KR970059836U - 반도체세정액 분석장치 - Google Patents

반도체세정액 분석장치

Info

Publication number
KR970059836U
KR970059836U KR2019960007968U KR19960007968U KR970059836U KR 970059836 U KR970059836 U KR 970059836U KR 2019960007968 U KR2019960007968 U KR 2019960007968U KR 19960007968 U KR19960007968 U KR 19960007968U KR 970059836 U KR970059836 U KR 970059836U
Authority
KR
South Korea
Prior art keywords
cleaning solution
analysis device
semiconductor cleaning
solution analysis
semiconductor
Prior art date
Application number
KR2019960007968U
Other languages
English (en)
Other versions
KR200143498Y1 (ko
Inventor
이인경
주진호
Original Assignee
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전자주식회사 filed Critical 삼성전자주식회사
Priority to KR2019960007968U priority Critical patent/KR200143498Y1/ko
Publication of KR970059836U publication Critical patent/KR970059836U/ko
Application granted granted Critical
Publication of KR200143498Y1 publication Critical patent/KR200143498Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
KR2019960007968U 1996-04-13 1996-04-13 반도체세정액 분석장치 KR200143498Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019960007968U KR200143498Y1 (ko) 1996-04-13 1996-04-13 반도체세정액 분석장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019960007968U KR200143498Y1 (ko) 1996-04-13 1996-04-13 반도체세정액 분석장치

Publications (2)

Publication Number Publication Date
KR970059836U true KR970059836U (ko) 1997-11-10
KR200143498Y1 KR200143498Y1 (ko) 1999-06-15

Family

ID=19453743

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019960007968U KR200143498Y1 (ko) 1996-04-13 1996-04-13 반도체세정액 분석장치

Country Status (1)

Country Link
KR (1) KR200143498Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112735980A (zh) * 2020-12-25 2021-04-30 北京北方华创微电子装备有限公司 半导体清洗工艺的控制方法和半导体清洗设备

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3378543B2 (ja) * 1999-11-26 2003-02-17 株式会社半導体先端テクノロジーズ ウェーハ・キャリア洗浄方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112735980A (zh) * 2020-12-25 2021-04-30 北京北方华创微电子装备有限公司 半导体清洗工艺的控制方法和半导体清洗设备

Also Published As

Publication number Publication date
KR200143498Y1 (ko) 1999-06-15

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Legal Events

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