KR970070147A - 하이드로겐 실세스퀴옥산 수지 피복 조성물 - Google Patents

하이드로겐 실세스퀴옥산 수지 피복 조성물 Download PDF

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Publication number
KR970070147A
KR970070147A KR1019960009940A KR19960009940A KR970070147A KR 970070147 A KR970070147 A KR 970070147A KR 1019960009940 A KR1019960009940 A KR 1019960009940A KR 19960009940 A KR19960009940 A KR 19960009940A KR 970070147 A KR970070147 A KR 970070147A
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KR
South Korea
Prior art keywords
hydrogen silsesquioxane
silsesquioxane resin
coating composition
resin coating
weight
Prior art date
Application number
KR1019960009940A
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English (en)
Inventor
마리 시크티취 세실리아
알렌 빈센트 개리
안드리아 쉐이버트 크리스텐
Original Assignee
노만 에드워드 루이스
다우 코닝 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 노만 에드워드 루이스, 다우 코닝 코포레이션 filed Critical 노만 에드워드 루이스
Publication of KR970070147A publication Critical patent/KR970070147A/ko

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/02—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
    • C08J3/09—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids
    • C08J3/091—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids characterised by the chemical constitution of the organic liquid
    • C08J3/092—Hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2383/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
    • C08J2383/04—Polysiloxanes

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Paints Or Removers (AREA)

Abstract

포화 알킬 탄화수소에 용해된 하이드로겐 실세스퀴옥산 수지를 포함하는 피복 조성물이 기재되어 있다. 이 조성물은 두껍고/거나 우수한 피막 특질을 갖는 피막을 형성하는데 유용하다.

Description

하이드로겐 실세스퀴옥산 수지 피복 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (2)

  1. 데칸 25중량% 이하, 이소옥탄 10 내지 35중량% 및 옥탄 65 내지 90중량%를 포함하는 용매에 희석된 하이드로겐 실세스퀴옥산 수지를 10 내지 40중량% 포함하는 피복 조성물.
  2. 이소옥탄 60 내지 80중량%, 옥탄 40중량% 이하 및 데칸 40중량% 이하를 포함하는 용매에 희석된 하이드로겐 실세스퀴옥산 수지를 10 내지 40중량% 포함하는 피복 조성물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019960009940A 1995-04-07 1996-04-03 하이드로겐 실세스퀴옥산 수지 피복 조성물 KR970070147A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/418,725 1995-04-07
US08/418,725 US5618878A (en) 1995-04-07 1995-04-07 Hydrogen silsesquioxane resin coating composition

Publications (1)

Publication Number Publication Date
KR970070147A true KR970070147A (ko) 1997-11-07

Family

ID=23659329

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960009940A KR970070147A (ko) 1995-04-07 1996-04-03 하이드로겐 실세스퀴옥산 수지 피복 조성물

Country Status (5)

Country Link
US (1) US5618878A (ko)
EP (1) EP0736584B1 (ko)
JP (1) JPH08325521A (ko)
KR (1) KR970070147A (ko)
DE (1) DE69600815T2 (ko)

