a high-frequency inductive plasma
CH1506675A CH607939A5 (xx) 1974-11-22 1975-11-20
DE19752552380 DE2552380A1 (de) 1974-11-22 1975-11-20 Verfahren und vorrichtung zur ablagerung duenner schichten mittels reagierender pulverisierung durch induktives plasma mit hoher frequenz
JP50140137A JPS5176596A (en) 1974-11-22 1975-11-21 Hakumakuso no taisekihoho oyobi sochi
SE7513124A SE7513124L (sv) 1974-11-22 1975-11-21 Sett och apparat for avsettning av tunna skikt av isolerande eller nagot ledande material genom reaktiv besprutning e en hogfrekvent induktiv plasma
CA240,359A CA1071936A (en) 1974-11-22 1975-11-21 Method and apparatus for depositing thin layers of insulating or slightly conductive materials by reactive spraying in a high-frequency inductive plasma
FR7535714A FR2292051A1 (fr) 1974-11-22 1975-11-21 Procede et dispositif pour le depot de couches minces de materiaux isolants ou faiblement conducteurs par pulverisation reactive en plasma inductif a haute frequence

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
LU71343A LU71343A1 (xx) 1974-11-22 1974-11-22

Publications (1)

Publication Number Publication Date
LU71343A1 true LU71343A1 (xx) 1976-03-17

Family

ID=19727807

Family Applications (1)

Application Number Title Priority Date Filing Date
LU71343A LU71343A1 (xx) 1974-11-22 1974-11-22

Country Status (14)

Country Link
US (1) US4050408A (xx)
JP (1) JPS5176596A (xx)
BE (1) BE835669A (xx)
CA (1) CA1071936A (xx)
CH (1) CH607939A5 (xx)
DE (1) DE2552380A1 (xx)
DK (1) DK513875A (xx)
FR (1) FR2292051A1 (xx)
GB (1) GB1504548A (xx)
IE (1) IE41938B1 (xx)
IT (1) IT1052238B (xx)
LU (1) LU71343A1 (xx)
NL (1) NL7513401A (xx)
SE (1) SE7513124L (xx)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4125086A (en) * 1977-01-06 1978-11-14 The United States Of America As Represented By The Secretary Of The Army Nozzle beam type metal vapor source
US4231774A (en) * 1978-04-10 1980-11-04 International Telephone And Telegraph Corporation Method of fabricating large optical preforms
JPS5940227B2 (ja) * 1980-06-24 1984-09-28 富士通株式会社 リアクティブスパッタリング方法
US4406252A (en) * 1980-12-29 1983-09-27 Rockwell International Corporation Inductive heating arrangement for evaporating thin film alloy onto a substrate
JPS57123969A (en) * 1981-01-26 1982-08-02 Semiconductor Energy Lab Co Ltd Formation of zinc oxide film by vapor phase method using plasma
JPS57158369A (en) * 1981-03-26 1982-09-30 Semiconductor Energy Lab Co Ltd Formation of dielectric film by plasma vapor phase method
US4428812A (en) * 1983-04-04 1984-01-31 Borg-Warner Corporation Rapid rate reactive sputtering of metallic compounds
EP0162842A1 (en) * 1983-12-01 1985-12-04 Shatterproof Glass Corporation Gas distribution system for sputtering cathodes
JPH074523B2 (ja) * 1986-09-25 1995-01-25 キヤノン株式会社 反応装置
GB8713986D0 (en) * 1987-06-16 1987-07-22 Shell Int Research Apparatus for plasma surface treating
GB2217349B (en) * 1988-03-29 1992-06-24 Univ Hull Vapour deposited self-sealing ceramic coatings
US5356674A (en) * 1989-05-04 1994-10-18 Deutsche Forschungsanstalt Fuer Luft-Raumfahrt E.V. Process for applying ceramic coatings using a plasma jet carrying a free form non-metallic element
DE3914722A1 (de) * 1989-05-04 1990-11-08 Deutsche Forsch Luft Raumfahrt Verfahren zum auftragen von keramischen material
US5601652A (en) * 1989-08-03 1997-02-11 United Technologies Corporation Apparatus for applying ceramic coatings
DE4237980A1 (de) * 1992-11-11 1994-05-19 Krupp Ag Hoesch Krupp Verfahren zur Erzeugung einer mehrlagigen nitrierten oder Nitrid-Beschichtung durch reaktives Plasmaspritzen
US5620523A (en) * 1994-04-11 1997-04-15 Canon Sales Co., Inc. Apparatus for forming film
US7591957B2 (en) * 2001-01-30 2009-09-22 Rapt Industries, Inc. Method for atmospheric pressure reactive atom plasma processing for surface modification
US7510664B2 (en) 2001-01-30 2009-03-31 Rapt Industries, Inc. Apparatus and method for atmospheric pressure reactive atom plasma processing for shaping of damage free surfaces
US6660177B2 (en) 2001-11-07 2003-12-09 Rapt Industries Inc. Apparatus and method for reactive atom plasma processing for material deposition
US7371992B2 (en) 2003-03-07 2008-05-13 Rapt Industries, Inc. Method for non-contact cleaning of a surface
DE102004022358B3 (de) * 2004-04-30 2005-11-03 Deutsches Zentrum für Luft- und Raumfahrt e.V. Hartstoffbeschichtungsverfahren und dessen Verwendung
US10119195B2 (en) 2009-12-04 2018-11-06 The Regents Of The University Of Michigan Multichannel cold spray apparatus
JP5738885B2 (ja) * 2009-12-04 2015-06-24 ザ リージェンツ オブ ユニバーシティー オブ ミシガン コールド・スプレー・ノズル組立体、及び基材に粒子の被膜を付着させる方法
EP2543443B1 (en) * 2010-03-04 2019-01-09 Imagineering, Inc. Coating forming device, and method for producing coating forming material

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3010009A (en) * 1958-09-29 1961-11-21 Plasmadyne Corp Method and apparatus for uniting materials in a controlled medium
US3247014A (en) * 1963-05-29 1966-04-19 Battelle Development Corp Method of coating solid particles
US3690291A (en) * 1971-04-28 1972-09-12 Nasa Deposition apparatus
US3710070A (en) * 1971-06-09 1973-01-09 Northern Natural Gas Co Low voltage, compact electrically augmented burner
US3839618A (en) * 1972-01-03 1974-10-01 Geotel Inc Method and apparatus for effecting high-energy dynamic coating of substrates
US3756193A (en) * 1972-05-01 1973-09-04 Battelle Memorial Institute Coating apparatus
JPS5213927B2 (xx) * 1972-07-13 1977-04-18
FR2245779B1 (xx) * 1973-09-28 1978-02-10 Cit Alcatel

Also Published As

Publication number Publication date
BE835669A (fr) 1976-03-16
CH607939A5 (xx) 1978-12-15
NL7513401A (nl) 1976-05-25
IE41938L (en) 1976-05-22
FR2292051A1 (fr) 1976-06-18
DE2552380A1 (de) 1976-08-12
JPS5176596A (en) 1976-07-02
IT1052238B (it) 1981-06-20
GB1504548A (en) 1978-03-22
CA1071936A (en) 1980-02-19
DK513875A (da) 1976-05-23
IE41938B1 (en) 1980-04-23
SE7513124L (sv) 1976-05-24
US4050408A (en) 1977-09-27
FR2292051B1 (xx) 1978-05-12

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