KR970066710A - 디지털 정보 전사에 의한 플렉소 인쇄판 제조에 적절한 다층 기록 소자 - Google Patents

디지털 정보 전사에 의한 플렉소 인쇄판 제조에 적절한 다층 기록 소자 Download PDF

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KR970066710A
KR970066710A KR1019970009675A KR19970009675A KR970066710A KR 970066710 A KR970066710 A KR 970066710A KR 1019970009675 A KR1019970009675 A KR 1019970009675A KR 19970009675 A KR19970009675 A KR 19970009675A KR 970066710 A KR970066710 A KR 970066710A
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layer
developer
recording element
actinic radiation
crosslinked
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KR1019970009675A
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토마스 로에르체르
클리프 쉐러
오스카 뉘켄
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노이만, 랑핑어
바스프 락케 운트 파르벤 아케
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Publication of KR970066710A publication Critical patent/KR970066710A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)

Abstract

본 발명은 디지털 정보 전사에 의한 플렉소 인쇄판 제조에 적절하고, 그 중 하나가 치수 안정성의 기재 위에 나머지의 상부 위에 배열되어 있는, 활성 방사선에 의해 가교결합될 수 있는 층(A), 활성 방사선에 민감한 층 (B), 및 필요하다면, 박리성 커버 시트를 갖는 다층 기록 소자에 관한 것으로, 여기서 활성 방사선에 의해 가교결합될 수 있는 층 (A)는 0.5~5J/㎠의 활성 방사선에 화상식 노출에 의해 가교결합되고, 이어서 현상액에 의해 세척될 수 있고, 1종 이상의 탄성 중합체 결합제, 에틸렌계 불포화 공중합성 유기 화합물, 광중합개시제 또는 광중합개시제계, 및 필요하다면 다른 보조제의 혼합물을 주성분으로 하고, 활성 방사선에 민감한 층 (B)는 현상액 중으로 용해되거나 분산될 수 있는 층으로서, 활성광 범위에서 광학 밀도＞2.5이며, 5~50J/㎠의 에너지로 파장 범위 254내지 532nm에서 하나 이상의 레이저 펄스의 결과로서＞1까지 광학 밀도가 변하고, 아릴아조포스포네이트 함유 화합물을 주성분으로 한다.

Description

디지털 정보 전사에 의한 플렉소 인쇄판 제조에 적절한 다층 기록 소자
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (5)

  1. 그 중 하나가 치수 안정성의 기재 위에 나머지의 상부 위에 배열되어 있는 활성 방사선에 의해 가교결합될 수 있고, 필요하다면 접착 촉진층에 의해 치수 안정성의 기재에 결합되는 층(A), 마찬가지로 활성 방사선에 민감한 층(B), 및 필요하다면, 박리성 커버 시트를 갖고, 활성 방사선에 의해 가교 결합될 수 있는 층(A)는 0.5~5J/㎠의 활성 방사선에 화상식 노출에 의해 가교결합되고, 이어서 현상액에 의해 세척될 수 있고, 1종 이상의 탄성 중합체 결합제, 에틸렌계 불포화 공중합성 유기 화합물, 광중합개시제 또는 광중합개시제계, 및 필요하다면 다른 보조제의 혼합물을 주성분으로 하고, 활성 방사선에 민감한 층(B)는 현상액 중으로 용해되거나 분산될 수 있는 층으로서, 활성과 범위에서 광학 밀도＞2.5이며, 5~50J/㎠의 에너지로 파장 범위 254 내지 532nm에서 하나 이상의 레이저 펄스의 결과로서 ＞1까지 광학 밀도가 변하고, 아릴아조포스포네이트 함유 화합물을 주성분으로 하는, 디지털 정보 전사에 의한 플렉소 인쇄판 제조에 적합한 다층 기록 소자.
  2. 제1항에 있어서, 물 또는 알콜/물 혼합물이 층(A) 및 층(B)에 대한 현상액으로 적절한 기록 소자.
  3. 제1항에 있어서, 유기 용매 또는 용매 혼합물이 층(A) 및 층(B)에 대한 현상액으로 적절한 기록 소자.
  4. 제1항에 있어서, 유기 용매 또는 용매 혼합물이 층(A)에 대한 현상액으로 적절하고, 알콜/물 혼합물이 층(B)에 대한 현상액으로 적절한 기록 소자.
  5. 활성 방사선에 민감한 제1항에 청구된 바와 같은 다층 기록 소자의 층(B)를 UV 레이저에 의해 디지털 데이터 세트로부터 화상식으로 조직하고, 이어서 층(A)를 후속적으로 프린팅 부분 중에서 활성 방사선에 균일 하게 노출시킴으로써 가교결합시키고, 이어서 층(B)를 현상액 중으로 용해시키거나 분산시키고, 층(A)의 비가교결합 화상 영역을 동일하거나 또는 다른 현상액 중에서 현상시키는 플렉소 인쇄판의 제조 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019970009675A 1996-03-22 1997-03-21 디지털 정보 전사에 의한 플렉소 인쇄판 제조에 적절한 다층 기록 소자 KR970066710A (ko)

