KR970072014A - Method for forming an alignment key pattern of a semiconductor device - Google Patents
Method for forming an alignment key pattern of a semiconductor device Download PDFInfo
- Publication number
- KR970072014A KR970072014A KR1019960012544A KR19960012544A KR970072014A KR 970072014 A KR970072014 A KR 970072014A KR 1019960012544 A KR1019960012544 A KR 1019960012544A KR 19960012544 A KR19960012544 A KR 19960012544A KR 970072014 A KR970072014 A KR 970072014A
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- KR
- South Korea
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- exposure
- exposure apparatus
- forming
- alignment key
- semiconductor device
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Abstract
반도체 장치의 스테퍼 및 스캔너용 얼라인 키 패턴 형성방법이 개시되어 있다. 본 발명은 반도체 기판 상에 포토레지스트막을 형성하는 단계와, 제1노광장치로 상기 포토레지스트막을 1차 노광하는 단계와, 상기 1차 노광된 포토레제스트막이 형성된 반도체 기판을 제2노광장치로 상기 제1차 노광시 형성된 얼라인 키 신호를 이용하여 2차 노광하는 단계와, 상기 1차 및 2차 노광된 포토레지스트막을 현상 및 식각하는 단계를 포함하여 이루어지는 것을 특징으로 하는 반도체 장치의 제1 및 제2노광장치용 얼라인 키 패턴 형성방법을 제공한다. 상기 제1노광장치 및 제2노광장치는 스테퍼 노광장치 또는 스캔너 노광장치이다. 따라서, 본 발명은 한 번의 사진공정으로 제1 및 제2노광장치용 얼라인 키 패턴 형성방법을 제조할 수 있다.A stepper of a semiconductor device and a method of forming a scanline alignment key pattern are disclosed. The present invention provides a method of manufacturing a semiconductor device, comprising: forming a photoresist film on a semiconductor substrate; subjecting the photoresist film to primary exposure with a first exposure apparatus; A step of performing secondary exposure using an alignment key signal formed at the time of the first exposure and developing and etching the photoresist film of the primary and secondary exposures, There is provided a method of forming an alignment key pattern for a second exposure apparatus. The first exposure apparatus and the second exposure apparatus are a stepper exposure apparatus or a scanning exposure apparatus. Therefore, the present invention can manufacture the alignment key pattern forming method for the first and second exposure apparatuses in a single photolithography process.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.
제2도 내지 제3도는 본 발명에 의한 반도체 장치의 얼라인 키 패턴 형성방법을 설명하기 위하여 도시한 단면도들이다.FIGS. 2 to 3 are cross-sectional views illustrating a method of forming an alignment key pattern of a semiconductor device according to the present invention.
Claims (2)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019960012544A KR970072014A (en) | 1996-04-24 | 1996-04-24 | Method for forming an alignment key pattern of a semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019960012544A KR970072014A (en) | 1996-04-24 | 1996-04-24 | Method for forming an alignment key pattern of a semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR970072014A true KR970072014A (en) | 1997-11-07 |
Family
ID=66217289
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019960012544A KR970072014A (en) | 1996-04-24 | 1996-04-24 | Method for forming an alignment key pattern of a semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR970072014A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR19990054914A (en) * | 1997-12-26 | 1999-07-15 | 김영환 | Ultrafine Sorting Method Using Radioactive Isotopes |
-
1996
- 1996-04-24 KR KR1019960012544A patent/KR970072014A/en not_active Application Discontinuation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR19990054914A (en) * | 1997-12-26 | 1999-07-15 | 김영환 | Ultrafine Sorting Method Using Radioactive Isotopes |
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