KR970045361U - 펠리클을 구비한 마스크 - Google Patents
펠리클을 구비한 마스크Info
- Publication number
- KR970045361U KR970045361U KR2019950040227U KR19950040227U KR970045361U KR 970045361 U KR970045361 U KR 970045361U KR 2019950040227 U KR2019950040227 U KR 2019950040227U KR 19950040227 U KR19950040227 U KR 19950040227U KR 970045361 U KR970045361 U KR 970045361U
- Authority
- KR
- South Korea
- Prior art keywords
- pellicle
- mask
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019950040227U KR200149834Y1 (ko) | 1995-12-12 | 1995-12-12 | 펠리클을 구비한 마스크 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019950040227U KR200149834Y1 (ko) | 1995-12-12 | 1995-12-12 | 펠리클을 구비한 마스크 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970045361U true KR970045361U (ko) | 1997-07-31 |
KR200149834Y1 KR200149834Y1 (ko) | 1999-06-15 |
Family
ID=19433348
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019950040227U KR200149834Y1 (ko) | 1995-12-12 | 1995-12-12 | 펠리클을 구비한 마스크 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR200149834Y1 (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7723704B2 (en) | 2006-11-10 | 2010-05-25 | Globalfoundries Inc. | EUV pellicle with increased EUV light transmittance |
KR101280676B1 (ko) * | 2009-07-16 | 2013-07-01 | 미쓰이 가가쿠 가부시키가이샤 | 펠리클 프레임 및 그것을 포함하는 펠리클 |
-
1995
- 1995-12-12 KR KR2019950040227U patent/KR200149834Y1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR200149834Y1 (ko) | 1999-06-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69518345D1 (de) | Photomaske | |
DE69623154T2 (de) | Kehlkopfmaske | |
BR9509124A (pt) | Máscara de rosto | |
DE69624405D1 (de) | Nasenmaske | |
DE59608189D1 (de) | Atemschutzmaske | |
DE9411495U1 (de) | Individualmaske | |
DE69627450T2 (de) | Kameramasken | |
DE69614212D1 (de) | Tauchermaske | |
KR970045361U (ko) | 펠리클을 구비한 마스크 | |
DE69608952D1 (de) | Gesichtsmaske | |
DE69409158T2 (de) | Papiermaske | |
KR970020906U (ko) | 마스크 | |
KR970020905U (ko) | 방진 마스크 | |
DE29508234U1 (de) | Atemschutzmaske | |
DK0761109T3 (da) | Respirationsmaske | |
KR960028357U (ko) | 마스크 | |
KR970007204U (ko) | 마스크 프레임 구조체 | |
KR970027139U (ko) | 산업용 에어라인 마스크 | |
DE69628260D1 (de) | Negativmaske | |
KR960016389U (ko) | 마스크 | |
KR950003089U (ko) | 마스크 | |
KR960030503U (ko) | 마스크 | |
KR960015340U (ko) | 노광마스크 | |
DE29519707U1 (de) | Masken-Schnorchel-Aufbau | |
DE29519789U1 (de) | Handmaske |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application | ||
J201 | Request for trial against refusal decision |
Free format text: TRIAL AGAINST DECISION OF REJECTION FOR APPEAL AGAINST DECISION TO DECLINE REFUSAL |
|
S901 | Examination by remand of revocation | ||
GRNO | Decision to grant (after opposition) | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20090223 Year of fee payment: 11 |
|
LAPS | Lapse due to unpaid annual fee |