IN2014DE02497A - - Google Patents
Info
- Publication number
- IN2014DE02497A IN2014DE02497A IN2497DE2014A IN2014DE02497A IN 2014DE02497 A IN2014DE02497 A IN 2014DE02497A IN 2497DE2014 A IN2497DE2014 A IN 2497DE2014A IN 2014DE02497 A IN2014DE02497 A IN 2014DE02497A
- Authority
- IN
- India
- Prior art keywords
- glass
- responsive
- hydrated
- electrode
- glass electrode
- Prior art date
Links
- 239000011521 glass Substances 0.000 abstract 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract 2
- 238000004140 cleaning Methods 0.000 abstract 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 abstract 1
- LDDQLRUQCUTJBB-UHFFFAOYSA-O azanium;hydrofluoride Chemical compound [NH4+].F LDDQLRUQCUTJBB-UHFFFAOYSA-O 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/10—Salts
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/18—Compositions for glass with special properties for ion-sensitive glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/10—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by other chemical means
- B05D3/104—Pretreatment of other substrates
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0075—Cleaning of glass
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/18—Glass; Plastics
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Geochemistry & Mineralogy (AREA)
- Inorganic Chemistry (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Surface Treatment Of Glass (AREA)
- Detergent Compositions (AREA)
Abstract
To maintain a uniform etching rate during cleaning of a responsive glass in a glass electrode, a responsive-glass cleaning liquid for a glass electrode 1 serves to clean a responsive glass 2 used in the glass electrode 1, is used with a hydrated-layer forming solution for forming a hydrated layer on the surface of the responsive glass 2, and contains ammonium hydrogen fluoride having a predetermined concentration, or a salt of a strong base containing hydrofluoric acid and a fluoride ion. (Fig. 2)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013180920A JP6543436B2 (en) | 2013-09-02 | 2013-09-02 | Cleaning kit for response glass of glass electrode and method for cleaning response glass of glass electrode |
Publications (1)
Publication Number | Publication Date |
---|---|
IN2014DE02497A true IN2014DE02497A (en) | 2015-06-26 |
Family
ID=51453663
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IN2497DE2014 IN2014DE02497A (en) | 2013-09-02 | 2014-09-02 |
Country Status (5)
Country | Link |
---|---|
US (1) | US9506021B2 (en) |
EP (1) | EP2853314A1 (en) |
JP (1) | JP6543436B2 (en) |
CN (1) | CN104422723B (en) |
IN (1) | IN2014DE02497A (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104931568A (en) * | 2015-06-29 | 2015-09-23 | 彭梓 | Indium tin oxide electrochemiluminescence reaction electrode regeneration cleaning method |
CN110803869A (en) * | 2019-11-25 | 2020-02-18 | 苏州博洋化学股份有限公司 | Glass thinning liquid |
CN111363551B (en) * | 2020-03-19 | 2021-11-30 | 常州星海电子股份有限公司 | Etching liquid and etching process for etching ultrahigh-power light-resistant glass chip |
CN113814224A (en) * | 2021-08-23 | 2021-12-21 | 中国电子科技集团公司第十五研究所 | Printed board hole wall drilling dirt treatment method |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2366489A (en) * | 1940-08-02 | 1945-01-02 | Nat Technical Lab | Glass electrode and method |
US2462843A (en) * | 1945-02-07 | 1949-03-01 | Nat Technical Lab | Glass electrode |
US3129160A (en) * | 1962-04-25 | 1964-04-14 | Beckman Instruments Inc | Desensitized glass membrane and the method and composition for producing the same |
US4055458A (en) * | 1975-08-07 | 1977-10-25 | Bayer Aktiengesellschaft | Etching glass with HF and fluorine-containing surfactant |
US4650562A (en) | 1986-01-16 | 1987-03-17 | Beckman Industrial Corporation | Reference electrode device |
KR950002233B1 (en) * | 1992-08-14 | 1995-03-15 | 김태환 | Glass etching composition and method for etching glass surface therewith |
KR960010586B1 (en) * | 1993-07-03 | 1996-08-06 | 김중형 | Etching method of the glass and the compositions thereof |
KR100248113B1 (en) * | 1997-01-21 | 2000-03-15 | 이기원 | Cleaning and etching compositions for electrical display device and substrate |
US6284721B1 (en) * | 1997-01-21 | 2001-09-04 | Ki Won Lee | Cleaning and etching compositions |