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EP0860462A3 (en) * 1997-02-24 1999-04-21 Dow Corning Toray Silicone Company Limited Composition and method for the formation of silica thin films
JP3415741B2 (ja) * 1997-03-31 2003-06-09 東レ・ダウコーニング・シリコーン株式会社 電気絶縁性薄膜形成用組成物および電気絶縁性薄膜の形成方法
JP3354431B2 (ja) * 1997-03-31 2002-12-09 東レ・ダウコーニング・シリコーン株式会社 電気絶縁性薄膜形成用組成物および電気絶縁性薄膜の形成方法
US6743856B1 (en) 1997-04-21 2004-06-01 Honeywell International Inc. Synthesis of siloxane resins
US6218497B1 (en) 1997-04-21 2001-04-17 Alliedsignal Inc. Organohydridosiloxane resins with low organic content
US6015457A (en) * 1997-04-21 2000-01-18 Alliedsignal Inc. Stable inorganic polymers
US6143855A (en) 1997-04-21 2000-11-07 Alliedsignal Inc. Organohydridosiloxane resins with high organic content
US5866197A (en) * 1997-06-06 1999-02-02 Dow Corning Corporation Method for producing thick crack-free coating from hydrogen silsequioxane resin
US6177199B1 (en) 1999-01-07 2001-01-23 Alliedsignal Inc. Dielectric films from organohydridosiloxane resins with low organic content
US6218020B1 (en) 1999-01-07 2001-04-17 Alliedsignal Inc. Dielectric films from organohydridosiloxane resins with high organic content
US6231989B1 (en) 1998-11-20 2001-05-15 Dow Corning Corporation Method of forming coatings
US6440550B1 (en) * 1999-10-18 2002-08-27 Honeywell International Inc. Deposition of fluorosilsesquioxane films
US6472076B1 (en) 1999-10-18 2002-10-29 Honeywell International Inc. Deposition of organosilsesquioxane films
US6287477B1 (en) 1999-10-18 2001-09-11 Honeywell International Inc. Solvents for processing silsesquioxane and siloxane resins
GB9930402D0 (en) * 1999-12-23 2000-02-16 Exxon Chemical Patents Inc Selective removal of isobutene from C4 olefinic feedstocks
US6913796B2 (en) * 2000-03-20 2005-07-05 Axcelis Technologies, Inc. Plasma curing process for porous low-k materials
US7011868B2 (en) * 2000-03-20 2006-03-14 Axcelis Technologies, Inc. Fluorine-free plasma curing process for porous low-k materials
US6558755B2 (en) 2000-03-20 2003-05-06 Dow Corning Corporation Plasma curing process for porous silica thin film
US6759098B2 (en) 2000-03-20 2004-07-06 Axcelis Technologies, Inc. Plasma curing of MSQ-based porous low-k film materials
US6576300B1 (en) 2000-03-20 2003-06-10 Dow Corning Corporation High modulus, low dielectric constant coatings
WO2002031596A1 (en) 2000-10-12 2002-04-18 University Of North Carolina At Chapel Hill Co2-processes photoresists, polymers, and photoactive compounds for microlithography
US6914166B2 (en) 2000-12-20 2005-07-05 Exxonmobil Chemical Patents Inc. Process for the selective dimerization of isobutene
US6756085B2 (en) * 2001-09-14 2004-06-29 Axcelis Technologies, Inc. Ultraviolet curing processes for advanced low-k materials
US7915369B2 (en) * 2004-12-07 2011-03-29 Panasonic Electric Works Co., Ltd. Ultraviolet transmissive polyhedral silsesquioxane polymers
US7868198B2 (en) 2007-06-15 2011-01-11 Laine Richard M Multi-functional silsesquioxanes for novel coating applications
EP2098498A1 (en) 2008-03-04 2009-09-09 ExxonMobil Chemical Patents Inc. Selective oligomerization of isobutene
US8440864B2 (en) 2008-10-10 2013-05-14 Exxonmobil Chemical Patents Inc. Process for producing sec-butylbenzene
US11110204B2 (en) 2016-09-30 2021-09-07 Gc Corporation Method of producing bioabsorbable membrane

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4756977A (en) * 1986-12-03 1988-07-12 Dow Corning Corporation Multilayer ceramics from hydrogen silsesquioxane
US5063267A (en) * 1990-11-28 1991-11-05 Dow Corning Corporation Hydrogen silsesquioxane resin fractions and their use as coating materials
JP3174416B2 (ja) * 1992-12-10 2001-06-11 ダウ・コ−ニング・コ−ポレ−ション 酸化ケイ素膜の形成方法
JP3210457B2 (ja) * 1992-12-14 2001-09-17 ダウ・コ−ニング・コ−ポレ−ション 酸化ケイ素膜の形成方法
US5320868A (en) * 1993-09-13 1994-06-14 Dow Corning Corporation Method of forming SI-O containing coatings

Also Published As

Publication number Publication date
EP0736584B1 (en) 1998-10-21
US5618878A (en) 1997-04-08
JPH08325521A (ja) 1996-12-10
DE69600815D1 (de) 1998-11-26
DE69600815T2 (de) 1999-06-10
EP0736584A3 (en) 1997-05-02
EP0736584A2 (en) 1996-10-09

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