KR970048982A - Phase reversal cell projection mask - Google Patents
Phase reversal cell projection mask Download PDFInfo
- Publication number
- KR970048982A KR970048982A KR1019950052462A KR19950052462A KR970048982A KR 970048982 A KR970048982 A KR 970048982A KR 1019950052462 A KR1019950052462 A KR 1019950052462A KR 19950052462 A KR19950052462 A KR 19950052462A KR 970048982 A KR970048982 A KR 970048982A
- Authority
- KR
- South Korea
- Prior art keywords
- silicon substrate
- phase inversion
- mask
- cell projection
- silicon
- Prior art date
Links
Abstract
본 발명은 반도체 제조공정에 사용되는 셀 프로젝션 마스크(Cell Projection Mask)및 그 제조방법에 관한것으로, 리소그라피 고정중 전자빔을 이용하여 노광할때 해상력을 증대시키기 위해 셀 크로젝션 마스크와 위상반전 마스크를 결합시켜 마스크를 형성함으로 인하여 패턴의 해상력을 향상시킬수가 있고, 노광 시간 단축과 함께 전자빔 묘사장치를 이용한 고집적 제품개발이 보다 용이하다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cell projection mask used in a semiconductor manufacturing process and a method of manufacturing the same. The present invention relates to a combination of a cell projection mask and a phase inversion mask to increase resolution when exposed using an electron beam during lithography fixing. By forming a mask, the resolution of the pattern can be improved, and it is easier to develop a highly integrated product using an electron beam description device with shortening the exposure time.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제3도는 본 발명에 의해 제조되는 위상 반전 셀 프로젝션 마스크를 이용하여 전자빔을 투과시킬때 광의 위상과 광의 강도를 도시한 도면.3 is a diagram showing the phase and intensity of light when transmitting an electron beam using a phase inversion cell projection mask made by the present invention.
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950052462A KR970048982A (en) | 1995-12-20 | 1995-12-20 | Phase reversal cell projection mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950052462A KR970048982A (en) | 1995-12-20 | 1995-12-20 | Phase reversal cell projection mask |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970048982A true KR970048982A (en) | 1997-07-29 |
Family
ID=66645552
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950052462A KR970048982A (en) | 1995-12-20 | 1995-12-20 | Phase reversal cell projection mask |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970048982A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100307220B1 (en) * | 1998-06-30 | 2001-10-19 | 박종섭 | Method of manufacturing mask of semiconductor device |
-
1995
- 1995-12-20 KR KR1019950052462A patent/KR970048982A/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100307220B1 (en) * | 1998-06-30 | 2001-10-19 | 박종섭 | Method of manufacturing mask of semiconductor device |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |