LT2013108A - Method for increasing laser induced damage threshold by etching of optical substrates - Google Patents
Method for increasing laser induced damage threshold by etching of optical substratesInfo
- Publication number
- LT2013108A LT2013108A LT2013108A LT2013108A LT2013108A LT 2013108 A LT2013108 A LT 2013108A LT 2013108 A LT2013108 A LT 2013108A LT 2013108 A LT2013108 A LT 2013108A LT 2013108 A LT2013108 A LT 2013108A
- Authority
- LT
- Lithuania
- Prior art keywords
- etching
- sample
- optical substrates
- cleaning
- soaking
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0075—Cleaning of glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
- C03C15/02—Surface treatment of glass, not in the form of fibres or filaments, by etching for making a smooth surface
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
This invention provides a simple and rapid method for enhancing the surfaces of optical substrates by removing the polished layer and cleaning out the slurry containing subsurface damage. The method comprises the following steps: preparation of the polished optical glass sample (5) by cleaning in an ultrasonic bath, preferably containing potash as the cleaning fluid; placing and soaking the cleaned sample (5) in an etching mixture of hydrogen fluoride and nitric acid (6); hermetically securing the non-etched sample surfaces in the etching environment; soaking the sample for a predetermined time interval; removing and rinsing the sample with an appropriate washing fluid. During the etching procedure the humidity and temperature of the etching environment is controlled. The sample during the etching procedure is placed in the etching environment in such a way that the surface being etched is as level as possible.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| LT2013108A LT2013108A (en) | 2013-10-07 | 2013-10-07 | Method for increasing laser induced damage threshold by etching of optical substrates |
| PCT/IB2013/059275 WO2015052556A1 (en) | 2013-10-07 | 2013-10-10 | Method for increasing laser induced damage threshold by etching of optical substrates |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| LT2013108A LT2013108A (en) | 2013-10-07 | 2013-10-07 | Method for increasing laser induced damage threshold by etching of optical substrates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| LT2013108A true LT2013108A (en) | 2015-04-27 |
Family
ID=49880859
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| LT2013108A LT2013108A (en) | 2013-10-07 | 2013-10-07 | Method for increasing laser induced damage threshold by etching of optical substrates |
Country Status (2)
| Country | Link |
|---|---|
| LT (1) | LT2013108A (en) |
| WO (1) | WO2015052556A1 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105481259B (en) * | 2015-12-08 | 2019-04-12 | 中国工程物理研究院激光聚变研究中心 | Promote the post-processing approach of fused quartz optical component damage threshold |
| FR3056578B1 (en) | 2016-09-23 | 2018-12-07 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | METHOD FOR IMPROVING THE LASER FLOW OF AN OPTICAL COMPONENT |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6099389A (en) | 1998-10-05 | 2000-08-08 | The United States Of America As Represented By The United States Department Of Energy | Fabrication of an optical component |
| US6402851B1 (en) * | 2000-05-19 | 2002-06-11 | International Business Machines Corporation | Lanthanide oxide dissolution from glass surface |
| US8313662B2 (en) * | 2009-10-01 | 2012-11-20 | Lawrence Livermore National Security, Llc | Methods for globally treating silica optics to reduce optical damage |
| JP5251861B2 (en) * | 2009-12-28 | 2013-07-31 | 信越化学工業株式会社 | Method for producing synthetic quartz glass substrate |
-
2013
- 2013-10-07 LT LT2013108A patent/LT2013108A/en not_active Application Discontinuation
- 2013-10-10 WO PCT/IB2013/059275 patent/WO2015052556A1/en active Application Filing
Also Published As
| Publication number | Publication date |
|---|---|
| WO2015052556A1 (en) | 2015-04-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| BB1A | Patent application published |
Effective date: 20150427 |
|
| FD9A | Withdrawn applications |
Effective date: 20160218 |