LU56200A1 - - Google Patents

Info

Publication number
LU56200A1
LU56200A1 LU56200DA LU56200A1 LU 56200 A1 LU56200 A1 LU 56200A1 LU 56200D A LU56200D A LU 56200DA LU 56200 A1 LU56200 A1 LU 56200A1
Authority
LU
Luxembourg
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of LU56200A1 publication Critical patent/LU56200A1/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
LU56200D 1967-06-05 1968-06-04 LU56200A1 (en:Method)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US643405A US3373095A (en) 1967-06-05 1967-06-05 Electroplating of copper

Publications (1)

Publication Number Publication Date
LU56200A1 true LU56200A1 (en:Method) 1968-09-16

Family

ID=24580675

Family Applications (1)

Application Number Title Priority Date Filing Date
LU56200D LU56200A1 (en:Method) 1967-06-05 1968-06-04

Country Status (10)

Country Link
US (1) US3373095A (en:Method)
AT (1) AT278464B (en:Method)
BE (1) BE716104A (en:Method)
DE (1) DE1771447C2 (en:Method)
ES (1) ES354519A1 (en:Method)
FR (1) FR1569546A (en:Method)
LU (1) LU56200A1 (en:Method)
NL (1) NL6807883A (en:Method)
NO (1) NO120960B (en:Method)
SE (1) SE345879B (en:Method)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4009087A (en) * 1974-11-21 1977-02-22 M&T Chemicals Inc. Electrodeposition of copper
CN111593375A (zh) * 2020-05-15 2020-08-28 电子科技大学 一种用于电子电路电镀铜填孔的整平剂及电镀铜浴

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2424887A (en) * 1941-10-11 1947-07-29 Houdaille Hershey Corp Method and electrolyte for the electrodeposition of metals
US2805194A (en) * 1955-07-18 1957-09-03 Dayton Bright Copper Company Bright copper plating
US2931760A (en) * 1957-09-25 1960-04-05 Leon R Westbrook Acid copper plating
DE1133610B (de) * 1959-06-06 1962-07-19 Dehydag Gmbh Saure galvanische Kupferbaeder
NL291575A (en:Method) * 1962-04-16
US3252987A (en) * 1964-03-09 1966-05-24 Eastman Kodak Co Tetrazolium compound electroplating leveling agent and method of preparation

Also Published As

Publication number Publication date
SE345879B (en:Method) 1972-06-12
AT278464B (de) 1970-02-10
DE1771447B1 (de) 1972-05-04
FR1569546A (en:Method) 1969-05-30
ES354519A1 (es) 1970-01-01
DE1771447C2 (de) 1974-08-22
BE716104A (en:Method) 1968-11-04
NL6807883A (en:Method) 1968-12-06
US3373095A (en) 1968-03-12
NO120960B (en:Method) 1970-12-28

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