LU52106A1 - - Google Patents

Info

Publication number
LU52106A1
LU52106A1 LU52106A LU52106A LU52106A1 LU 52106 A1 LU52106 A1 LU 52106A1 LU 52106 A LU52106 A LU 52106A LU 52106 A LU52106 A LU 52106A LU 52106 A1 LU52106 A1 LU 52106A1
Authority
LU
Luxembourg
Application number
LU52106A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to LU52106A priority Critical patent/LU52106A1/xx
Priority to GB38382/67A priority patent/GB1194428A/en
Priority to ES345149A priority patent/ES345149A1/es
Priority to BE704031A priority patent/BE704031A/xx
Priority to CH1308567A priority patent/CH501063A/fr
Priority to BE704032A priority patent/BE704032A/xx
Priority to CH1308667A priority patent/CH488634A/fr
Priority to FR121839A priority patent/FR1556228A/fr
Priority to DE1967G0051136 priority patent/DE1615288A1/de
Priority to DE19671615287 priority patent/DE1615287A1/de
Priority to FR121838A priority patent/FR1556227A/fr
Priority to AT874467A priority patent/AT280514B/de
Priority to NL6713182A priority patent/NL6713182A/xx
Priority to US670853A priority patent/US3616451A/en
Priority to NL6713181A priority patent/NL6713181A/xx
Priority to AT877167A priority patent/AT284365B/de
Priority to SE1361367A priority patent/SE324436B/xx
Priority to FI672690A priority patent/FI46636C/fi
Publication of LU52106A1 publication Critical patent/LU52106A1/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568Transferring the substrates through a series of coating stations
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3464Sputtering using more than one target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
LU52106A 1966-10-05 1966-10-05 LU52106A1 (enrdf_load_html_response)

Priority Applications (18)

Application Number Priority Date Filing Date Title
LU52106A LU52106A1 (enrdf_load_html_response) 1966-10-05 1966-10-05
GB38382/67A GB1194428A (en) 1966-10-05 1967-08-21 Process and Apparatus for Surface Coating Glass and Other Materials
ES345149A ES345149A1 (es) 1966-10-05 1967-09-18 Aparato para utilizar en el recubrimiento superficial de articulos.
BE704031A BE704031A (enrdf_load_html_response) 1966-10-05 1967-09-19
CH1308567A CH501063A (fr) 1966-10-05 1967-09-19 Appareil destiné à déposer des couches sur des objets par dépôt sous vide de matières de revêtement
BE704032A BE704032A (enrdf_load_html_response) 1966-10-05 1967-09-19
CH1308667A CH488634A (fr) 1966-10-05 1967-09-19 Procédé de dépôt sous vide d'au moins deux couches superposées sur la surface d'un objet
FR121839A FR1556228A (enrdf_load_html_response) 1966-10-05 1967-09-21
DE1967G0051136 DE1615288A1 (de) 1966-10-05 1967-09-21 Verfahren und Vorrichtung zur im Vakuum erfolgenden Ablagerung duenner Schichten auf Glas und anderen Materialien
DE19671615287 DE1615287A1 (de) 1966-10-05 1967-09-21 Vorrichtung zur Aufbringung duenner Schichten auf Glas oder andere Materialien unter Vakuum
FR121838A FR1556227A (enrdf_load_html_response) 1966-10-05 1967-09-21
AT874467A AT280514B (de) 1966-10-05 1967-09-26 Vorrichtung zur Bildung wenigstens zweier verschiedener, übereinander angeordneter dünner Überzugsschichten
NL6713182A NL6713182A (enrdf_load_html_response) 1966-10-05 1967-09-27
US670853A US3616451A (en) 1966-10-05 1967-09-27 Multiple-layer coating
NL6713181A NL6713181A (enrdf_load_html_response) 1966-10-05 1967-09-27
AT877167A AT284365B (de) 1966-10-05 1967-09-27 Vorrichtung zum Beschichten von Gegenständen
SE1361367A SE324436B (enrdf_load_html_response) 1966-10-05 1967-10-04
FI672690A FI46636C (fi) 1966-10-05 1967-10-05 Kappaleiden päällystämisessä käytettävä laite, jossa laitteessa päälly sainekerros levitetään kappaleen pinnalle alennetussa paineessa.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
LU52106A LU52106A1 (enrdf_load_html_response) 1966-10-05 1966-10-05

Publications (1)

Publication Number Publication Date
LU52106A1 true LU52106A1 (enrdf_load_html_response) 1968-05-07

Family

ID=19724990

Family Applications (1)

Application Number Title Priority Date Filing Date
LU52106A LU52106A1 (enrdf_load_html_response) 1966-10-05 1966-10-05

