LU100109B1 - Ionenquellenvorrichtung - Google Patents

Ionenquellenvorrichtung Download PDF

Info

Publication number
LU100109B1
LU100109B1 LU100109A LU100109A LU100109B1 LU 100109 B1 LU100109 B1 LU 100109B1 LU 100109 A LU100109 A LU 100109A LU 100109 A LU100109 A LU 100109A LU 100109 B1 LU100109 B1 LU 100109B1
Authority
LU
Luxembourg
Prior art keywords
source device
ion source
ion
source
Prior art date
Application number
LU100109A
Other languages
English (en)
French (fr)
Inventor
Castro Olivier De
Serge Della-Negra
David Dowsett
Tom Wirtz
Original Assignee
Luxembourg Inst Science & Tech List
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Luxembourg Inst Science & Tech List filed Critical Luxembourg Inst Science & Tech List
Priority to LU100109A priority Critical patent/LU100109B1/de
Priority to PCT/EP2018/054956 priority patent/WO2018158329A1/en
Priority to EP18710794.1A priority patent/EP3590126B1/de
Priority to JP2019547143A priority patent/JP7190436B2/ja
Priority to US16/488,984 priority patent/US11004649B2/en
Application granted granted Critical
Publication of LU100109B1 publication Critical patent/LU100109B1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
    • H01J27/205—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers with electrons, e.g. electron impact ionisation, electron attachment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/061—Construction
    • H01J2237/062—Reducing size of gun
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0815—Methods of ionisation
    • H01J2237/082—Electron beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1504—Associated circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31749—Focused ion beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/06—Electron- or ion-optical arrangements
    • H01J49/062—Ion guides
    • H01J49/065—Ion guides having stacked electrodes, e.g. ring stack, plate stack
    • H01J49/066—Ion funnels

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
LU100109A 2017-02-28 2017-02-28 Ionenquellenvorrichtung LU100109B1 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
LU100109A LU100109B1 (de) 2017-02-28 2017-02-28 Ionenquellenvorrichtung
PCT/EP2018/054956 WO2018158329A1 (en) 2017-02-28 2018-02-28 Ion source device
EP18710794.1A EP3590126B1 (de) 2017-02-28 2018-02-28 Ionenquellenvorrichtung
JP2019547143A JP7190436B2 (ja) 2017-02-28 2018-02-28 イオン源デバイス
US16/488,984 US11004649B2 (en) 2017-02-28 2018-02-28 Ion source device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
LU100109A LU100109B1 (de) 2017-02-28 2017-02-28 Ionenquellenvorrichtung

Publications (1)

Publication Number Publication Date
LU100109B1 true LU100109B1 (de) 2018-09-07

Family

ID=59009720

Family Applications (1)

Application Number Title Priority Date Filing Date
LU100109A LU100109B1 (de) 2017-02-28 2017-02-28 Ionenquellenvorrichtung

Country Status (5)

Country Link
US (1) US11004649B2 (de)
EP (1) EP3590126B1 (de)
JP (1) JP7190436B2 (de)
LU (1) LU100109B1 (de)
WO (1) WO2018158329A1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020121252A1 (en) * 2018-12-13 2020-06-18 Perkinelmer Health Sciences Canada, Inc. Mass spectrometer components including programmable elements and devices and systems using them
DE102019208278A1 (de) * 2019-06-06 2019-08-01 Carl Zeiss Smt Gmbh Ionisierungseinrichtung und Massenspektrometer
US20250079146A1 (en) * 2023-08-31 2025-03-06 Agilent Technologies, Inc. Ion source for mass spectrometer
FR3157655A1 (fr) 2023-12-20 2025-06-27 Polygon Physics Source d’ions
WO2025132161A1 (fr) 2023-12-20 2025-06-26 Cameca Source d'ions

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5391962A (en) * 1992-07-13 1995-02-21 The United States Of America As Represented By The Secretary Of The Army Electron beam driven negative ion source
US20050258364A1 (en) * 2004-05-21 2005-11-24 Whitehouse Craig M RF surfaces and RF ion guides
US20120012746A1 (en) * 2010-07-19 2012-01-19 Herrero Federico A Ion source with corner cathode
US20130120894A1 (en) * 2011-11-16 2013-05-16 Sri International Planar ion funnel
US20140034844A1 (en) * 2012-08-06 2014-02-06 Implant Sciences Corporation Non-radioactive ion source using high energy electrons
US20160172146A1 (en) * 2014-12-12 2016-06-16 Agilent Technologies, Inc. Ion source for soft electron ionization and related systems and methods

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05205681A (ja) * 1992-01-27 1993-08-13 Kawasaki Steel Corp イオン源装置
US7247495B2 (en) * 1998-11-23 2007-07-24 Aviv Amirav Mass spectrometer method and apparatus for analyzing a sample in a solution
JP2001126630A (ja) * 1999-10-27 2001-05-11 Nissin Electric Co Ltd イオン源
DE10236344B4 (de) * 2002-08-08 2007-03-29 Bruker Daltonik Gmbh Ionisieren an Atmosphärendruck für massenspektrometrische Analysen
GB2411763B (en) * 2004-03-05 2009-02-18 Thermo Electron Corp Flood gun for charge neutralization
JP4384542B2 (ja) * 2004-05-24 2009-12-16 株式会社日立ハイテクノロジーズ 質量分析装置
US6998622B1 (en) * 2004-11-17 2006-02-14 Agilent Technologies, Inc. On-axis electron impact ion source
EP1826809A1 (de) * 2006-02-22 2007-08-29 FEI Company Partikel-Optisches Gerät ausgestattet mit einer Gasionenquelle
WO2008142801A1 (en) * 2007-05-21 2008-11-27 Shimadzu Corporation Charged-particle condensing device
WO2014022301A1 (en) * 2012-08-03 2014-02-06 Thermo Finnigan Llc Ion carpet for mass spectrometry having progressive electrodes
JP6237896B2 (ja) * 2014-05-14 2017-11-29 株式会社島津製作所 質量分析装置
CZ306708B6 (cs) 2015-07-24 2017-05-17 Tescan Brno, S.R.O. Zařízení pro hmotnostní spektrometrii
GB201520134D0 (en) 2015-11-16 2015-12-30 Micromass Uk Ltd And Leco Corp Imaging mass spectrometer

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5391962A (en) * 1992-07-13 1995-02-21 The United States Of America As Represented By The Secretary Of The Army Electron beam driven negative ion source
US20050258364A1 (en) * 2004-05-21 2005-11-24 Whitehouse Craig M RF surfaces and RF ion guides
US20120012746A1 (en) * 2010-07-19 2012-01-19 Herrero Federico A Ion source with corner cathode
US20130120894A1 (en) * 2011-11-16 2013-05-16 Sri International Planar ion funnel
US20140034844A1 (en) * 2012-08-06 2014-02-06 Implant Sciences Corporation Non-radioactive ion source using high energy electrons
US20160172146A1 (en) * 2014-12-12 2016-06-16 Agilent Technologies, Inc. Ion source for soft electron ionization and related systems and methods

Also Published As

Publication number Publication date
US11004649B2 (en) 2021-05-11
JP7190436B2 (ja) 2022-12-15
EP3590126A1 (de) 2020-01-08
EP3590126B1 (de) 2021-02-17
JP2020509548A (ja) 2020-03-26
WO2018158329A1 (en) 2018-09-07
US20200066476A1 (en) 2020-02-27

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Date Code Title Description
FG Patent granted

Effective date: 20180907