LU100109B1 - Ionenquellenvorrichtung - Google Patents
Ionenquellenvorrichtung Download PDFInfo
- Publication number
- LU100109B1 LU100109B1 LU100109A LU100109A LU100109B1 LU 100109 B1 LU100109 B1 LU 100109B1 LU 100109 A LU100109 A LU 100109A LU 100109 A LU100109 A LU 100109A LU 100109 B1 LU100109 B1 LU 100109B1
- Authority
- LU
- Luxembourg
- Prior art keywords
- source device
- ion source
- ion
- source
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
- H01J27/205—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers with electrons, e.g. electron impact ionisation, electron attachment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/12—Lenses electrostatic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/061—Construction
- H01J2237/062—Reducing size of gun
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
- H01J2237/0815—Methods of ionisation
- H01J2237/082—Electron beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/1504—Associated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/31749—Focused ion beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/06—Electron- or ion-optical arrangements
- H01J49/062—Ion guides
- H01J49/065—Ion guides having stacked electrodes, e.g. ring stack, plate stack
- H01J49/066—Ion funnels
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
LU100109A LU100109B1 (de) | 2017-02-28 | 2017-02-28 | Ionenquellenvorrichtung |
PCT/EP2018/054956 WO2018158329A1 (en) | 2017-02-28 | 2018-02-28 | Ion source device |
US16/488,984 US11004649B2 (en) | 2017-02-28 | 2018-02-28 | Ion source device |
EP18710794.1A EP3590126B1 (de) | 2017-02-28 | 2018-02-28 | Ionenquellenvorrichtung |
JP2019547143A JP7190436B2 (ja) | 2017-02-28 | 2018-02-28 | イオン源デバイス |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
LU100109A LU100109B1 (de) | 2017-02-28 | 2017-02-28 | Ionenquellenvorrichtung |
Publications (1)
Publication Number | Publication Date |
---|---|
LU100109B1 true LU100109B1 (de) | 2018-09-07 |
Family
ID=59009720
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
LU100109A LU100109B1 (de) | 2017-02-28 | 2017-02-28 | Ionenquellenvorrichtung |
Country Status (5)
Country | Link |
---|---|
US (1) | US11004649B2 (de) |
EP (1) | EP3590126B1 (de) |
JP (1) | JP7190436B2 (de) |
LU (1) | LU100109B1 (de) |
WO (1) | WO2018158329A1 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022515361A (ja) * | 2018-12-13 | 2022-02-18 | パーキンエルマー・ヘルス・サイエンシーズ・カナダ・インコーポレイテッド | プログラム可能要素を含む質量分析計のコンポーネントおよびそれらを使用するデバイスおよびシステム |
DE102019208278A1 (de) * | 2019-06-06 | 2019-08-01 | Carl Zeiss Smt Gmbh | Ionisierungseinrichtung und Massenspektrometer |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5391962A (en) * | 1992-07-13 | 1995-02-21 | The United States Of America As Represented By The Secretary Of The Army | Electron beam driven negative ion source |
US20050258364A1 (en) * | 2004-05-21 | 2005-11-24 | Whitehouse Craig M | RF surfaces and RF ion guides |
US20120012746A1 (en) * | 2010-07-19 | 2012-01-19 | Herrero Federico A | Ion source with corner cathode |
US20130120894A1 (en) * | 2011-11-16 | 2013-05-16 | Sri International | Planar ion funnel |
US20140034844A1 (en) * | 2012-08-06 | 2014-02-06 | Implant Sciences Corporation | Non-radioactive ion source using high energy electrons |
US20160172146A1 (en) * | 2014-12-12 | 2016-06-16 | Agilent Technologies, Inc. | Ion source for soft electron ionization and related systems and methods |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05205681A (ja) * | 1992-01-27 | 1993-08-13 | Kawasaki Steel Corp | イオン源装置 |
US7247495B2 (en) * | 1998-11-23 | 2007-07-24 | Aviv Amirav | Mass spectrometer method and apparatus for analyzing a sample in a solution |
JP2001126630A (ja) | 1999-10-27 | 2001-05-11 | Nissin Electric Co Ltd | イオン源 |
DE10236344B4 (de) * | 2002-08-08 | 2007-03-29 | Bruker Daltonik Gmbh | Ionisieren an Atmosphärendruck für massenspektrometrische Analysen |
GB2411763B (en) | 2004-03-05 | 2009-02-18 | Thermo Electron Corp | Flood gun for charge neutralization |
JP4384542B2 (ja) * | 2004-05-24 | 2009-12-16 | 株式会社日立ハイテクノロジーズ | 質量分析装置 |
US6998622B1 (en) * | 2004-11-17 | 2006-02-14 | Agilent Technologies, Inc. | On-axis electron impact ion source |
EP1826809A1 (de) | 2006-02-22 | 2007-08-29 | FEI Company | Partikel-Optisches Gerät ausgestattet mit einer Gasionenquelle |
JP4957808B2 (ja) | 2007-05-21 | 2012-06-20 | 株式会社島津製作所 | 荷電粒子集束装置 |
WO2014022301A1 (en) * | 2012-08-03 | 2014-02-06 | Thermo Finnigan Llc | Ion carpet for mass spectrometry having progressive electrodes |
US9773656B2 (en) | 2014-05-14 | 2017-09-26 | Shimadzu Corporation | Ion transport apparatus and mass spectrometer using the same |
CZ306708B6 (cs) | 2015-07-24 | 2017-05-17 | Tescan Brno, S.R.O. | Zařízení pro hmotnostní spektrometrii |
GB201520134D0 (en) | 2015-11-16 | 2015-12-30 | Micromass Uk Ltd And Leco Corp | Imaging mass spectrometer |
-
2017
- 2017-02-28 LU LU100109A patent/LU100109B1/de active IP Right Grant
-
2018
- 2018-02-28 EP EP18710794.1A patent/EP3590126B1/de active Active
- 2018-02-28 WO PCT/EP2018/054956 patent/WO2018158329A1/en unknown
- 2018-02-28 JP JP2019547143A patent/JP7190436B2/ja active Active
- 2018-02-28 US US16/488,984 patent/US11004649B2/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5391962A (en) * | 1992-07-13 | 1995-02-21 | The United States Of America As Represented By The Secretary Of The Army | Electron beam driven negative ion source |
US20050258364A1 (en) * | 2004-05-21 | 2005-11-24 | Whitehouse Craig M | RF surfaces and RF ion guides |
US20120012746A1 (en) * | 2010-07-19 | 2012-01-19 | Herrero Federico A | Ion source with corner cathode |
US20130120894A1 (en) * | 2011-11-16 | 2013-05-16 | Sri International | Planar ion funnel |
US20140034844A1 (en) * | 2012-08-06 | 2014-02-06 | Implant Sciences Corporation | Non-radioactive ion source using high energy electrons |
US20160172146A1 (en) * | 2014-12-12 | 2016-06-16 | Agilent Technologies, Inc. | Ion source for soft electron ionization and related systems and methods |
Also Published As
Publication number | Publication date |
---|---|
US20200066476A1 (en) | 2020-02-27 |
WO2018158329A1 (en) | 2018-09-07 |
JP2020509548A (ja) | 2020-03-26 |
US11004649B2 (en) | 2021-05-11 |
EP3590126A1 (de) | 2020-01-08 |
EP3590126B1 (de) | 2021-02-17 |
JP7190436B2 (ja) | 2022-12-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG | Patent granted |
Effective date: 20180907 |