KR970028870A - Photolithography Method of Flat Panel Devices - Google Patents

Photolithography Method of Flat Panel Devices Download PDF

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Publication number
KR970028870A
KR970028870A KR1019950045238A KR19950045238A KR970028870A KR 970028870 A KR970028870 A KR 970028870A KR 1019950045238 A KR1019950045238 A KR 1019950045238A KR 19950045238 A KR19950045238 A KR 19950045238A KR 970028870 A KR970028870 A KR 970028870A
Authority
KR
South Korea
Prior art keywords
photolithography method
partition wall
exposure
mask
flat panel
Prior art date
Application number
KR1019950045238A
Other languages
Korean (ko)
Other versions
KR0177135B1 (en
Inventor
주영대
Original Assignee
엄길용
오리온전기 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 엄길용, 오리온전기 주식회사 filed Critical 엄길용
Priority to KR1019950045238A priority Critical patent/KR0177135B1/en
Publication of KR970028870A publication Critical patent/KR970028870A/en
Application granted granted Critical
Publication of KR0177135B1 publication Critical patent/KR0177135B1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Gas-Filled Discharge Tubes (AREA)

Abstract

본 발명은 PDP등의 평판소자에 경사에지를 가지는 격벽등의 기능층을 형성하는 신규한 사진식각방법을 개시한다.The present invention discloses a novel photolithography method for forming a functional layer such as a partition wall having an inclined edge on a flat plate element such as a PDP.

격벽의 인쇄형성대신 사용되는 사진식각방법이 해상도를 저하시키는 문제의 해결을 위해, 다른 마스크로 반복 노광시키는 방법이 출현하였으나 공정이 번거롭고 계단형태의 격벽밖에 형성하지 못하는 문제가 있었다.In order to solve the problem of lowering the resolution of the photolithography method used instead of the printing of the partition wall, a method of repeatedly exposing with another mask has appeared, but the process is cumbersome and only a stepped partition wall can be formed.

본 발명에서는 한 마스크로 정포커싱상태의 1차노광과 디포커싱상태의 2차노광을 행함으로써 깨끗한 경사에지를 용이하게 형성하도록 하였다.In the present invention, it is possible to easily form a clean inclined edge by performing the first exposure in the constant focusing state and the second exposure in the defocusing state with one mask.

Description

평판소자의 사진식각방법Photolithography Method of Flat Panel Devices

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제5(b)도는 본 발명 방법에 의한 경사에지 형성방법을 보이는 순차적 단면도들이다.5 (b) is a sequential cross-sectional view showing a method of forming the inclined edge according to the method of the present invention.

Claims (3)

평판소자의 기판상에 감광물질이 포함된 절연층을 적층한뒤 마스크를 통해 노광 및 현상함으로써 기능층을 형성하는 사진식각방법에 있어서, 상기 마스크를 설치하여 정포커싱상태로 상기 절연층의 1차 노광을 행한 뒤, 디포커싱상태로 2차노광을 행함으로써, 상기 기능층이 경사에지를 가지는 것을 특징으로 하는 평판소자의 사진식각방법.A photolithography method in which a functional layer is formed by stacking an insulating layer containing a photosensitive material on a substrate of a flat panel device and then exposing and developing the same through a mask, wherein the mask is provided to form a primary layer of the insulating layer in a positive focusing state. And performing secondary exposure in a defocusing state after the exposure, wherein the functional layer has a slanted edge. 제1항에 있어서, 상기 평판소자가 플라즈마 표시소자인 것을 특징으로 하는 평판소자의 사진식각방법.The method of claim 1, wherein the flat plate device is a plasma display device. 제1항에 있어서, 상기 기능층이 격벽인 것을 특징으로 하는 평판소자의 사진식각방법.The photolithography method of claim 1, wherein the functional layer is a partition wall. ※ 참고사항:최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950045238A 1995-11-30 1995-11-30 Photolithography Method of Flat Panel Devices KR0177135B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950045238A KR0177135B1 (en) 1995-11-30 1995-11-30 Photolithography Method of Flat Panel Devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950045238A KR0177135B1 (en) 1995-11-30 1995-11-30 Photolithography Method of Flat Panel Devices

Publications (2)

Publication Number Publication Date
KR970028870A true KR970028870A (en) 1997-06-24
KR0177135B1 KR0177135B1 (en) 1999-04-01

Family

ID=19436777

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950045238A KR0177135B1 (en) 1995-11-30 1995-11-30 Photolithography Method of Flat Panel Devices

Country Status (1)

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KR (1) KR0177135B1 (en)

Also Published As

Publication number Publication date
KR0177135B1 (en) 1999-04-01

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