Country Status (11)

Country Link
US (1) US3616451A (enrdf_load_html_response)
AT (2) AT280514B (enrdf_load_html_response)
BE (1) BE704031A (enrdf_load_html_response)
CH (1) CH501063A (enrdf_load_html_response)
DE (1) DE1615287A1 (enrdf_load_html_response)
ES (1) ES345149A1 (enrdf_load_html_response)
FI (1) FI46636C (enrdf_load_html_response)
FR (1) FR1556228A (enrdf_load_html_response)
GB (1) GB1194428A (enrdf_load_html_response)
LU (1) LU52106A1 (enrdf_load_html_response)
NL (1) NL6713182A (enrdf_load_html_response)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3767559A (en) * 1970-06-24 1973-10-23 Eastman Kodak Co Sputtering apparatus with accordion pleated anode means
FR2098563A5 (enrdf_load_html_response) * 1970-07-10 1972-03-10 Progil
JPH0733576B2 (ja) * 1989-11-29 1995-04-12 株式会社日立製作所 スパツタ装置、及びターゲツト交換装置、並びにその交換方法
JPH05804A (ja) * 1990-08-01 1993-01-08 Sumitomo Electric Ind Ltd 大面積複合酸化物超電導薄膜の成膜装置
DE4040856A1 (de) 1990-12-20 1992-06-25 Leybold Ag Zerstaeubungsanlage
US5292419A (en) * 1990-12-20 1994-03-08 Leybold Aktiengesellschaft Sputtering unit
US5279724A (en) * 1991-12-26 1994-01-18 Xerox Corporation Dual sputtering source
US5322606A (en) * 1991-12-26 1994-06-21 Xerox Corporation Use of rotary solenoid as a shutter actuator on a rotating arm
GB9405442D0 (en) * 1994-03-19 1994-05-04 Applied Vision Ltd Apparatus for coating substrates
US6045671A (en) * 1994-10-18 2000-04-04 Symyx Technologies, Inc. Systems and methods for the combinatorial synthesis of novel materials
DE19830223C1 (de) * 1998-07-07 1999-11-04 Techno Coat Oberflaechentechni Vorrichtung und Verfahren zum mehrlagigen PVD - Beschichten von Substraten
US6833031B2 (en) * 2000-03-21 2004-12-21 Wavezero, Inc. Method and device for coating a substrate
JP2003141719A (ja) * 2001-10-30 2003-05-16 Anelva Corp スパッタリング装置及び薄膜形成方法
JP4066044B2 (ja) * 2002-11-08 2008-03-26 信行 高橋 成膜方法及びスパッタ装置
CA2564539C (en) * 2005-11-14 2014-05-06 Sulzer Metco Coatings B.V. A method for coating of a base body with a platinum modified aluminide ptmal by means of a physical deposition out of the gas phase
US8287647B2 (en) * 2007-04-17 2012-10-16 Lam Research Corporation Apparatus and method for atomic layer deposition
KR100865475B1 (ko) * 2007-08-30 2008-10-27 세메스 주식회사 노즐 어셈블리, 이를 갖는 처리액 공급 장치 및 이를이용하는 처리액 공급 방법
US10586689B2 (en) 2009-07-31 2020-03-10 Guardian Europe S.A.R.L. Sputtering apparatus including cathode with rotatable targets, and related methods
US20120027953A1 (en) * 2010-07-28 2012-02-02 Synos Technology, Inc. Rotating Reactor Assembly for Depositing Film on Substrate
US20130014700A1 (en) * 2011-07-11 2013-01-17 Hariharakeshava Sarpangala Hegde Target shield designs in multi-target deposition system.
KR20160075708A (ko) * 2013-10-24 2016-06-29 마이어 부르거 (저머니) 아게 멀티-매그네트 배열체
US11442132B2 (en) * 2017-07-07 2022-09-13 Nextracker Llc Systems for and methods of positioning solar panels in an array of solar panels to efficiently capture sunlight

Also Published As

Publication number Publication date
FI46636C (fi) 1973-05-08
US3616451A (en) 1971-10-26
FI46636B (enrdf_load_html_response) 1973-01-31
AT284365B (de) 1970-09-10
BE704031A (enrdf_load_html_response) 1968-03-19
FR1556228A (enrdf_load_html_response) 1969-02-07
AT280514B (de) 1970-04-10
CH501063A (fr) 1970-12-31
GB1194428A (en) 1970-06-10
ES345149A1 (es) 1968-11-16
DE1615287A1 (de) 1970-06-11
NL6713182A (enrdf_load_html_response) 1968-04-08

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