KR970048986A - Mask with transmittance control phase reversal pattern - Google Patents

Mask with transmittance control phase reversal pattern Download PDF

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Publication number
KR970048986A
KR970048986A KR1019950057042A KR19950057042A KR970048986A KR 970048986 A KR970048986 A KR 970048986A KR 1019950057042 A KR1019950057042 A KR 1019950057042A KR 19950057042 A KR19950057042 A KR 19950057042A KR 970048986 A KR970048986 A KR 970048986A
Authority
KR
South Korea
Prior art keywords
mask
pattern
shielding film
light shielding
control phase
Prior art date
Application number
KR1019950057042A
Other languages
Korean (ko)
Inventor
이중현
문성용
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950057042A priority Critical patent/KR970048986A/en
Publication of KR970048986A publication Critical patent/KR970048986A/en

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Abstract

미세 패넌을 형성 할 수 있으며, 동시에 그 패턴 크기를 증가시키는 것이 용이한 마스크에 관하여 개시한다.Disclosed is a mask that can form a fine pann and, at the same time, is easy to increase its pattern size.

본 발명은 투명한 기판 및 차광막 패턴을 마스크로서, 인접한 차광막 패턴 사이 및 상기 차광막 패턴의 둘레에 다른 부분을 투과한 빛과 180도의 위상차를 가지며 투과율을 조절 위상 반전 패턴을 가지는 것을 특징으로 한다. 본 발명의 마스크를 사용하여 형성된 포토레지스트패턴은 사이의 간격을 충분히 최소화하여 종래의 경우에 비하여 상기 포토레지스트 패턴의 크기를 증가시켜서 후속 공정에서 접촉창의 정렬 여유를 증가시킨다.The present invention is characterized in that a transparent substrate and a light shielding film pattern are masked, and have a phase difference of 180 degrees with light transmitted through other portions between adjacent light shielding film patterns and around the light shielding film pattern, and a transmittance control phase reversal pattern. The photoresist pattern formed by using the mask of the present invention sufficiently minimizes the gap between them, increasing the size of the photoresist pattern as compared with the conventional case, thereby increasing the alignment margin of the contact window in a subsequent process.

Description

투광률 조절 위상 반전 패턴을 가지는 마스크Mask with transmittance control phase reversal pattern

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제2도는 본 발명에 따라 DRAM에서 패드 폴리 패턴을 형성하기 위하여 사용하는 위상 반전 마스크를 보여준다.2 shows a phase inversion mask used to form a pad poly pattern in a DRAM in accordance with the present invention.

Claims (2)

투명한 기판 및 차광막 패턴을 형성된 마스크에 있어서, 인접한 차광막 패턴 사이 및 상기 차광막 패턴의 둘레에 다른 부분을 투과한 빛과 180도의 위상차를 가지며 투과율을 조절한 투과율 조절 위상 반전 패턴을 가지는 것을 특징으로하는 마스크.A mask on which a transparent substrate and a light shielding film pattern are formed, wherein the mask has a transmittance control phase reversal pattern having a phase difference of 180 degrees with light transmitted through another portion between adjacent light shielding film patterns and around the light shielding film pattern and adjusting transmittance . 제1항에 있어서, 상기 투과율 조절 위상 반전 패턴은 0 내지 99%의 투과율은 가지는 것을 특징으로하는 마스크.The mask of claim 1, wherein the transmittance control phase reversal pattern has a transmittance of 0 to 99%. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950057042A 1995-12-26 1995-12-26 Mask with transmittance control phase reversal pattern KR970048986A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950057042A KR970048986A (en) 1995-12-26 1995-12-26 Mask with transmittance control phase reversal pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950057042A KR970048986A (en) 1995-12-26 1995-12-26 Mask with transmittance control phase reversal pattern

Publications (1)

Publication Number Publication Date
KR970048986A true KR970048986A (en) 1997-07-29

Family

ID=66618293

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950057042A KR970048986A (en) 1995-12-26 1995-12-26 Mask with transmittance control phase reversal pattern

Country Status (1)

Country Link
KR (1) KR970048986A (en)

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