AU4314600A (en) * | 1999-04-27 | 2000-11-10 | Hiroshi Miwa | Glass etching composition and method for frosting using the same |
US6297208B1 (en) * | 1999-10-11 | 2001-10-02 | Iron Out, Inc. | Rust stain removal formula |
JP3956587B2 (en) * | 1999-11-18 | 2007-08-08 | Hoya株式会社 | Cleaning method for glass substrate for magnetic disk |
FR2809722B1 (en) * | 2000-05-31 | 2003-01-03 | Seppic Sa | NEW PROCESS FOR CHEMICAL DEFROSTING OF GLASS INCLUDING RINSING WITH SALINE SOLUTION AND POLISHED OBJECTS OBTAINED BY THIS PROCESS |
JP2003262605A (en) | 2002-03-08 | 2003-09-19 | Horiba Ltd | Method and apparatus for cleaning ion concentration measuring electrode |
JP2007008739A (en) * | 2005-06-28 | 2007-01-18 | Seiko Epson Corp | Method for manufacturing substrate with concave portion, substrate with concave portion, lens substrate, transmission type screen, and rear type projector |
US8038803B2 (en) * | 2006-03-07 | 2011-10-18 | Abbott Laboratories | Method of descaling metallic devices |
CN201293767Y (en) * | 2007-04-28 | 2009-08-19 | 钦州华成自控设备有限公司 | On-line automatic cleaning and detecting device for double electrodes |
CN201427119Y (en) * | 2009-07-06 | 2010-03-24 | 杭州电子科技大学 | Device for descaling surface of glass electrode online |
JP5998030B2 (en) * | 2011-12-07 | 2016-09-28 | 日本板硝子株式会社 | Glass for solar cell or display and method for producing the same |
CN104661976A (en) * | 2012-07-12 | 2015-05-27 | 康宁股份有限公司 | Textured glass surface and methods of making |
-
2013
- 2013-09-02 JP JP2013180920A patent/JP6543436B2/en active Active
-
2014
- 2014-09-01 CN CN201410441427.5A patent/CN104422723B/en active Active
- 2014-09-02 IN IN2497DE2014 patent/IN2014DE02497A/en unknown
- 2014-09-02 US US14/474,886 patent/US9506021B2/en not_active Expired - Fee Related
- 2014-09-02 EP EP20140183125 patent/EP2853314A1/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
EP2853314A1 (en) | 2015-04-01 |
CN104422723A (en) | 2015-03-18 |
CN104422723B (en) | 2019-03-15 |
US20150064344A1 (en) | 2015-03-05 |
US9506021B2 (en) | 2016-11-29 |
JP6543436B2 (en) | 2019-07-10 |
JP2015049138A (en) | 2015-03-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
BR112018072175A2 (en) | Method for preparing textured structure of crystalline silicon solar cell | |
IN2014DE02497A (en) | ||
CL2018002018A1 (en) | Selective permeable lithium membrane, lithium recovery device, lithium recovery method and hydrogen production method. | |
TW201614104A (en) | Etching method, method of manufacturing article, and etching solution | |
MX2015017374A (en) | Personal care articles. | |
WO2013154711A8 (en) | Treatment fluids comprising an alkali metal complexing agent and methods for use thereof | |
MY176485A (en) | Liquid detergent | |
AR095821A1 (en) | PROCEDURE FOR OBTAINING LITHIUM COMPOUNDS | |
WO2008129944A1 (en) | Etching solution | |
EA201700210A1 (en) | ELECTROLYSIZABLE WATER COMPOSITION | |
PH12017500512B1 (en) | Electrode for electrochlorination processes and method of manufacturing thereof | |
MY189881A (en) | Nonaqueous electrolyte secondary battery, battery assembly, and method of manufacturing the same | |
ATE504545T1 (en) | METHOD FOR CLEANING POLYCRYSTALLINE SILICON | |
TWD163179S (en) | Part of substrate cleaning equipment | |
MY180057A (en) | Complexation of calcium ions is the presence of quaternized amine compounds while acidizing a subterranean formation | |
MX2016002959A (en) | Treatment fluids containing a perfluorinated carboxylic acid for use in subterranean formation operations. | |
PH12015502678A1 (en) | Supplement, surface -treated metal material, and production method therefor | |
TN2020000014A1 (en) | Method and device for making aniline-free leucoindigo salt solutions. | |
IN2014CN04343A (en) | ||
SG151169A1 (en) | Process for cleaning a semiconductor wafer | |
MX2017009002A (en) | Method of obtaining or maintaining optical transmittance into deaerated liquid. | |
WO2015019152A3 (en) | Film deposition device of metal film and film deposition method | |
SG10201903192QA (en) | Sheet for sealing hollow type electronic device and method of manufacturing hollow type electronic device package | |
LT2013108A (en) | Method for increasing laser induced damage threshold by etching of optical substrates | |
WO2016032856A3 (en) | Sequential etching treatment for solar cell fabrication |