Applications Claiming Priority (2)

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DE19611262.1 1996-03-22
DE19611262A DE19611262A1 (de) 1996-03-22 1996-03-22 Zur Herstellung von Flexodruckplatten durch digitale Informationsübertragung geeignetes mehrschichtiges Aufzeichnungselement

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US (1) US5925490A (ko)
EP (1) EP0797120B1 (ko)
JP (1) JPH1039512A (ko)
KR (1) KR970066710A (ko)
DE (2) DE19611262A1 (ko)

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DE19859623A1 (de) * 1998-12-23 2000-08-24 Basf Drucksysteme Gmbh Photopolymerisierbare Druckformen mit Oberschicht zur Herstellung von Reliefdruckformen
DE19859631A1 (de) * 1998-12-23 2000-07-06 Basf Drucksysteme Gmbh Verfahren zur Herstellung von großformatigen Verbund-Reliefdruckformen durch Laserpositionierung und anschließende Bebilderung mittels Laser
EP1072955B1 (en) * 1999-07-27 2006-03-01 Fuji Photo Film Co., Ltd. Image forming material
JP4480812B2 (ja) * 1999-07-27 2010-06-16 富士フイルム株式会社 感光又は感熱性ポジ型平版印刷版原版、および製版方法
US6737216B2 (en) 2000-12-08 2004-05-18 E.I. Du Pont De Nemours And Company Laser engravable flexographic printing element and a method for forming a printing plate from the element
KR100575001B1 (ko) * 2004-12-10 2006-04-28 삼성전자주식회사 상호 결합 없는 이중 포토 리소그라피 방법
EP1910897A4 (en) 2005-07-29 2010-12-22 Anocoil Corp PRINTING PLATE THAT CAN BE IMAGED FOR PRESS DEVELOPMENT
EP3401732B1 (de) 2017-05-11 2020-02-05 Folex AG Hochauflösende flexodruckplatte und mittel zu deren herstellung
DE102018214343A1 (de) * 2018-08-24 2020-02-27 Heidelberg Schweiz AG Verfahren zum Herstellen von Flexodruckplatten
EP3832389A1 (de) 2019-12-06 2021-06-09 Folex AG Hochauflösende flexodruckplatte und mittel zu deren herstellung mit verbesserter sperrschicht und haftungsmodulierende schicht

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EP0001138A1 (en) * 1977-08-23 1979-03-21 Howard A. Fromson Method for making lithographic printing plates
DE2909992A1 (de) * 1979-03-14 1980-10-02 Basf Ag Photopolymerisierbare aufzeichnungsmassen, insbesondere zur herstellung von druckplatten und reliefformen
JPS5852646A (ja) * 1981-09-25 1983-03-28 Dainippon Printing Co Ltd フレキソ版の製造方法
US4515877A (en) * 1982-11-27 1985-05-07 Basf Aktiengesellschaft Image-recording materials and image-recording carried out using these to produce an optical mask
IT1230648B (it) * 1988-11-16 1991-10-28 Consilgio Nazionale Delle Rice Derivati polifosfazenici contenenti gruppi carbonilici adatti a processi di fotoreticolazione
DE4117127A1 (de) * 1991-05-25 1992-11-26 Basf Ag Lichtempfindliche aufzeichnungselemente, verfahren zu ihrer herstellung und weiterverarbeitung sowie geraete fuer die durchfuehrung dieser verfahren
US5262275A (en) * 1992-08-07 1993-11-16 E. I. Du Pont De Nemours And Company Flexographic printing element having an IR ablatable layer and process for making a flexographic printing plate
US5607814A (en) * 1992-08-07 1997-03-04 E. I. Du Pont De Nemours And Company Process and element for making a relief image using an IR sensitive layer
DE4339010C2 (de) * 1993-06-25 2000-05-18 Pt Sub Inc Photohärtbares Erzeugnis für Druckplatten
DE19536805A1 (de) * 1995-10-02 1997-04-03 Basf Lacke & Farben Zur Herstellung von Flexodruckplatten durch digitale Informationsübertragung geeignetes mehrschichtiges Aufzeichnungselement

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Publication number Publication date
JPH1039512A (ja) 1998-02-13
EP0797120A2 (de) 1997-09-24
EP0797120B1 (de) 2000-08-16
DE59702176D1 (de) 2000-09-21
DE19611262A1 (de) 1997-09-25
EP0797120A3 (de) 1998-09-30
US5925490A (en) 1999-07-20

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